Lead free heterogeneous multilayers with giant magneto electric coupling for microelectronics/microelectromechanical systems applications

Lead free magneto electrics with a strong sub resonant (broad frequency range) magneto electric coupling coefficient (MECC) is the goal of the day which can revolutionise the microelectronics and microelectromechanical systems (MEMS) industry. We report giant resonant MECC in lead free nanograined Barium Titanate–CoFe (Alloy)-Barium Titanate [BTO-CoFe-BTO] sandwiched thin films. The resonant MECC values obtained here are the highest values recorded in thin films/ multilayers. Sub-resonant MECC values are quite comparable to the highest MECC reported in 2-2 layered structures. MECC got enhanced by two orders at a low frequency resonance. The results show the potential of these thin films for transducer, magnetic field assisted energy harvesters, switching devices, and storage applications. Some possible device integration techniques are also discussed

Marine Product Exports of Kerala in the ASEAN India Free Trade Area: Possibilities and Challenges

In the backdrop of issues encountered by the marine product exports from Kerala in the traditional strongholds of the European Union and the United States, there is a need to target newer markets. The ASEAN India Trade in Goods Agreement (TIGA) though proposes to liberalize trade between India and the ASEAN member nations, fails to deliver greater market access for our marine products in the markets of the ASEAN nations. This can be attributed to factors such as the lower prevailing MFN base rate in the ASEAN nations, tariff reduction commitments reciprocated by them being lesser than India’s offers, inclusion of our prominent items of export in the restrictive lists of most of the ASEAN nations etc. Export forecast suggests that this is a market to be reckoned, which in turn stipulates the need to secure greater concessions and preferential treatment for our marine product exports in the ASEAN nations to capitalize on the gains that have been made

Reliable and Damage-Free Estimation of Resistivity of ZnO Thin Films for Photovoltaic Applications Using Photoluminescence Technique

This work projects photoluminescence (PL) as an alternative technique to estimate the order of resistivity of zinc oxide (ZnO) thin films. ZnO thin films, deposited using chemical spray pyrolysis (CSP) by varying the deposition parameters like solvent, spray rate, pH of precursor, and so forth, have been used for this study. Variation in the deposition conditions has tremendous impact on the luminescence properties as well as resistivity. Two emissions could be recorded for all samples—the near band edge emission (NBE) at 380 nm and the deep level emission (DLE) at ∼500 nm which are competing in nature. It is observed that the ratio of intensities of DLE to NBE ( DLE/ NBE) can be reduced by controlling oxygen incorporation in the sample. - measurements indicate that restricting oxygen incorporation reduces resistivity considerably. Variation of DLE/ NBE and resistivity for samples prepared under different deposition conditions is similar in nature. DLE/ NBE was always less than resistivity by an order for all samples.Thus from PL measurements alone, the order of resistivity of the samples can be estimated.

Degrees of Free Word-Order and Freely Rewriting Restarting Automata

In natural languages with a high degree of word-order freedom syntactic phenomena like dependencies (subordinations) or valencies do not depend on the word-order (or on the individual positions of the individual words). This means that some permutations of sentences of these languages are in some (important) sense syntactically equivalent. Here we study this phenomenon in a formal way. Various types of j-monotonicity for restarting automata can serve as parameters for the degree of word-order freedom and for the complexity of word-order in sentences (languages). Here we combine two types of parameters on computations of restarting automata: 1. the degree of j-monotonicity, and 2. the number of rewrites per cycle. We study these notions formally in order to obtain an adequate tool for modelling and comparing formal descriptions of (natural) languages with different degrees of word-order freedom and word-order complexity.

