158-μJ pulses from a single-transverse-mode, large-mode-area erbium-doped fiber amplifier

We report the amplification of 10-100-pJ semiconductor diode pulses to an energy of 158 μJ and peak powers >100 kW in a multistage fiber amplifier chain based on a single-mode, large-mode-area erbium-doped amplifier design. To our knowledge these results represent the highest single-mode pulse energy extracted from any doped-fiber system. © 1997 Optical Society of America.

A novel heavily doped drift-auxiliary cathode lateral insulated gate transistor structure

A novel CMOS-compatible, heavily doped drift auxiliary cathode lateral insulated gate transistor (HDD-ACLIGT) structure is analyzed using two-dimensional device simulation techniques. Simulation results indicate that low on-resistance and a fast turn-off time of less than 50 ns can be achieved by incorporating an additional n+ region which is self-aligned to the gate between the p+ auxiliary cathode and the p well, together with an extended p buried layer in an anode-shorted modified lateral insulated gate transistor (MLIGT) structure. The on-state and its transient performance are analyzed in detail. The on-state performances of the HDD-ACLIGT and the MLIGT are compared and discussed. The results indicate that the HDD-ACLIGT structure is well suited for HVICs. The device is also well suited for integration with self-aligned digital CMOS.

Comment on 'processing and microstructure of single grain uranium-doped Y-Ba-Cu-O superconductor'

We comment on the paper by N Hari Babu et al. (2002 Supercond. Sci. Technol. 15 104-10) and point out misinterpretations of the chemical composition of U-bearing deposits observed in Y123. The observed small deposits are those of new compounds which do not contain Cu, rather than refined Y211 plus U, as stated by the authors. We further note that extensive literature, not quoted, is in disagreement by nearly an order of magnitude concerning the values of Pt and U doping at which the optimum value of Jc is obtained. Other related information, presently in the literature, which may be helpful to those working with this high temperature superconducting chemical system, is presented.

Development of the microstructure of uranium-doped Nd-Ba-Cu-O

Melt grown Nd-Ba-Cu-O (NdBCO) has been reported to exhibit higher values of critical current density, Jc and irreversibility field, Hirr, than other (RE)BCO superconductors, such as YBCO. The microstructure of NdBCO typically contains 5-10 μm sized inclusions of the Nd4Ba2Cu2O10 phase (Nd-422) in a superconducting NdBa2Cu3O7-δ phase (Nd-123) matrix. The average size of these inclusions is characteristically larger than that of the Y2BaCuO5 (Y-211) inclusions in YBCO. As a result, there is scope to further refine the Nd-422 size to enhance Jc in NdBCO. Large grain samples of NdBCO superconductor doped with various amounts of depleted UO2 and containing excess Nd-422 have been fabricated by top seeded melt growth under reduced oxygen partial pressure. The effect of the addition of depleted UO2 on the NdBCO microstructure has been studied systematically in samples with and without added CeO2. It is observed that the addition of UO2 refines the NdBCO microstructure via the formation of uranium-containing phase particles in the superconducting matrix. These particles are of approximately spherical geometry with dimensions of around 1 μm. The average size of the nonsuperconducting phase particles in the uranium-doped microstructure is an order of magnitude less than their size in un-doped Nd-123 prepared with excess Nd-422. The critical current density of uranium-doped NdBCO is observed to increase significantly compared to the undoped material.

Microwave power effects on the properties of phosphorus-doped SiC:H films prepared using ECR-CVD

There has been a growing interest in hydrogenated silicon carbide films (SiC:H) prepared using the electron cyclotron resonance-chemical vapour deposition (ECR-CVD) technique. Using the ECR-CVD technique, SiC:H films have been prepared from a mixture of methane, silane and hydrogen, with phosphine as the doping gas. The effects of changes in the microwave power (from 150 to 900 W) on the film properties were investigated in a series of phosphorus-doped SiC:H films. In particular, the changes in the deposition rate, optical bandgap, activation energy and conductivity were investigated in conjunction with results from Raman scattering and Fourier transform infra-red (FTIR) analysis. It was found that increase in the microwave power has the effect of enhancing the formation of the silicon microcrystalline phase in the amorphous matrix of the SiC:H films. This occurs in correspondence to a rapid increase in the conductivity and a reduction in the activation energy, both of which exhibit small variations in samples deposited at microwave powers exceeding 500 W. Analysis of IR absorption results suggests that hydrogen is bonded to silicon in the Si-H stretching mode and to carbon in the sp3 CHn rocking/wagging and bending mode in films deposited at higher microwave powers.