997 resultados para ELECTRON-AFFINITY

How does cyclic electron flow alleviate photoinhibition in Arabidopsis? 

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Theory of electron field emission from diamond and diamond-like carbon

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Electron field emission from diamond and diamond-like carbon for field emission displays

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Mechanisms of electron field emission from diamond, diamond-like carbon, and nanostructured carbon

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Mechanisms of elastodynamic erosion of electron-beam thermal barrier coatings

Relevância:

20.00% 20.00%

Publicador:

Veja mais

The application of carbon nanotube electron sources to the electron microscope - art. no. 70370P

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Electron-electron interactions and doping dependence of the two-phonon Raman intensity in graphene

Relevância:

20.00% 20.00%

Publicador:

Veja mais

RAPID ISOTHERMAL PROCESSING WITH ELECTRON-BEAMS OF SMALL-GEOMETRY CMOS DEVICES

Relevância:

20.00% 20.00%

Publicador:

Veja mais

ELECTRON-BEAM PROCESSING FOR MOS DEVICES WITH SHALLOW JUNCTIONS

Relevância:

20.00% 20.00%

Publicador:

Veja mais

HIGHLY CONTROLLED DIFFUSION OF ION-IMPLANTED ARSENIC BY MULTIPLE SCAN ELECTRON-BEAM HEATING

Relevância:

20.00% 20.00%

Publicador:

Veja mais

TECHNIQUES FOR PRODUCING DEFECT-FREE SOI BY DUAL ELECTRON-BEAM HEATING OF DEPOSITED POLYSILICON

Relevância:

20.00% 20.00%

Publicador:

Veja mais

ELECTRON-BEAM ANNEALING OF B-IMPLANTED, P-IMPLANTED, AS-IMPLANTED, SB-IMPLANTED, AND GA-IMPLANTED SILICON BY MULTIPLE-SCAN METHOD

Relevância:

20.00% 20.00%

Publicador:

Veja mais

RECRYSTALLIZATION OF CVD POLY-SI ON INSULATOR BY DUAL ELECTRON-BEAM PROCESSING

Relevância:

20.00% 20.00%

Publicador:

Veja mais

COMPARATIVE STRUCTURAL AND ELECTRICAL CHARACTERIZATION OF SCANNING-ELECTRON AND PULSED-LASER-ANNEALED SILICON

Relevância:

20.00% 20.00%

Publicador:

Veja mais

CHARACTERIZATION OF MULTIPLE-SCAN ELECTRON-BEAM ANNEALING METHOD

Relevância:

20.00% 20.00%

Publicador:

Veja mais