The Feasibly of Functionally Guided Intensity Modulated Radiation Therapy Treatment Planning Using Perfluoropropane-Enhanced MRI for Lung Cancer

Radiotherapy is commonly used to treat lung cancer. However, radiation induced damage to lung tissue is a major limiting factor to its use. To minimize normal tissue lung toxicity from conformal radiotherapy treatment planning, we investigated the use of Perfluoropropane(PFP)-enhanced MR imaging to assess and guide the sparing of functioning lung. Fluorine Enhanced MRI using Perfluoropropane(PFP) is a dynamic multi-breath steady state technique enabling quantitative and qualitative assessments of lung function(1).

Imaging data was obtained from studies previously acquired in the Duke Image Analysis Laboratory. All studies were approved by the Duke IRB. The data was de-identified for this project, which was also approved by the Duke IRB. Subjects performed several breath-holds at total lung capacity(TLC) interspersed with multiple tidal breaths(TB) of Perfluoropropane(PFP)/oxygen mixture. Additive wash-in intensity images were created through the summation of the wash-in phase breath-holds. Additionally, model based fitting was utilized to create parametric images of lung function(1).

Varian Eclipse treatment planning software was used for putative treatment planning. For each subject two plans were made, a standard plan, with no regional functional lung information considered other than current standard models. Another was created using functional information to spare functional lung while maintaining dose to the target lesion. Plans were optimized to a prescription dose of 60 Gy to the target over the course of 30 fractions.

A decrease in dose to functioning lung was observed when utilizing this functional information compared to the standard plan for all five subjects. PFP-enhanced MR imaging is a feasible method to assess ventilatory lung function and we have shown how this can be incorporated into treatment planning to potentially decrease the dose to normal tissue.

Effect of reaction mechanism on precursor exposure time in atomic layer deposition of silicon oxide and silicon nitride

Atomic layer deposition (ALD) of highly conformal, silicon-based dielectric thin films has become necessary because of the continuing decrease in feature size in microelectronic devices. The ALD of oxides and nitrides is usually thought to be mechanistically similar, but plasma-enhanced ALD of silicon nitride is found to be problematic, while that of silicon oxide is straightforward. To find why, the ALD of silicon nitride and silicon oxide dielectric films was studied by applying ab initio methods to theoretical models for proposed surface reaction mechanisms. The thermodynamic energies for the elimination of functional groups from different silicon precursors reacting with simple model molecules were calculated using density functional theory (DFT), explaining the lower reactivity of precursors toward the deposition of silicon nitride relative to silicon oxide seen in experiments, but not explaining the trends between precursors. Using more realistic cluster models of amine and hydroxyl covered surfaces, the structures and energies were calculated of reaction pathways for chemisorption of different silicon precursors via functional group elimination, with more success. DFT calculations identified the initial physisorption step as crucial toward deposition and this step was thus used to predict the ALD reactivity of a range of amino-silane precursors, yielding good agreement with experiment. The retention of hydrogen within silicon nitride films but not in silicon oxide observed in FTIR spectra was accounted for by the theoretical calculations and helped verify the application of the model.

Analytic Torsion, the Eta Invariant, and Closed Differential Forms on Spaces of Metrics

The central idea of this dissertation is to interpret certain invariants constructed from Laplace spectral data on a compact Riemannian manifold as regularized integrals of closed differential forms on the space of Riemannian metrics, or more generally on a space of metrics on a vector bundle. We apply this idea to both the Ray-Singer analytic torsion

and the eta invariant, explaining their dependence on the metric used to define them with a Stokes' theorem argument. We also introduce analytic multi-torsion, a generalization of analytic torsion, in the context of certain manifolds with local product structure; we prove that it is metric independent in a suitable sense.

Chemical approaches for doping nanodevice architectures

Advanced doping technologies are key for the continued scaling of semiconductor devices and the maintenance of device performance beyond the 14 nm technology node. Due to limitations of conventional ion-beam implantation with thin body and 3D device geometries, techniques which allow precise control over dopant diffusion and concentration, in addition to excellent conformality on 3D device surfaces, are required. Spin-on doping has shown promise as a conventional technique for doping new materials, particularly through application with other dopant methods, but may not be suitable for conformal doping of nanostructures. Additionally, residues remain after most spin-on-doping processes which are often difficult to remove. In-situ doping of nanostructures is especially common for bottom-up grown nanostructures but problems associated with concentration gradients and morphology changes are commonly experienced. Monolayer doping (MLD) has been shown to satisfy the requirements for extended defect-free, conformal and controllable doping on many materials ranging from traditional silicon and germanium devices to emerging replacement materials such as III-V compounds but challenges still remain, especially with regard to metrology and surface chemistry at such small feature sizes. This article summarises and critically assesses developments over the last number of years regarding the application of gas and solution phase techniques to dope silicon-, germanium- and III-V-based materials and nanostructures to obtain shallow diffusion depths coupled with high carrier concentrations and abrupt junctions.