Lithography-free micro- and nanostructuring based on conventional plasma etching

In now-a-days semiconductor and MEMS technologies the photolithography is the working horse for fabrication of functional devices. The conventional way (so called Top-Down approach) of microstructuring starts with photolithography, followed by patterning the structures using etching, especially dry etching. The requirements for smaller and hence faster devices lead to decrease of the feature size to the range of several nanometers. However, the production of devices in this scale range needs photolithography equipment, which must overcome the diffraction limit. Therefore, new photolithography techniques have been recently developed, but they are rather expensive and restricted to plane surfaces. Recently a new route has been presented - so-called Bottom-Up approach - where from a single atom or a molecule it is possible to obtain functional devices. This creates new field - Nanotechnology - where one speaks about structures with dimensions 1 - 100 nm, and which has the possibility to replace the conventional photolithography concerning its integral part - the self-assembly. However, this technique requires additional and special equipment and therefore is not yet widely applicable. This work presents a general scheme for the fabrication of silicon and silicon dioxide structures with lateral dimensions of less than 100 nm that avoids high-resolution photolithography processes. For the self-aligned formation of extremely small openings in silicon dioxide layers at in depth sharpened surface structures, the angle dependent etching rate distribution of silicon dioxide against plasma etching with a fluorocarbon gas (CHF3) was exploited. Subsequent anisotropic plasma etching of the silicon substrate material through the perforated silicon dioxide masking layer results in high aspect ratio trenches of approximately the same lateral dimensions. The latter can be reduced and precisely adjusted between 0 and 200 nm by thermal oxidation of the silicon structures owing to the volume expansion of silicon during the oxidation. On the basis of this a technology for the fabrication of SNOM calibration standards is presented. Additionally so-formed trenches were used as a template for CVD deposition of diamond resulting in high aspect ratio diamond knife. A lithography-free method for production of periodic and nonperiodic surface structures using the angular dependence of the etching rate is also presented. It combines the self-assembly of masking particles with the conventional plasma etching techniques known from microelectromechanical system technology. The method is generally applicable to bulk as well as layered materials. In this work, layers of glass spheres of different diameters were assembled on the sample surface forming a mask against plasma etching. Silicon surface structures with periodicity of 500 nm and feature dimensions of 20 nm were produced in this way. Thermal oxidation of the so structured silicon substrate offers the capability to vary the fill factor of the periodic structure owing to the volume expansion during oxidation but also to define silicon dioxide surface structures by selective plasma etching. Similar structures can be simply obtained by structuring silicon dioxide layers on silicon. The method offers a simple route for bridging the Nano- and Microtechnology and moreover, an uncomplicated way for photonic crystal fabrication.

Computation of locally free class groups

We show that the locally free class group of an order in a semisimple algebra over a number field is isomorphic to a certain ray class group. This description is then used to present an algorithm that computes the locally free class group. The algorithm is implemented in MAGMA for the case where the algebra is a group ring over the rational numbers.

On Alternating Non-Context-Free Grammars

We study several extensions of the notion of alternation from context-free grammars to context-sensitive and arbitrary phrase-structure grammars. Thereby new grammatical characterizations are obtained for the class of languages that are accepted by alternating pushdown automata.

Computing Generators of Free Modules over Orders in Group Algebras

Let E be a number field and G be a finite group. Let A be any O_E-order of full rank in the group algebra E[G] and X be a (left) A-lattice. We give a necessary and sufficient condition for X to be free of given rank d over A. In the case that the Wedderburn decomposition E[G] \cong \oplus_xM_x is explicitly computable and each M_x is in fact a matrix ring over a field, this leads to an algorithm that either gives elements \alpha_1,...,\alpha_d \in X such that X = A\alpha_1 \oplus ... \oplusA\alpha_d or determines that no such elements exist. Let L/K be a finite Galois extension of number fields with Galois group G such that E is a subfield of K and put d = [K : E]. The algorithm can be applied to certain Galois modules that arise naturally in this situation. For example, one can take X to be O_L, the ring of algebraic integers of L, and A to be the associated order A(E[G];O_L) \subseteq E[G]. The application of the algorithm to this special situation is implemented in Magma under certain extra hypotheses when K = E = \IQ.

Hyperfine structure and isotopic shift of the n^2 P_J levels (n = 7-10) of ^203,205 TI measured by Doppler-free two-photon spectroscopy

Using Doppler-free two-photon absorption spectroscopy, we have measured hyperfine splitting constants as well as isotopic level shifts of the 6s^2 np ^2 P_l/2,3/2 states in (n=7-10) in ^203 TI and ^205 TI. Calculations for hyperfine constants and electron density at the nucleus have been performed by the Dirac-Fock method. The experimental results are compared with these calculations as well as with the predictions of the semiempirical theory.

