Decay of Cystalline Order and Equilibration during the Solid-to-Plasma Transition Induced by 20-fs Microfocused 92-eV Free-Electron-Laser Pulses

We have studied a solid-to-plasma transition by irradiating Al foils with the FLASH free electron laser at intensities up to 10(16) W/cm(2). Intense XUV self-emission shows spectral features that are consistent with emission from regions of high density, which go beyond single inner-shell photoionization of solids. Characteristic features of intrashell transitions allowed us to identify Auger heating of the electrons in the conduction band occurring immediately after the absorption of the XUV laser energy as the dominant mechanism. A simple model of a multicharge state inverse Auger effect is proposed to explain the target emission when the conduction band at solid density becomes more atomiclike as energy is transferred from the electrons to the ions. This allows one to determine, independent of plasma simulations, the electron temperature and density just after the decay of crystalline order and to characterize the early time evolution.

Photomineralisation of 4-chlorophenol sensitised by TiO2 thin films

The results of a study of the oxidative mineralisation of 4-CP by oxygen, sensitised by thin films of Degussa P25 TiO2, are reported. The films are used under conditions in which the kinetics of photomineralisation are independent of mass transfer effects and stable towards repeated irradiation. Using a TiO2 film, the process goes through the same mechanism as a TiO2 dispersion, generating the same intermediates, namely: 4-chlorocatechol and hydroquinone. The kinetics of photomineralisation show clear differences between a TiO2 film and a dispersion. With TiO2 films the initial rate of photomineralisation is strongly dependent upon photocatalyst loading, (units; g dm(-3)) reaching a distinct maximum, which appears to be associated with the formation of a monolayer of aggregated particles - the diameter of the aggregated particles is estimated as 0.44 mu m. A simple 2D model is presented to help illustrate the features of such a system. With TiO2 dispersions the rate usually reaches a plateau at ca. 0.5 g dm(-3) of TiO2. For TiO2 films the initial rate depends directly upon the incident light intensity, implying that the photocatalytically active particles are under low illumination conditions, partially shielded by the other particles making up each aggregated particle. In contrast, with TiO2 dispersions R-i depends upon I-0.64, implying that the different light intensities used spanned both the high (R(i)proportional to I-1/2) and low (R(i)proportional to I) intensity kinetic regions. The kinetics of photomineralisation of 4-CP, sensitised by TiO2 films obey the same Langmuir-Hinshelwood expressions as found in most semiconductor photocatalyst work conducted with TiO2 dispersions. However, in a study of the variation R-i as a function of [4-CP] and [O-2] the values for the maximum rates were larger, and those for the apparent Langmuir adsorption coefficients were smaller, than those found for TiO2 dispersions. (C) 1998 Elsevier Science S.A. All rights reserved.