997 resultados para SILICON OXIDES


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We demonstrate a silicon optical phase shifter based on photoelastic effect controlled by a piezoelectric thin film. The hysteresis behavior of the piezoelectric response shows potential application as bistable device independent of the optical intensity. © OSA 2012.

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We demonstrate the design, fabrication, transmission and nearfield characterization of a novel parabolic tapered 1D photonic crystal cavity in silicon. The design allows repeatable device fabrication, high quality factor and small modal volume. © 2012 OSA.

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We demonstrate an integrated on-chip plasmonic enhanced Schottky detector for telecom wavelengths based on the internal photoemission process. This CMOS compatible device may serve as a promising alternative to the Si-Ge detectors. © 2012 OSA.

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We demonstrate bistability in a submicron silicon optical phase shifter based on the photoelastic effect. The strain magnitude is electrically controlled by a piezoelectric thin film placed on top of the device. The hysteresis behavior of the piezoelectric response shows potential application as bistable device independent of the optical intensity. © 2012 American Institute of Physics.

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We demonstrate the design, fabrication, transmission spectrum measurement, and near-field characterization of a parabolic tapered one-dimensional photonic crystal cavity in silicon. The results shows a relatively high quality factor (∼43 000), together with a small modal volume of ∼ 1. 1 (λ/n) 3. Moreover, the design allows repeatable device fabrication, as evident by the similar characteristics obtained for several tens of devices that were fabricated and tested. These demonstrated 1D PhC cavities may be used as a building block in integrated photonic circuits for optical on-chip interconnects and sensing applications. © 2012 American Institute of Physics.

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We demonstrate an integrated on-chip locally-oxidized silicon surface-plasmon Schottky detector for telecom wavelengths based on the internal photoemission process. Theoretical model and experimental results will be presented and discussed. © 2011 IEEE.

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We demonstrate self-aligned approach for fabrication of hybrid silicon plasmonic waveguide. The demonstrated structure provides both nanoscale confinement together with propagation length of 100 microns. Near-field measurements of propagation and coupling loss are also presented. © 2011 OSA.