Laser-induced damage of Ti O2 Si O2 high reflector at 1064 nm

A high laser-induced damage threshold (LIDT) TiO2/SiO2 high reflector (HR) at 1064 nm is deposited by e-beam evaporation. The HR is characterized by optical properties, surface, and cross section structure. LIDT is tested at 1064 nm with a 12 ns laser pulse in the one-on-one mode. Raman technique and scanning electron Microscope are used to analyze the laser-induced modification of HR. The possible damage mechanism is discussed. It is found that the LIDT of HR is influenced by the nanometer precursor in the surface, the intrinsic absorption of film material, the compactness of the cross section and surface structure, and the homogeneity of TiO2 layer. Three typical damage morphologies such as flat-bottom pit, delamination, and plasma scald determine well the nanometer defect initiation mechanism. The laser-induced crystallization consists well with the thermal damage nature of HR. (C) 2008 American Institute of Physics.

Guided-mode resonant grating filter with an antireflective surface for the multiple channels

In this paper, a new type of guided-mode resonant grating (GMRG) filter with an antireflective surface called the 'moth-eye structure' for the multiple channels is presented by using rigorous coupled-wave analysis (RCWA) and the S-matrix method. Long range, low sidebands and multiple channels are found when the GMRG filters with antireflective surface are illuminated with incident polarization light. It is calculated that the multiple channel phenomenon can be shown when the depth of antireflective surface is increased. Moreover, the wavelengths of the multiple channels can be easily shifted by changing the depth of the homogenous layer which is under the antireflective surface, and the optical properties of GMRG filters such as low sideband reflection and narrow band are not badly spoiled when the depth is changed.

Novel method for design of surface relief guided-mode resonant gratings at normal incidence

We demonstrate that the surface relief guided-mode resonant gratings with specified central wavelength and FWHM in the visible wavelength range can be designed by analyzing the complex poles of Reflectance and transmission coefficient matrix algorithm (RTCM), a variant of S-matrix propagation algorithm proposed for calculation of multilayer gratings. In addition, FWHM is computed with couple-mode (CM) theory of resonant gratings which is firstly extended by Norton et al. in calculation of waveguide grating. Furthermore, the side band reflections of the filter can be reduced to less than 5% in the visible wavelength with the antireflection (AR) design technique widely used in the thin-film field. (C) 2008 Elsevier B.V. All rights reserved.

Compensation of reflectance response deviations of guided-mode resonant filters induced by overetching fabrication

Unless the fabrication error control is well treated, it easily causes overetched fabrication errors, which causes the resonant peak value deviation during the fabrication process of guided-mode resonant filters (GMRFs). Hence, the fabrication error control becomes a key point for improving the performance of GMRF. We find that, within the range of the groove depth from 93 to 105 nm, the relationship between the overetched error and the resonant peak value deviation is nearly linear, which means that we can compensate the reflectance response deviation and reduce the resonant peak value deviation by the method of covering the layer film on the GMRF. Simulation results show that the deviation is compensated perfectly by this way. (C) 2008 Optical Society of America

Nonpolarizing guided-mode resonance filter

A normal-incidence nonpolarizing guided-mode resonance filter is designed. There are two waveguide layers and one grating layer in the filter. By adjusting the distance between the two waveguide layers, the same resonance wavelength for both TE and TM polarization can be achieved. An antireflection design method is also used to decrease the sideband reflection of the filter. The results show that the filter has high reflection, more than 99.9% at 500 nm, and the FW-HMs of TE- and TM-polarized light are 2.16 and 0.15 nm, respectively. (C) 2009 Optical Society of America