Ar原子光电流效应的研究

<正> 在十种染料波长范围内对应阴极放电中Ar原子光电流谱进行了观察,比较了Ar与Ne光电流效应的异同,提出了理论模型,并求得了放电电流与激光功率关系。

空阴极放电中Ar光电流谱的研究

在十种染料的波长范围内对空阴极放电中Ar的光电流谱、光电流信号与时间、放电电流及入射激光功率关系进行了实验观测,比较了Ne与Ar光电流效应的异同,在其共同点的基础上讨论了Ne与Ar光电流效应的机理,提出了理论模型并求得了放电电流与入射激光功率密度的关系。

Legislação brasileira sobre poluição do ar

Consultoria Legislativa - Área XI - Meio Ambiente, e Direito Ambiental, Organização Territorial, Desenvolvimento Urbano e Regional.

Behavior of ar plasma formed in a high-density plasma source - an ecr reactor

In order to develop the ultra-large scale integration(ULSI), low pressure and high density plasma apparatus are required for etching and deposit of thin films. To understand critical parameters such as the pressure, temperature, electrostatic potential and energy distribution of ions impacting on the wafer, it is necessary to understand how these parameters are influenced by the power input and neutral gas pressure. In the present work, a 2-D hybrid electron fluid-particle ion model has been developed to simulate one of the high density plasma sources-an Electron Cyclotron Resonance (ECR) plasma system with various pressures and power inputs in a non-uniform magnetic field. By means of numerical simulation, the energy distributions of argon ion impacting on the wafer are obtained and the plasma density, electron temperature and plasma electrostatic potential are plotted in 3-D. It is concluded that the plasma density depends mainly on both the power input and neutral gas pressure. However, the plasma potential and electron temperature can hardly be affected by the power input, they seem to be primarily dependent on the neutral gas pressure. The comparison shows that the simulation results are qualitatively in good agreement with the experiment measurements.