Expansion and tissue infiltration of an allospecific CD4+CD25+CD45RO+IL-7Ralphahigh cell population in solid organ transplant recipients.

It has been recently shown (Seddiki, N., B. Santner-Nanan, J. Martinson, J. Zaunders, S. Sasson, A. Landay, M. Solomon, W. Selby, S.I. Alexander, R. Nanan, et al. 2006. J. Exp. Med. 203:1693-1700.) that the expression of interleukin (IL) 7 receptor (R) alpha discriminates between two distinct CD4 T cell populations, both characterized by the expression of CD25, i.e. CD4 regulatory T (T reg) cells and activated CD4 T cells. T reg cells express low levels of IL-7Ralpha, whereas activated CD4 T cells are characterized by the expression of IL-7Ralpha(high). We have investigated the distribution of these two CD4 T cell populations in 36 subjects after liver and kidney transplantation and in 45 healthy subjects. According to a previous study (Demirkiran, A., A. Kok, J. Kwekkeboom, H.J. Metselaar, H.W. Tilanus, and L.J. van der Laan. 2005. Transplant. Proc. 37:1194-1196.), we observed that the T reg CD25(+)CD45RO(+)IL-7Ralpha(low) cell population was reduced in transplant recipients (P < 0.00001). Interestingly, the CD4(+)CD25(+)CD45RO(+)IL-7Ralpha(high) cell population was significantly increased in stable transplant recipients compared with healthy subjects (P < 0.00001), and the expansion of this cell population was even greater in patients with documented humoral chronic rejection compared with stable transplant recipients (P < 0.0001). The expanded CD4(+)CD25(+)CD45RO(+)IL-7Ralpha(high) cell population contained allospecific CD4 T cells and secreted effector cytokines such as tumor necrosis factor alpha and interferon gamma, thus potentially contributing to the mechanisms of chronic rejection. More importantly, CD4(+)IL-7Ralpha(+)and CD25(+)IL-7Ralpha(+) cells were part of the T cell population infiltrating the allograft of patients with a documented diagnosis of chronic humoral rejection. These results indicate that the CD4(+)CD25(+)IL-7Ralpha(+) cell population may represent a valuable, sensitive, and specific marker to monitor allospecific CD4 T cell responses both in blood and in tissues after organ transplantation.

[Illustrations de L'Art de raffiner le sucre] / Ludovic Simonneau, grav. ; Henri-Louis Duhamel du Monceau, aut. du texte

Comprend : [pl.I en reg. p.78 : moulin à sucre de canne employé en Amérique.] [Cote : V 3992/Microfilm R 122 218] ; [pl.II en reg. p.78 : cellier où l'on stocke les barils de sucre brut. Raffinage du sucre.] [Cote : V 3992/Microfilm R 122 218] ; [pl.III en reg. p.78 : la halle aux chaudières. Raffinage du sucre. Planche gravée d'après un dessin de M. Desfriches.] [Cote : V 3992/Microfilm R 122 218] ; [pl.IV en reg. p.78 : la halle aux chaudières. Raffinage du sucre.] [Cote : V 3992/Microfilm R 122 218] ; [pl.V en reg. p.78 : comment sont montée les chaudières pour le raffinage du sucre.] [Cote : V 3992/Microfilm R 122 218] ; [pl.VI en reg. p.78 : diverses formes pour monter les pains de sucre. Raffinage du sucre.] [Cote : V 3992/Microfilm R 122 218] ; [pl.VII en reg. p.78 : comment travailler au traitement et au raffinage du sucre.] [Cote : V 3992/Microfilm R 122 218] ; [pl.VIII en reg. p.78 : un grenier dit aux pièces. Raffinage et stockage du sucre.] [Cote : V 3992/Microfilm R 122 218] ; [pl.IX en reg. p.78 : préparation des pins de sucre avant de le mettre à l'étuve. Manière de les mettre en papier et en corde. La mise en tonne. Le travail des écumes.] [Cote : V 3992/Microfilm R 122 218] ; [pl.X en reg. p.78 : détail d'une étuve à sucre.] [Cote : V 3992/Microfilm R 122 218]

Thin silicon films ranging from amorphous to nanocrystalline obtained by Hot-Wire CVD

In this paper, we have presented results on silicon thin films deposited by hot-wire CVD at low substrate temperatures (200 °C). Films ranging from amorphous to nanocrystalline were obtained by varying the filament temperature from 1500 to 1800 °C. A crystalline fraction of 50% was obtained for the sample deposited at 1700 °C. The results obtained seemed to indicate that atomic hydrogen plays a leading role in the obtaining of nanocrystalline silicon. The optoelectronic properties of the amorphous material obtained in these conditions are slightly poorer than the ones observed in device-grade films grown by plasma-enhanced CVD due to a higher hydrogen incorporation (13%).