Organic functionalisation, doping and characterisation of semiconductor surfaces for future CMOS device applications

Organic Functionalisation, Doping and Characterisation of Semiconductor Surfaces for Future CMOS Device Applications Semiconductor materials have long been the driving force for the advancement of technology since their inception in the mid-20th century. Traditionally, micro-electronic devices based upon these materials have scaled down in size and doubled in transistor density in accordance with the well-known Moore’s law, enabling consumer products with outstanding computational power at lower costs and with smaller footprints. According to the International Technology Roadmap for Semiconductors (ITRS), the scaling of metal-oxide-semiconductor field-effect transistors (MOSFETs) is proceeding at a rapid pace and will reach sub-10 nm dimensions in the coming years. This scaling presents many challenges, not only in terms of metrology but also in terms of the material preparation especially with respect to doping, leading to the moniker “More-than-Moore”. Current transistor technologies are based on the use of semiconductor junctions formed by the introduction of dopant atoms into the material using various methodologies and at device sizes below 10 nm, high concentration gradients become a necessity. Doping, the controlled and purposeful addition of impurities to a semiconductor, is one of the most important steps in the material preparation with uniform and confined doping to form ultra-shallow junctions at source and drain extension regions being one of the key enablers for the continued scaling of devices. Monolayer doping has shown promise to satisfy the need to conformally dope at such small feature sizes. Monolayer doping (MLD) has been shown to satisfy the requirements for extended defect-free, conformal and controllable doping on many materials ranging from the traditional silicon and germanium devices to emerging replacement materials such as III-V compounds This thesis aims to investigate the potential of monolayer doping to complement or replace conventional doping technologies currently in use in CMOS fabrication facilities across the world.

Éléments réguliers du groupe H₄

Mémoire numérisé par la Direction des bibliothèques de l'Université de Montréal.

Sur les solutions invariantes et conditionnellement invariantes des équations de la magnétohydrodynamique

Thèse numérisée par la Direction des bibliothèques de l'Université de Montréal.

Integrity-Based Kernel Malware Detection

Kernel-level malware is one of the most dangerous threats to the security of users on the Internet, so there is an urgent need for its detection. The most popular detection approach is misuse-based detection. However, it cannot catch up with today's advanced malware that increasingly apply polymorphism and obfuscation. In this thesis, we present our integrity-based detection for kernel-level malware, which does not rely on the specific features of malware. We have developed an integrity analysis system that can derive and monitor integrity properties for commodity operating systems kernels. In our system, we focus on two classes of integrity properties: data invariants and integrity of Kernel Queue (KQ) requests. We adopt static analysis for data invariant detection and overcome several technical challenges: field-sensitivity, array-sensitivity, and pointer analysis. We identify data invariants that are critical to system runtime integrity from Linux kernel 2.4.32 and Windows Research Kernel (WRK) with very low false positive rate and very low false negative rate. We then develop an Invariant Monitor to guard these data invariants against real-world malware. In our experiment, we are able to use Invariant Monitor to detect ten real-world Linux rootkits and nine real-world Windows malware and one synthetic Windows malware. We leverage static and dynamic analysis of kernel and device drivers to learn the legitimate KQ requests. Based on the learned KQ requests, we build KQguard to protect KQs. At runtime, KQguard rejects all the unknown KQ requests that cannot be validated. We apply KQguard on WRK and Linux kernel, and extensive experimental evaluation shows that KQguard is efficient (up to 5.6% overhead) and effective (capable of achieving zero false positives against representative benign workloads after appropriate training and very low false negatives against 125 real-world malware and nine synthetic attacks). In our system, Invariant Monitor and KQguard cooperate together to protect data invariants and KQs in the target kernel. By monitoring these integrity properties, we can detect malware by its violation of these integrity properties during execution.

