895 resultados para Amorphous iron
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Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
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Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
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Amorphous silicon carbonitride (a-SiCN:H) films were synthesized by radiofrequency (RF) Plasma Enhanced Vapor Chemical Deposition (PECVD) using hexamethyldisilazane (HMDSN) as precursor compound. Then, the films were post-treated by Plasma Immersion Ion Implantation (PIII) in argon atmosphere from 15 to 60 min The hardness of the film enhanced after ion implantation, and the sample treated at 45 min process showed hardness greater than sixfold that of the untreated sample. This result is explained by the crosslinking and densification of the structure Films were exposed to oxygen plasma for determining of the etching rate. It decreased monotonically from 33 angstrom/min to 19 angstrom/min for the range of process time, confirming structural alterations. Hydrophobic character of the a-SiCN:H films were modified immediately after ion bombardment, due to incorporation of polar groups. However, the high wettability of the films acquired by the ion implantation was diminished after aging in air. Therefore, argon PIII made a-SiCN.H films mechanically more resistant and altered their hydrophobic character.
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Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
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Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
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Pós-graduação em Química - IQ
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Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
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Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
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Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
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Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
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Amorphous silicon carbonitride (a-SiCN:H) films were deposited from hexamethyldisilazane (HMDSN) organic compounds via radio-frequency (RF) glow discharges. Afterwards the films were bombarded, from 15 to 60 min, with nitrogen ions using Plasma Immersion Ion Implantation (PIII) technique. X-ray photoelectron spectroscopy (XPS) showed that O-containing groups increased, while C-C and/or C-H groups decreased with treatment time. This result indicates chemical alterations of the polymeric films with the introduction of polar groups on the surface, which changes the surface wettability. In fact, the hydrophobic nature of a-SiCN:H films (contact angle of 100 degrees) was changed by nitrogen ion implantation and, and after aging in atmosphere air, all samples preserved the hydrophilic character (contact angle <80 degrees) independently of treatment time. The exposure of the films to oxygen plasma was performed to evaluate the etching rate, which dropped from 24% to 6% while the implantation time increased from 15 to 60 min. This data suggests that Pill increased the film structure strength, probably due to crosslinking enhancement of polymeric chains. Therefore, the treatment with nitrogen ions via Pill process was effective to modify the wettability and oxidation resistance of a-SiCN:H films. (C) 2014 Elsevier Ltd. All rights reserved.
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Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
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The research involving new materials has always been considered as a differential in the development of a technology company. This occurred naturally since ancient times, often motivated by reasons of a certain age, where the most common material used was also the name of your time and may be cited as an example the Bronze Age, and later was the Iron. Currently, the use of firearms are they used in resolving conflicts between countries, or a more equivocal, as an instrument of social banditry make innovations in the area of shielding welcome, whether for personal use, in the form of vests or vehicle such as cars, tanks and even aircraft. In this context, is a Silicon Carbide Ceramic, with low density and high hardness. Thus, the aim of this study is the evaluation and comparison of these materials, seeking to improve their properties by means of additives such as boron and silicon metal and amorphous YAG. For this work, the specimens were pre-shaped by means of uniaxial later to be referred for isostatic pressing and sintering. The maximum percentage for each additive was 5%, except for the YAG whose percentage was 8.2% (mass percentage). All compositions were subjected to the same tests (x-ray diffraction, apparent density, optical microscopy, Vickers hardness, scanning electron Microscopita), so that one could draw a comparison between the materials under study, samples that showed better mechanical properties and micro structural, related here by hardness testing and microscopy (optical and SEM) were the silicon carbide doped with YAG and alumina samples, demonstrating the potential of these materials for ballistic protection. Other compositions have high porosity, which is highly undesirable, since in order to harmful influences on the mechanical properties discussed below