SATURATED AND NEAR-DIFFRACTION-LIMITED OPERATION OF AN XUV LASER AT 23.6 NM

Amplification of spontaneous emission (ASE) at 23.6 nm has been studied in a Ge plasma heated by a 1 TW infrared laser pulse. The exponent of the axial gain reached 21 in a geometry with Fresnel number less-than-or-equal-to 1. Two plasma columns of combined length up to 36 mm were used with an extreme ultraviolet mirror giving double-pass amplification. Saturation of the ASE output was observed. The beam divergence was about 8 x diffraction limited with a brightness estimated at 10(14) W cm-2 sr-1. The feedback from the mirror was significantly reduced probably by radiation damage from the plasma.

COLLISIONALLY EXCITED X-RAY LASER SCHEMES - PROGRESS AT RUTHERFORD APPLETON LABORATORY

Characteristics of the 3p-3s amplified spontaneous emission from Ne-like Ge plasma columns, generated by ablation from massive targets, have been studied in detail. In particular, the gain coefficients of the J = 2-1 lines at 23.2 and 23.6 nm have been measured as a function of incident intensity for a 1.05-mu-m wavelength pump laser beam. For 100-mu-m wide stripe targets and a fixed energy pump laser the maximum gain length product is achieved at an irradiance of