An innovative electroforming process for oil heated rotational moulding tools

Rotational moulding is a method to produce hollow plastic articles. Heating is normally carried out by placing the mould into a hot air oven where the plastic material in the mould is heated. The most common cooling media are water and forced air. Due to the inefficient nature of conventional hot air ovens most of the energy supplied by the oven does not go to heat the plastic and as a consequence the procedure has very long cycle times. Direct oil heating is an effective alternative in order to achieve better energy efficiency and cycle times. This research work has combined this technology with new innovative design of mould, applying the advantages of electroforming and rapid prototyping. Complex cavity geometries are manufactured by electroforming from a rapid prototyping mandrel. The approach involves conformal heating and cooling channels , where the oil flows into a parallel channel to the electroformed cavity (nickel or copper). Because of this the mould enables high temperature uniformity with direct heating and cooling of the electroformed shell, Uniform heating and cooling is important not only for good quality parts but also for good uniform wall thickness distribution in the rotationally moulded part. The experimental work with the manufactured prototype mould has enabled analysis of the thermal uniformity in the cavity, under different temperatures. Copyright © 2008 by ASME.

Fabrication and Characterization of Efficient Optical Filter Arrays Implemented by 3D Nanoimprint

In dieser Arbeit werden optische Filterarrays für hochqualitative spektroskopische Anwendungen im sichtbaren (VIS) Wellenlängenbereich untersucht. Die optischen Filter, bestehend aus Fabry-Pérot (FP)-Filtern für hochauflösende miniaturisierte optische Nanospektrometer, basieren auf zwei hochreflektierenden dielektrischen Spiegeln und einer zwischenliegenden Resonanzkavität aus Polymer. Jeder Filter erlaubt einem schmalbandigem spektralen Band (in dieser Arbeit Filterlinie genannt) ,abhängig von der Höhe der Resonanzkavität, zu passieren. Die Effizienz eines solchen optischen Filters hängt von der präzisen Herstellung der hochselektiven multispektralen Filterfelder von FP-Filtern mittels kostengünstigen und hochdurchsatz Methoden ab. Die Herstellung der multiplen Spektralfilter über den gesamten sichtbaren Bereich wird durch einen einzelnen Prägeschritt durch die 3D Nanoimprint-Technologie mit sehr hoher vertikaler Auflösung auf einem Substrat erreicht. Der Schlüssel für diese Prozessintegration ist die Herstellung von 3D Nanoimprint-Stempeln mit den gewünschten Feldern von Filterkavitäten. Die spektrale Sensitivität von diesen effizienten optischen Filtern hängt von der Genauigkeit der vertikalen variierenden Kavitäten ab, die durch eine großflächige ‚weiche„ Nanoimprint-Technologie, UV oberflächenkonforme Imprint Lithographie (UV-SCIL), ab. Die Hauptprobleme von UV-basierten SCIL-Prozessen, wie eine nichtuniforme Restschichtdicke und Schrumpfung des Polymers ergeben Grenzen in der potenziellen Anwendung dieser Technologie. Es ist sehr wichtig, dass die Restschichtdicke gering und uniform ist, damit die kritischen Dimensionen des funktionellen 3D Musters während des Plasmaätzens zur Entfernung der Restschichtdicke kontrolliert werden kann. Im Fall des Nanospektrometers variieren die Kavitäten zwischen den benachbarten FP-Filtern vertikal sodass sich das Volumen von jedem einzelnen Filter verändert , was zu einer Höhenänderung der Restschichtdicke unter jedem Filter führt. Das volumetrische Schrumpfen, das durch den Polymerisationsprozess hervorgerufen wird, beeinträchtigt die Größe und Dimension der gestempelten Polymerkavitäten. Das Verhalten des großflächigen UV-SCIL Prozesses wird durch die Verwendung von einem Design mit ausgeglichenen Volumen verbessert und die Prozessbedingungen werden optimiert. Das Stempeldesign mit ausgeglichen Volumen verteilt 64 vertikal variierenden Filterkavitäten in Einheiten von 4 Kavitäten, die ein gemeinsames Durchschnittsvolumen haben. Durch die Benutzung der ausgeglichenen Volumen werden einheitliche Restschichtdicken (110 nm) über alle Filterhöhen erhalten. Die quantitative Analyse der Polymerschrumpfung wird in iii lateraler und vertikaler Richtung der FP-Filter untersucht. Das Schrumpfen in vertikaler Richtung hat den größten Einfluss auf die spektrale Antwort der Filter und wird durch die Änderung der Belichtungszeit von 12% auf 4% reduziert. FP Filter die mittels des Volumengemittelten Stempels und des optimierten Imprintprozesses hergestellt wurden, zeigen eine hohe Qualität der spektralen Antwort mit linearer Abhängigkeit zwischen den Kavitätshöhen und der spektralen Position der zugehörigen Filterlinien.

