Zooplankton standing stock and community structure along Karnataka Coast, west coast of India

Distribution of zooplankton along two transects at Karwar and Ratnagiri, west coast of India, was studied. The standing stock of zooplankton was relatively high in the neritic zone with the highest value [358 ml/100 m super(3)] in the area off Ratnagiri due to the aggregation of fish larvae and hydromedusae. Maximum zooplankton production in these areas was noticed with the low temperature and low dissolved oxygen during postmonsoon season. At Karwar the highest biomass [188 ml/100 m super(3)] was observed from the nearshore station due to swarms of the cladoceran Penilia avirostris and the pteropod Cresis acicula when the salinity was low. The fluctuations in numerical abundance and percentage composition of all the major planktonic groups are discussed. The fishery of these areas is compared with the zooplankton standing stock.

Social and economic implications of the fishery distribution patterns on Lake Victoria, Uganda

The fisheries of Lake Victoria have undergonea dramatic transformation during the last two decades. From being a locally based fishery with little intervention and capital investment from outside,the present fishery is dominated by national and international capital penetrating the industry. It is explosion in the growth of nile perch and the strong demand devloped for this fishin the global markets, which have transformed the fisheries of the Lake victoria. This report presents the results of a survey carried out between October 2001 and February 2002 about the fishery distribution patterns and their impacts on fisher communities of Lake Victoria. The fisheries distribution pattern of the lake is described as well as the flows and benefits from the fisheries resource and the resource constraints and sustainability options. A major part of the paper discusses some of the socio-economic impacts of the rapid changes that are responsible for the present fisheries. It particularly focuses on the effect of the Nile perch boom, its globalization and the development of the fish industry in Uganda, on food security and employment for the local population.

Shark fin rays: technology of extraction

A simple process is described for extraction of rays from shark fins. The process consists in treating the rays with acetic acid to soften the tissue, separation of the rays by hand and drying. White fins yield almost double the quantity of rays compared to black fins.

The technology of milkfish hatchery in Indonesia

The culture of milkfish (Chanos chanos), which is the oldest fish cultured in Indonesia, has spread to almost all the provinces in the country. In order to answer the demand of milkfish fry, without decreasing production and wild fry supply, artificial fry production in big and small-scale hatcheries is being practiced. Details are given of the milkfish hatchery system, listing also the major criteria to be taken into account for site selection. Operation of the hatchery is described, outlining the following activities: broodstock rearing; hormone implantation; broodstock maintenance; egg production and harvest; and, larval rearing.

Effect of the technology of implanting nitrogen into buried oxide on the radiation hardness of the top gate oxide for partially depleted SOIPMOSFET

The effect of implanting nitrogen into buried oxide on the top gate oxide hardness against total irradiation does has been investigated with three nitrogen implantation doses (8 x 10(15), 2 x 10(16) and 1 x 10(17) cm(-2)) for partially depleted SOI PMOSFET. The experimental results reveal the trend of negative shift of the threshold voltages of the studied transistors with the increase of nitrogen implantation dose before irradiation. After the irradiation with a total dose of 5 x 10(5) rad(Si) under a positive gate voltage of 2V, the threshold voltage shift of the transistors corresponding to the nitrogen implantation dose 8 x 10(15) cm(-2) is smaller than that of the transistors without implantation. However, when the implantation dose reaches 2 x 10(16) and 1 x 10(17) cm(-2), for the majority of the tested transistors, their top gate oxide was badly damaged due to irradiation. In addition, the radiation also causes damage to the body-drain junctions of the transistors with the gate oxide damaged. All the results can be interpreted by tracing back to the nitrogen implantation damage to the crystal lattices in the top silicon.

Effects of the technology of implanting nitrogen into buried oxide layer on the characteristics of partially depleted SOI nMOSFET

The effects, caused by the process of the implantation of nitrogen in the buried oxide layer of SIMOX wafer, on the characteristics of partially depleted silicon-on-insulator nMOSFET have been studied. The experimental results show that the channel electron mobilities of the devices fabricated on the SIMON (separation by implanted oxygen and nitrogen) wafers are lower than those of the devices made on the SIMOX (separation by implanted oxygen) wafers. The devices corresponding to the lowest implantation dose have the lowest mobility within the range of the implantation dose given in this paper. The value of the channel electron mobility rises slightly and tends to a limit when the implantation dose becomes greater. This is explained in terms of the rough Si/SiO2 interface due to the process of implantation of nitrogen. The increasing negative shifts of the threshold voltages for the devices fabricated on the SIMON wafers are also observed with the increase of implanting dose of nitrogen. However, for the devices fabricated on the SIMON wafers with the lowest dose of implanted nitrogen in this paper, their threshold voltages are slightly larger on the average than those prepared on the SIMOX wafers. The shifts are considered to be due to the increment of the fixed oxide charge in SiO2 layer and the change of the density of the interface-trapped charge with the value and distribution included. In particular, the devices fabricated on the SIMON wafers show a weakened kink effect, compared to the ones made on the SIMOX wafers.

Color filter-less technology of LED back light for LCD-TV - art. no. 68410G

Back Light Unit (BLU) and Color Filter are the two key components for the perfect color display of Liquid Crystal Display (LCD) device. LCD can not light actively itself, so a form of illumination, Back Light Unit is needed for its display. The color filter which consists of RGB primary colors, is used to generate three basic colors for LCD display. Traditional CCFL back light source has several disadvantages, while LED back light technology makes LCD obtain quite higher display quality than the CCFL back light. LCD device based on LED back light owns promoted efficiency of display. Moreover it can generate color gamut above 100% of the NTSC specification. Especially, we put forward an idea of Color Filter-Less technology that we design a film which is patterned of red and green emitting phosphors, then make it be excited by a blue light LED panel we fabricate, for its special emitting mechanism, this film can emit RGB basic color, therefore replace the color filter of LCD device. This frame typically benefits for lighting uniformity and provide pretty high light utilization ratio. Also simplifies back light structure thus cut down the expenses.

Study on the technology of thermal cracking of paraffin to alpha olefins

Alpha olefins are mainly produced from paraffin cracking in China, but their quality is not good because of bad quality of cracking feed and outdated technology. The technology of paraffin once-through cracking, paraffin recycle cracking of removing the heavy fraction after wax vaporizing and that of removing the heavy fraction before wax vaporizing were investigated in this paper. It was found that the technology of paraffin recycle cracking of removing the heavy fraction before wax vaporizing is new and better under the same operating conditions. Using hard paraffin (mp 54-56 degrees C) as feed, the high-quality alpha olefins products (C-5-C-21) containing more than 97 wt% of olefins and more than 88 wt% of alpha olefins are produced under optimum process conditions, which are a steam to paraffin ratio of 15 wt%, process temperature of 600 degrees C, low hydrocarbon partial pressure and residence time of 2 s. In addition, with the technology of the second injecting steam in ethylene cracking used in paraffin cracking, producing coke in paraffin cracking furnace has been markedly reduced.