Factors influencing colour production from the sugar medium used for the rapid approximation of bacterial counts in fishery products

Results of the studies carried out to elucidate the factors influencing colour production from the sugar medium used for the rapid approximation of bacterial counts in fishery products are reported. The effect of particle size, trace elements, salt soluble protein and non-protein fractions, rate of multiplication of bacteria, in the medium, surface bacteria and the rate of colour production by individual strains of bacteria were studied. It is observed that the best results are obtained when a sea-water homogenate is used.

TIME RESOLVED REFLECTIVITY MEASUREMENTS APPLIED TO RAPID ISOTHERMAL ANNEALING OF ION IMPLANTED SILICON.

The annealing of ion implantation damage in silicon by rapid isothermal heating has been monitored by the time resolved reflectivity (TRR) method. This technique was applied simultaneously at a wavelength of 632. 8nm and also at 1152nm, where the optical absorption coefficient of silicon is less. The two wavelength method simplifies the interpretation of TRR results, extends the measurement depth and allows good resolution of the position of the interface between amorphous and crystalline silicon. The regrowth of amorphous layers in silicon, created by self implantation and implanted with electrically active impurities, was observed. Regrowth in rapid isothermal annealing occurs during the heating up stage of typical thermal cycles. Impurities such as B, P, and As increase the regrowth rate in a manner consistent with a vacancy model for regrowth. The maximum regrowth rate in boron implanted silicon is limited by the solid solubility.

Performance of CMOS Devices in Silicon-on-Sapphire Films After Solid-Phase Epitaxial Growth With Rapid Electron-Beam Heating

The crystal quality of 0.3-μm-thick as-grown epitaxial silicon-on-sapphire (SOS) was improved using solid-phase epitaxy (SPE) by implantation with silicon to 1015 ions/cm2 at 175 keV and rapid annealing using electron-beam heating, n-channel and p-channel transistormobilities increased by 31 and 19 percent, respectively, and a reduction in ring-oscillator stage delay confirmed that crystal defects near the upper silicon surface had been removed. Leakage in n-channel transistors was not significantly affected by the regrowth process but for p-channel transistors back-channel leakage was considerably greater than for the control devices. This is attributed to aluminum released by damage to the sapphire during silicon implantation. © 1985 IEEE

RESIDUAL DEFECTS FOLLOWING RAPID ANNEALING OF BORON IMPLANTED SILICON WITH AND WITHOUT PREAMORPHISATION BY SILICON IMPLANTATION.

Implants of boron into silicon which has been made amorphous by silicon implantation have a shallower depth profile than the same implants into silicon. This results in higher activation and restricted diffusion of the B implants after annealing, and there are also significant differences in the microstructure after annealing compared with B implants into silicon. Rapid isothermal heating with an electron beam and furnace treatments are used to characterize the defect structure as a function of time and temperature. Defects are seen to influence the diffusion of non-substitutional boron.

Manufacturing vision and competitiveness

Discusses a refinement to the process by which manufacturing strategy is created. Builds on an existing strategy process (Platts, 1990) and adapts it to fit more closely within the dynamic manufacturing vision. The method for creating a manufacturing vision allows a business to do this in a two- to three-week period as part of a 10-12 week manufacturing strategy project. A conceptual model of manufacturing vision has been developed that enables practitioners to explore the factors that influenced the potential competitive contribution of manufacturing and to agree an explicit direction for change. Describes the successful application of the process in six manufacturing organizations and highlights the practical limitations of the approach.

Reasons for roadmapping: A study of the Singaporean SME manufacturing sector

To encourage Singaporean small and medium sized enterprises to move up the value chain, Operation and Technology Roadmapping (OTR) has been developed and introduced to the sector. This technique is based upon the T-Plan process developed at Cambridge University. To-date close to thirty companies have used the process to create a 'first-cut' roadmap. This paper initially reviews the application of roadmapping in small companies, and then highlights the various areas where the companies have applied the roadmapping technique. © 2004 IEEE.

Manufacturing clarity

A framework has been developed for the UK economy that categorizes companies who provides a more defined perspective on the structure of the economy in order to help decision makers, government and industry to achieve sustained economic growth. The Institute for Manufacturing (IfM) has established a broader definition of manufacturing that equates manufacturing to the full cycle of activities from research and development, through design, production, logistics and services, to end of life management, within an economic and social context. This approach recognizes that manufacturing firms turn ideas into products and services and that they are inventors, innovators, global supply chain managers and service providers. It is hoped that this categorization provides policy-makers with a clear frame of reference for discussing measures to adapt interventions to address the needs of the diverse set of companies.

Rapid evolution, genetic variations, and functional association of the human spermatogenesis-related gene NYD-SP12

NYD-SP12 is a recently identified spermatogenesis-related gene with a pivotal role in human testis development. In this study, we analyzed between-species divergence and within-species variation of NYD-SP12 in seven representative primate species, four wo