3D nanoimprint technology for NIR Fabry-Pérot filter arrays

Im Rahmen dieser Arbeit wird die Herstellung von miniaturisierten NIR-Spektrometern auf Basis von Fabry-Pérot (FP) Filter Arrays behandelt. Bisher ist die kostengünstige Strukturierung von homogenen und vertikal erweiterten Kavitäten für NIR FP-Filter mittels Nanoimprint Technologie noch nicht verfügbar, weil die Qualität der Schichten des Prägematerials unzureichend ist und die geringe Mobilität der Prägematerialien nicht ausreicht, um die vertikal erweiterten Kavitäten zu füllen. Diese Arbeit konzentriert sich auf die Reduzierung des technischen Aufwands zur Herstellung von homogenen und vertikal erweiterten Kavitäten. Zur Strukturierung der Kavitäten wird ein großflächiger substratkonformer UV-Nanoimprint Prozess (SCIL - Substrate Conformal Imprint Lithoghaphy) verwendet, der auf einem Hybridstempel basiert und Vorteile von harten und weichen Stempeln vereint. Um die genannten Limitierungen zu beseitigen, werden alternative Designs der Kavitäten untersucht und ein neues Prägematerial eingesetzt. Drei Designlösungen zur Herstellung von homogenen und erweiterten Kavitäten werden untersucht und verglichen: (i) Das Aufbringen des Prägematerials mittel mehrfacher Rotationsbeschichtung, um eine höhere Schichtdicke des Prägematerials vor dem Prägeprozess zu erzeugen, (ii) die Verwendung einer hybriden Kavität bestehend aus einer strukturierten Schicht des Prägematerials eingebettet zwischen zwei Siliziumoxidschichten, um die Schichtdicke der organischen Kavität zu erweitern und (iii) die Optimierung des Prägeprozesses durch Verwendung eines neuen Prägematerials. Die mit diesen drei Ansätzen hergestellten FP-Filter Arrays zeigen, hohe Transmissionen (beste Transmission > 90%) und kleine Linienbreiten (Halbwertsbreiten <5 nm).

Représentations et fusion des algèbres de Temperley-Lieb originale et diluée

Les algèbres de Temperley-Lieb originales, aussi dites régulières, apparaissent dans de nombreux modèles statistiques sur réseau en deux dimensions: les modèles d'Ising, de Potts, des dimères, celui de Fortuin-Kasteleyn, etc. L'espace d'Hilbert de l'hamiltonien quantique correspondant à chacun de ces modèles est un module pour cette algèbre et la théorie de ses représentations peut être utilisée afin de faciliter la décomposition de l'espace en blocs; la diagonalisation de l'hamiltonien s'en trouve alors grandement simplifiée. L'algèbre de Temperley-Lieb diluée joue un rôle similaire pour des modèles statistiques dilués, par exemple un modèle sur réseau où certains sites peuvent être vides; ses représentations peuvent alors être utilisées pour simplifier l'analyse du modèle comme pour le cas original. Or ceci requiert une connaissance des modules de cette algèbre et de leur structure; un premier article donne une liste complète des modules projectifs indécomposables de l'algèbre diluée et un second les utilise afin de construire une liste complète de tous les modules indécomposables des algèbres originale et diluée. La structure des modules est décrite en termes de facteurs de composition et par leurs groupes d'homomorphismes. Le produit de fusion sur l'algèbre de Temperley-Lieb originale permet de «multiplier» ensemble deux modules sur cette algèbre pour en obtenir un autre. Il a été montré que ce produit pouvait servir dans la diagonalisation d'hamiltoniens et, selon certaines conjectures, il pourrait également être utilisé pour étudier le comportement de modèles sur réseaux dans la limite continue. Un troisième article construit une généralisation du produit de fusion pour les algèbres diluées, puis présente une méthode pour le calculer. Le produit de fusion est alors calculé pour les classes de modules indécomposables les plus communes pour les deux familles, originale et diluée, ce qui vient ajouter à la liste incomplète des produits de fusion déjà calculés par d'autres chercheurs pour la famille originale. Finalement, il s'avère que les algèbres de Temperley-Lieb peuvent être associées à une catégorie monoïdale tressée, dont la structure est compatible avec le produit de fusion décrit ci-dessus. Le quatrième article calcule explicitement ce tressage, d'abord sur la catégorie des algèbres, puis sur la catégorie des modules sur ces algèbres. Il montre également comment ce tressage permet d'obtenir des solutions aux équations de Yang-Baxter, qui peuvent alors être utilisées afin de construire des modèles intégrables sur réseaux.

