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Transmission of a single 2.5Gb/s subcarrier modulated channel over 300m of 62.5 mu m multimode fibre
10-Gbit/s transmission over 300-m standard multimode fiber using multilevel coding and 2-channel WDM
Resumo:
A combination of multilevel coding schemes and simple two-channel wavelength division multiplexing (WDM) at 1300 and 1550 nm was used to transmit an aggregate of 10 Gbit/s over 300 m of multimode fiber that is typical of that employed in current Local Area Networks (LANs). It was shown that this technique could be a simple solution for achieving 10 Gigabit ethernet links over installed multimode fiber building backbones.
Resumo:
A method to fabricate polymer field-effect transistors with submicron channel lengths is described. A thin polymer film is spin coated on a prepatterned resist with a low resolution to create a thickness contrast in the overcoated polymer layer. After plasma and solvent etching, a submicron-sized line structure, which templates the contour of the prepattern, is obtained. A further lift-off process is applied to define source-drain electrodes of transistors. With a combination of ink-jet printing, transistors with channel length down to 400 nm have been fabricated by this method. We show that drive current density increases as expected, while the on/off current ratio 106 is achieved. © 2005 American Institute of Physics.
Resumo:
We report high hole and electron mobilities in nanocrystalline silicon (nc-Si:H) top-gate staggered thin-film transistors (TFTs) fabricated by direct plasma-enhanced chemical vapor deposition (PECVD) at 260°C. The n-channel nc-Si:H TFT with n+ nc-Si:H ohmic contacts shows a field-effect electron mobility (μnFE) of 130 cm2/Vs, which increases to 150 cm2/Vs with Cr-silicide contacts, along with a field-effect hole mobility (μhFE) of 25 cm2/Vs. To the best of our knowledge, the hole and electron mobilities reported here are the highest achieved to date using direct PECVD. © 2005 IEEE.