950 resultados para diffusion coefficients
Resumo:
Films of Ti-Si-N obtained by reactively sputtering a TiSi_2, a Ti_5Si_3, or a Ti_3Si target are either amorphous or nanocrystalline in structure. The atomic density of some films exceeds 10^23 at./cm^3. The room-temperature resistivity of the films increases with the Si and the N content. A thermal treatment in vacuum at 700 °C for 1 hour decreases the resistivity of the Ti-rich films deposited from the Ti_5Si_3 or the Ti_3Si target, but increases that of the Si-rich films deposited from the TiSi_2 target when the nitrogen content exceeds about 30 at. %.
Ti_(34)Si_(23)N_(43) deposited from the Ti_5Si_3 target is an excellent diffusion barrier between Si and Cu. This film is a mixture of nanocrystalline TiN and amorphous SiN_x. Resistivity measurement from 80 K to 1073 K reveals that this film is electrically semiconductor-like as-deposited, and that it becomes metal-like after an hour annealing at 1000 °C in vacuum. A film of about 100 nm thick, with a resistivity of 660 µΩcm, maintains the stability of Si n+p shallow junction diodes with a 400 nm Cu overlayer up to 850 °C upon 30 min vacuum annealing. When used between Si and Al, the maximum temperature of stability is 550 °C for 30 min. This film can be etched in a CF_4/O_2 plasma.
The amorphous ternary metallic alloy Zr_(60)Al_(15)Ni_(25) was oxidized in dry oxygen in the temperature range 310 °C to 410 °C. Rutherford backscattering and cross-sectional transmission electron microscopy studies suggest that during this treatment an amorphous layer of zirconium-aluminum-oxide is formed at the surface. Nickel is depleted from the oxide and enriched in the amorphous alloy below the oxide/alloy interface. The oxide layer thickness grows parabolically with the annealing duration, with a transport constant of 2.8x10^(-5) m^2/s x exp(-1.7 eV/kT). The oxidation rate is most likely controlled by the Ni diffusion in the amorphous alloy.
At later stages of the oxidation process, precipitates of nanocrystalline ZrO_2 appear in the oxide near the interface. Finally, two intermetallic phases nucleate and grow simultaneously in the alloy, one at the interface and one within the alloy.
Resumo:
Experimental Joule-Thomson measurements were made on gaseous propane at temperatures from 100 to 280˚F and at pressures from 8 to 66 psia. Joule-Thomson measurements were also made on gaseous n-butane at temperatures from 100 to 280˚ and at pressures from 8 to 42 psia. For propane, the values of these measurements ranged from 0.07986˚F/psi at 280˚F and 8.01 psia to 0.19685˚F/psi at 100˚F and 66.15 psia. For n-butane, the values ranged from 0.11031˚F/psi at 280˚F and 9.36 psia to 0.30141˚F/psi at 100˚F and 41.02 psia. The experimental values have a maximum error of 1.5 percent.
For n-butane, the measurements of this study did not agree with previous Joule-Thomson measurements made in the Laboratory in 1935. The application of a thermal-transfer correction to the previous experimental measurements would cause the two sets of data to agree. Calculated values of the Joule-Thomson coefficient from other types of p-v-t data did agree with the present measurements for n-butane.
The apparatus used to measure the experimental Joule-Thomson coefficients had a radial-flow porous thimble and was operated at pressure changes between 2.3 and 8.6 psi. The major difference between this and other Joule-Thomson apparatus was its larger weight rates of flow (up to 6 pounds per hour) at atmospheric pressure. The flow rate was shown to have an appreciable effect on non-isenthalpic Joule-Thomson measurements.
Photographic materials on pages 79-81 are essential and will not reproduced clearly on Xerox copies. Photographic copies should be ordered.
Resumo:
An explicit formula is obtained for the coefficients of the cyclotomic polynomial Fn(x), where n is the product of two distinct odd primes. A recursion formula and a lower bound and an improvement of Bang’s upper bound for the coefficients of Fn(x) are also obtained, where n is the product of three distinct primes. The cyclotomic coefficients are also studied when n is the product of four distinct odd primes. A recursion formula and upper bounds for its coefficients are obtained. The last chapter includes a different approach to the cyclotomic coefficients. A connection is obtained between a certain partition function and the cyclotomic coefficients when n is the product of an arbitrary number of distinct odd primes. Finally, an upper bound for the coefficients is derived when n is the product of an arbitrary number of distinct and odd primes.
Resumo:
Measurements of friction and heat transfer coefficients were obtained with dilute polymer solutions flowing through electrically heated smooth and rough tubes. The polymer used was "Polyox WSR-301", and tests were performed at concentrations of 10 and 50 parts per million. The rough tubes contained a close-packed, granular type of surface with roughness-height-to-diameter ratios of 0.0138 and 0.0488 respectively. A Prandtl number range of 4.38 to 10.3 was investigated which was obtained by adjusting the bulk temperature of the solution. The Reynolds numbers in the experiments were varied from =10,000 (Pr= 10.3) to 250,000 (Pr= 4.38).
Friction reductions as high as 73% in smooth tubes and 83% in rough tubes were observed, accompanied by an even more drastic heat transfer reduction (as high as 84% in smooth tubes and 93% in rough tubes). The heat transfer coefficients with Polyox can be lower for a rough tube than for a smooth one.
The similarity rules previously developed for heat transfer with a Newtonian fluid were extended to dilute polymer solution pipe flows. A velocity profile similar to the one proposed by Deissler was taken as a model to interpret the friction and heat transfer data in smooth tubes. It was found that the observed results could be explained by assuming that the turbulent diffusivities are reduced in smooth tubes in the vicinity of the wall, which brings about a thickening of the viscous layer. A possible mechanism describing the effect of the polymer additive on rough pipe flow is also discussed.