The Performance Characteristics of a Surface-Modified Cutting Tool

In the past, many papers have been presented which show that the coating of cutting tools often yields decreased wear rates and reduced coefficients of friction. Although different theories are proposed, covering areas such as hardness theory, diffusion barrier theory, thermal barrier theory, and reduced friction theory, most have not dealt with the question of how and why the coating of tool substrates with hard materials such as Titanium Nitride (TiN), Titanium Carbide (TiC) and Aluminium Oxide (Al203) transforms the performance and life of cutting tools. This project discusses the complex interrelationship that encompasses the thermal barrier function and the relatively low sliding friction coefficient of TiN on an undulating tool surface, and presents the result of an investigation into the cutting characteristics and performance of EDMed surface-modified carbide cutting tool inserts. The tool inserts were coated with TiN by the physical vapour deposition (PVD) method. PVD coating is also known as Ion-plating which is the general term of the coating method in which the film is created by attracting ionized metal vapour in this the metal was Titanium and ionized gas onto negatively biased substrate surface. Coating by PVD was chosen because it is done at a temperature of not more than 5000C whereas chemical Vapour Deposition CVD process is done at very high temperature of about 8500C and in two stages of heating up the substrates. The high temperatures involved in CVD affects the strength of the (tool) substrates. In this study, comparative cutting tests using TiN-coated control specimens with no EDM surface structures and TiN-coated EDMed tools with a crater-like surface topography were carried out on mild steel grade EN-3. Various cutting speeds were investigated, up to an increase of 40% of the tool manufacturer’s recommended speed. Fifteen minutes of cutting were carried out for each insert at the speeds investigated. Conventional tool inserts normally have a tool life of approximately 15 minutes of cutting. After every five cuts (passes) microscopic pictures of the tool wear profiles were taken, in order to monitor the progressive wear on the rake face and on the flank of the insert. The power load was monitored for each cut taken using an on-board meter on the CNC machine to establish the amount of power needed for each stage of operation. The spindle drive for the machine is an 11 KW/hr motor. Results obtained confirmed the advantages of cutting at all speeds investigated using EDMed coated inserts, in terms of reduced tool wear and low power loads. Moreover, the surface finish on the workpiece was consistently better for the EDMed inserts. The thesis discusses the relevance of the finite element method in the analysis of metal cutting processes, so that metal machinists can design, manufacture and deliver goods (tools) to the market quickly and on time without going through the hassle of trial and error approach for new products. Improvements in manufacturing technologies require better knowledge of modelling metal cutting processes. Technically the use of computational models has a great value in reducing or even eliminating the number of experiments traditionally used for tool design, process selection, machinability evaluation, and chip breakage investigations. In this work, much interest in theoretical and experimental investigations of metal machining were given special attention. Finite element analysis (FEA) was given priority in this study to predict tool wear and coating deformations during machining. Particular attention was devoted to the complicated mechanisms usually associated with metal cutting, such as interfacial friction; heat generated due to friction and severe strain in the cutting region, and high strain rates. It is therefore concluded that Roughened contact surface comprising of peaks and valleys coated with hard materials (TiN) provide wear-resisting properties as the coatings get entrapped in the valleys and help reduce friction at chip-tool interface. The contributions to knowledge: a. Relates to a wear-resisting surface structure for application in contact surfaces and structures in metal cutting and forming tools with ability to give wear-resisting surface profile. b. Provide technique for designing tool with roughened surface comprising of peaks and valleys covered in conformal coating with a material such as TiN, TiC etc which is wear-resisting structure with surface roughness profile compose of valleys which entrap residual coating material during wear thereby enabling the entrapped coating material to give improved wear resistance. c. Provide knowledge for increased tool life through wear resistance, hardness and chemical stability at high temperatures because of reduced friction at the tool-chip and work-tool interfaces due to tool coating, which leads to reduced heat generation at the cutting zones. d. Establishes that Undulating surface topographies on cutting tips tend to hold coating materials longer in the valleys, thus giving enhanced protection to the tool and the tool can cut faster by 40% and last 60% longer than conventional tools on the markets today.

Adsorption Calorimetry for Energy Conversion Technologies: Applications in Organic Photovoltaics, Catalysis, and Atomic Layer Deposition

Thesis (Ph.D.)--University of Washington, 2016-07

Cornered Asymptotically Hyperbolic Metrics

Thesis (Ph.D.)--University of Washington, 2016-08