1000 resultados para Al-Arish


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The 940 nm Al-free active region laser diodes and bars with a broad waveguide were designed and fabricated. The stuctures were grown by metal organic chemical vapour deposition. The devices show excellent performances. The maximum output power of 6.7 W in the 100 f^m broad-area laser diodes has been measured, and is 2. 5 times higher than that in the Al-containing active region laser diodes with a narrow waveguide and 1. 7 times higher than that in Al-free active region laser diodes with a narrow waveguide. The 19 % fill-factor laser diode bars emit 33 W, and they can operate at 15W with low degradation rates.

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应用光致发光(PL)、电容-电压(C-V)、深能级瞬态谱(DLTS)和光电导(PC)技术系统研究Al掺杂ZnS_(1-x)Te_x中与Al有关的类DX中心。实验结果表明,ZnS_(1-x)Te_x中存在与Ⅲ-Ⅴ族半导体DX中心相类似的性质。获得与Al有关的类DX中心光离化能E_i(~1.0eV和2.0eV)和发射势垒E_e(0.21eV和0.39eV),这表明ZnS_(1-x)Te_x大晶格弛豫的出现是由类DX中心引起。

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于2010-11-23批量导入

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应用电容-电压、光致荧光和深能级瞬态谱技术研究了分子束外延生长的n型Al掺杂ZnS_(1-x)Te_x外延层深中心。Al掺杂ZnS_(0.977)Te_(0.023)的光致荧光强度明显低于不掺杂的ZnS_(0.977)Te_(0.023),这表明一部分Al原子形成非辐射深中心。Al掺杂ZnS_(1-x)Te_x(x=0,0.017,0.04和0.046)的深能级瞬态傅里叶谱表明,Al引进导带下的0.21和0.39eV电子陷阱,Te除了作为材料合金的成分和等电子中心外,还涉及到一个电子陷阱的形成,其相对导带的能级位置随Te组分增加而减小。实验结果还表明仅有少量掺杂的Al原子形成非辐射中心,这说明Al对于Te组分范围内(x≤0.046)的ZnS_(1-x)Te_x外延层的确是一种非常好的施主杂质。

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于2010-11-23批量导入

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于2010-11-23批量导入

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于2010-11-23批量导入

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用卢瑟福背散射沟道技术研究了1MeVSi~+在衬底加温和室温下以不同剂量注入Al_(0.3)Ga_(0.7)As/GaAs超晶格和GaAs后的晶格损伤。在衬底加温下, 观察到Al_(0.3)Ga_(0.7)As/GaAs超晶格和GaAs都存在一个动态退火速率与缺陷产生速率相平衡的剂量范围, 以及两种速率失去平衡的临界剂量。用热尖峰与碰撞模型解释了晶格损伤积累与注入剂量和衬底温度的关系。

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于2010-11-23批量导入

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于2010-11-23批量导入

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于2010-11-23批量导入

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国家自然科学基金

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于2010-11-23批量导入

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国家自然科学基金