Dress- and Auto- Makers in the “Free Trade” Arena

Even though there have been many studies on the impact of trade liberalisation on labour standards, most of the studies are at national level, and there is a lack of research at industry level. This paper examines the impact of free trade on labour standards in capital- and labour-intensive industries in a developing country. For empirical findings, I take the case of the garment industry, representing labour-intensive industry, and automotive industry, representing capital-intensive industry, in Indonesia in the face of ASEAN Free Trade Area (AFTA). Since the garment industry is a women-dominated industry, while the automotive industry is a men-dominated industry, this paper also employs a feminist perspective. As such, this paper also investigates whether free trade equally affects men and women workers. Besides free trade, other independent variables are also taken into account. Employing quantitative and qualitative methods, empirical evidence shows that there is an indication that free trade has a negative relationship with labour standards in the garment industry, whereas a positive relationships with labour standards in the automotive industry. This implies that free trade might result in decreasing labour standards in labour-intensive industry, while increasing standards in capital-intensive industry. It can also be inferred that free trade unequally affect men and women workers, in that women workers bear the brunt of free trade. The results also show that other internal and external independent variables are indicated to have relationships with labour standards in the garment and automotive industries. Therefore, these variables need to be considered in examining the extent of the impact of free trade on labour standards in labour- and capital-intensive industries.

A Government-Binding Based Parser for Warlpiri, a Free-Word Order Language

Free-word order languages have long posed significant problems for standard parsing algorithms. This thesis presents an implemented parser, based on Government-Binding (GB) theory, for a particular free-word order language, Warlpiri, an aboriginal language of central Australia. The words in a sentence of a free-word order language may swap about relatively freely with little effect on meaning: the permutations of a sentence mean essentially the same thing. It is assumed that this similarity in meaning is directly reflected in the syntax. The parser presented here properly processes free word order because it assigns the same syntactic structure to the permutations of a single sentence. The parser also handles fixed word order, as well as other phenomena. On the view presented here, there is no such thing as a "configurational" or "non-configurational" language. Rather, there is a spectrum of languages that are more or less ordered. The operation of this parsing system is quite different in character from that of more traditional rule-based parsing systems, e.g., context-free parsers. In this system, parsing is carried out via the construction of two different structures, one encoding precedence information and one encoding hierarchical information. This bipartite representation is the key to handling both free- and fixed-order phenomena. This thesis first presents an overview of the portion of Warlpiri that can be parsed. Following this is a description of the linguistic theory on which the parser is based. The chapter after that describes the representations and algorithms of the parser. In conclusion, the parser is compared to related work. The appendix contains a substantial list of test cases ??th grammatical and ungrammatical ??at the parser has actually processed.

Corner Flows in Free Liquid Films

A lubrication-flow model for a free film in a corner is presented. The model, written in the hyperbolic coordinate system ξ = x² – y², η = 2xy, applies to films that are thin in the η direction. The lubrication approximation yields two coupled evolution equations for the film thickness and the velocity field which, to lowest order, describes plug flow in the hyperbolic coordinates. A free film in a corner evolving under surface tension and gravity is investigated. The rate of thinning of a free film is compared to that of a film evolving over a solid substrate. Viscous shear and normal stresses are both captured in the model and are computed for the entire flow domain. It is shown that normal stress dominates over shear stress in the far field, while shear stress dominates close to the corner.

The Inertio-Elastic Planar Entry Flow of Low-Viscosity Elastic Fluids in Micro-fabricated Geometries

The non-Newtonian flow of dilute aqueous polyethylene oxide (PEO) solutions through microfabricated planar abrupt contraction-expansions is investigated. The contraction geometries are fabricated from a high-resolution chrome mask and cross-linked PDMS gels using the tools of soft-lithography. The small length scales and high deformation rates in the contraction throat lead to significant extensional flow effects even with dilute polymer solutions having time constants on the order of milliseconds. The dimensionless extra pressure drop across the contraction increases by more than 200% and is accompanied by significant upstream vortex growth. Streak photography and videomicroscopy using epifluorescent particles shows that the flow ultimately becomes unstable and three-dimensional. The moderate Reynolds numbers (0.03 ≤ Re ≤ 44) associated with these high Deborah number (0 ≤ De ≤ 600) microfluidic flows results in the exploration of new regions of the Re-De parameter space in which the effects of both elasticity and inertia can be observed. Understanding such interactions will be increasingly important in microfluidic applications involving complex fluids and can best be interpreted in terms of the elasticity number, El = De/Re, which is independent of the flow kinematics and depends only on the fluid rheology and the characteristic size of the device.