934 resultados para Hopkins, Mark, 1813-1878.


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The correlation between the coma sensitivity of the alternating phase-shifting mask (Alt-PSM) mark and the mark's structure is studied based on the Hopkins theory of partially coherent imaging and positive resist optical lithography (PROLITH) simulation. It is found that an optimized Alt-PSM mark with its phase width being two-thirds its pitch has a higher sensitivity to coma than Alt-PSM marks with the same pitch and the different phase widths. The pitch of the Alt-PSM mark is also optimized by PROLITH simulation, and the structure of p - 1.92 lambda/NA and pw = 2p/3 proves to be with the highest sensitivity. The optimized Alt-PSM mark is used as a measurement mark to retrieve coma aberration from the projection optics in lithographic tools. In comparison with an ordinary Alt-PSM mark with its phase width being a half its pitch, the measurement accuracies of Z(7) and Z(14) apparently increase. (C) 2009 Optical Society of America

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Sign.: [ ]6

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Contiene: Villancicos para los maytines /compuestos por José Escorcia ...

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Hay un ejemplar encuadernado con: Relacion de la entrada que hizieron en la ciudad de Denia, Reyno de Valencia, las armas de la Magestad Catolica, del Rey nuestro Señor Carlos IIJ [sic] ... el dia 18 de agosto de 1705. (XVIII/1688).

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Microfilme. Valencia: BV, ca. 1990

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Microfilme. Valencia: BV, ca. 1990

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Includes index.