994 resultados para composite films


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Silicon oxide films were deposited by reactive evaporation of SiO. Parameters such as oxygen partial pressure and substrate temperature were varied to get variable and graded index films. Films with a refractive index in the range 1.718 to 1.465 at 550 nm have been successfully deposited. Films deposited using ionized oxygen has the refractive index 1.465 at 550 nm and good UV transmittance like bulk fused quartz. Preparation of graded index films was also investigated by changing the oxygen partial pressure during deposition. A two layer antireflection coating at 1064nm has been designed using both homogeneous and inhomogeneous films and studied their characteristics.

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Accurate system planning and performance evaluation requires knowledge of the joint impact of scheduling, interference, and fading. However, current analyses either require costly numerical simulations or make simplifying assumptions that limit the applicability of the results. In this paper, we derive analytical expressions for the spectral efficiency of cellular systems that use either the channel-unaware but fair round robin scheduler or the greedy, channel-aware but unfair maximum signal to interference ratio scheduler. As is the case in real deployments, non-identical co-channel interference at each user, both Rayleigh fading and lognormal shadowing, and limited modulation constellation sizes are accounted for in the analysis. We show that using a simple moment generating function-based lognormal approximation technique and an accurate Gaussian-Q function approximation leads to results that match simulations well. These results are more accurate than erstwhile results that instead used the moment-matching Fenton-Wilkinson approximation method and bounds on the Q function. The spectral efficiency of cellular systems is strongly influenced by the channel scheduler and the small constellation size that is typically used in third generation cellular systems.

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TiO2 thin films were prepared by sol gel method. The structural investigations performed by means of X- ray diffraction (XRD) technique, Scanning electronic microscopy (SEM) showed the shape structure at T=600°C. The optical constants of the deposited film were obtained from the analysis of the experimental recorded transmittance spectral data over the wavelengths range 200-3000 nm. The values of some important parameters (refractive index n, dielectric constant ε ∞ and thickness d), and the third order optical nonlinear susceptibility χ(3) of TiO2 film are determined from these spectra. It has been found that the dispersion data obey the single oscillator relation of the Wemple-DiDomenico model, from which the dispersion parameters and high – frequency dielectric constant were determined. The estimation of the corresponding band gap Eg , χ (3) and ε ∞ are 2.57 eV, 0.021 × 10-10 esu and 5.20,respectively.