972 resultados para 111-70M58
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Mode of access: Internet.
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"December 31, 1992."--Cover letter.
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Cover title: Home health agencies rules & regulations.
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"Effective July 1, 1989."
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Mode of access: Internet.
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Includes Rules and regulations relating to the operation of private employment agencies.
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Mode of access: Internet.
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Hearings held at Washington, Sept.2-29; Schenectady, Sept.30 and Oct.1, and at New York, Oct.6, 1948.
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Includes index.
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The use of diamond as a semiconductor for the realization of transistor structures, which can operate at high temperatures (>700 K), is of increasing interest. In terms of bipolar devices, the growth of n-type phosphorus doped diamond is more efficient on the (111) growth plane; p-type boron-doped diamond growth has been most usually grown in the (100) direction and, hence, this study into the electronic properties, at high temperatures, of boron-doped diamond (111) homoepitaxial layers. It is shown that highly doped layers (hole carrier concentrations as high as 2×1020 cm-3) can be produced without promoting the onset of (unwanted) hopping conduction. The persistence of valance-band conduction in these films enables relatively high mobility values to be measured ( ~ 20 cm2/V?s) and, intriguingly, these values are not significantly reduced at high temperatures. The layers also display very low compensation levels, a fact that may explain the high mobility values since compensation is required for hopping conduction. The results are discussed in terms of the potential of these types of layers for use with high temperature compatible diamond transistors.