Biodeterioration of cellulose materials in Karingote, Nileswaram, Kavvayi and Ramapuram Backwater systems of Kerala

The hydrographic conditions prevailing in an estuarine system along the southwest coast of India are described. The nature of destruction of timber in these backwaters has been examined in detail which revealed the existence of 8 species of shipworms, 2 species each of pholads and isopods. The shipworms are represented by Dicyathifer manni, Lyrodus pedicellatus, Teredo furcifera, T. clappi, Nausitora dunlopei, Bankia carinata, B. campanellata; the pholads by Martesia striata and M. (Purticoma) nairi; and the isopods by Sphaeroma terebrans and S. annandalei. The incidence and relative abundance of these pests are discussed in relation to the salinity profile of the estuary.

Technical terms in fishing gear materials and gear fabrication

Papers dealing with technical terms in fisheries science are few. This paper however, covers only one or two aspects of the subject, namely fishing gear materials and fishing gear fabrication. Similar papers on other aspects are also planned. Short explanations or descriptions are also given wherever considered necessary.

Mapping forces in 3D elastic assembly of grains

Our understanding of the elasticity and rheology of disordered materials, such as granular piles, foams, emulsions or dense suspensions relies on improving experimental tools to characterize their behaviour at the particle scale. While 2D observations are now routinely carried out in laboratories, 3D measurements remain a challenge. In this paper, we use a simple model system, a packing of soft elastic spheres, to illustrate the capability of X-ray microtomography to characterise the internal structure and local behaviour of granular systems. Image analysis techniques can resolve grain positions, shapes and contact areas; this is used to investigate the material's microstructure and its evolution upon strain. In addition to morphological measurements, we develop a technique to quantify contact forces and estimate the internal stress tensor. As will be illustrated in this paper, this opens the door to a broad array of static and dynamical measurements in 3D disordered systems

Application of electron beams in thermal processing of semiconductor materials and devices

Rapid and effective thermal processing methods using electron beams are described in this paper. Heating times ranging from a fraction of a second to several seconds and temperatures up to 1400°C are attainable. Applications such as the annealing of ion implanted material, both without significant dopant diffusion and with highly controlled diffusion of impurities, are described. The technique has been used successfully to activate source/drain regions for fine geometry NMOS transistors. It is shown that electron beams can produce localised heating of semiconductor substrates and a resolution of approximately 1 μm has been achieved. Electron beam heating has been applied to improving the crystalline quality of silicon-on sapphire used in CMOS device fabrication. Silicon layers with defect levels approaching bulk material have been obtained. Finally, the combination of isothermal and selective annealing is shown to have application in recrystallisation of polysilicon films on an insulating layer. The approach provides the opportunity of producing a silicon-on-insulator substrate with improved crystalline quality compared to silicon-on-sapphire at a potentially lower cost. It is suggested that rapid heating methods are expected to provide a real alternative to conventional furnace processing of semiconductor devices in the development of fabrication technology. © 1984 Benn electronics Publications Ltd, Luton.