Miscibility of linear low density polyethylene (LLDPE)-graft-poly(methyl methacrylate) with poly(vinylidene fluoride) (PVF2) and its application as compatibilizer LLDPE/PVF2 blends

Differential scanning calorimetry (DSC), Fourier-transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM), and X-ray photoelectron spectroscopy (XPS) were used to study the miscibility of blends of a graft copolymer of poly(methyl methacrylate) on linear low density polyethylene (LLDPE-g-PMMA, G-3) with poly(vinylidene fluoride)(b) (PVF2) and the compatibilization of blends of LLDPE/PVF2. The specific interaction between PMMA side chains and PVF2 in G-3/PVF2 binary blends is weaker than that between the homopolymers PMMA and PVF2. There are two states of PVF2 in the melt of a G-3/PVF2 (60/40, w/w) blend, one as pure PVF2 and the other interacting with PMMA side chains. The miscibility between PMMA side chains and PVF2 affects the crystallization of PVF2. LLDPE-g-PMMA was demonstrated to be a good compatibilizer in LLDPE/PVF2 blends, improving the interfacial adhesion and dispersion in the latter. Diffusion of PMMA side chains into PVF2 in the interfacial region reduces the crystallization rate and lowers the melting point (T-m) and the crystallization temperature (T-c) of PVF2 in the blends.

Synthesis and properties of block copolymers of poly(ether sulphone)s with liquid crystalline polyester units

Block copolymers of poly(ethersulphone) (PES) oligomers with liquid crystalline polyester units were synthesized by the reaction of dihydroxy-terminated poly(ether sulphone) oligomers (number-average molecular weights: 704, 1,158 and 2570) and terephthaloyl bis(4-oxybenzoyl chloride), and their properties were investigated. The results indicated that the copolymer with PES segments of molecular weight of 704 possessed birefringent features when annealed at 360 degrees C, while the copolymer with PES segments of molecular weight of 2,570 became isotropic. Also, the block copolymers had a better chemical resistance and high-temperature stability than PES.

MISCIBILITY, MICROSTRUCTURE, AND DYNAMICS OF BLENDS CONTAINING BLOCK-COPOLYMER .1. MISCIBILITY OF BLENDS OF HOMOPOLYSTYRENE WITH STYRENE-BUTADIENE BLOCK-COPOLYMERS

The miscibilities of blends of homopolystyrene/styrene-butadiene/styrene (PS/SBS) and PS/SB-4A (4-arm star block copolymer) have been studied by dynamic mechanical analysis (DMA) and C-13 CPMAS NMR techniques. The results indicate that the miscibilities o

THE VISCOSITY BEHAVIOUR OF SEP BLOCK COPOLYMER SOLUTION DURING ITS MICELLIZATION

The viscosities of polystyrene-b-poly (ethylene/propylene) diblock copolymer in mixed solvent of n-octane and benzene were measured. The influences of the constitution of the mixed solvent, temperature and concentration were on the viscosity investigated. During the micellization the solution viscosity increases rapidly. The results are consistent with the study on the micellization by light scattering. The average mass of micelleswas measured and the hydrodynamic radius of gyrations were calculated.

THE CRYSTALLIZATION BEHAVIOUR OF BLOCK COPOLYMER/HOMOPOLYMER BLENDS I. INFLUENCE OF NONSPHERICAL MICELLE ON CRYSTALLIZATION BEHAVIOUR IN DILUTE SOLID SOLUTIONS

The effect of micelle on crystallization behaviour of dilute poly(methyl methacrylate-b-tetrahydrofuran) diblock copolymer/tetrahydrofuran homopolymer, dilute poly (ethylene-b-styrene-b-ethylene) triblock copolymer/ethylene homopolymer solutions has been studied. The results show that with the structural teansitions from spherical to nonspherical micelle in the blends, great changes in the nucleation and spherulite morphologies take place.

THE THERMODYNAMICS OF MICELLIZATION BY BLOCK COPOLYMER SEP IN ORGANIC SOLVENTS

The thermodynamics of micellization for polystyrene-b-poly(ethylene/propylene) two-Mock copolymer(SEP) in the mixtures of n-octane and benzene with different proportions have been studied in this paper, The critical micelle concentrations(GMC) of micelle solutions at various temperatures were measured by lost angle laser light scattering photometer(LALLS), The results shove that the micellization process of nonpolar copolymer SEP in hydrocarbon solvents ire exothermal, and the entropy change is negative, In contrast, far ordinary surfactants in water, it is the enthalpy contribution to the energy change which is responsible for micellization.

XPS STUDY ON TERNARY CROSSLINKED BLOCK-COPOLYMER FROM CONDENSATION OF OLIGODIMETHYLSILOXANE WITH POLY-PARA-HYDROXYSTYRENE AND POLYARYLSULFONE OLIGOMERS

XPS has extensively been applied to the study of polymers, in which a considerably important topic is the surface phase separations in block copolymers and blends. Copolymers (or blends) will produce a phase separation if their components are in-

Block copolymer self-assembly based device structures

This thesis investigated the block copolymer (BCP) thin film characteristics and pattern formation using a set of predetermined molecular weights of PS-b-PMMA and PS-b-PDMS. Post BCP pattern fabrication on the required base substrate a dry plasma etch process was utilised for successful pattern transfer of the BCP resist onto underlying substrate. The resultant sub-10 nm device features were used in front end of line (FEoL) fabrication of active device components in integrated circuits (IC). The potential use of BCP templates were further extended to metal and metal-oxide nanowire fabrication. These nanowires were further investigated in real-time applications as novel sensors and supercapacitors.

Insertion of metal oxides into block copolymer nanopatterns as robust etch masks for nanolithography

Directed self-assembly (DSA) of block copolymers (BCPs) is a prime candidate to further extend dimensional scaling of silicon integrated circuit features for the nanoelectronic industry. Top-down optical techniques employed for photoresist patterning are predicted to reach an endpoint due to diffraction limits. Additionally, the prohibitive costs for “fabs” and high volume manufacturing tools are issues that have led the search for alternative complementary patterning processes. This thesis reports the fabrication of semiconductor features from nanoscale on-chip etch masks using “high χ” BCP materials. Fabrication of silicon and germanium nanofins via metal-oxide enhanced BCP on-chip etch masks that might be of importance for future Fin-field effect transistor (FinFETs) application are detailed.