Plasma inverse scattering theory

The object of this report is to calculate the electron density profile of plane stratified inhomogeneous plasmas. The electron density profile is obtained through a numerical solution of the inverse scattering algorithm.

The inverse scattering algorithm connects the time dependent reflected field resulting from a δ-function field incident normally on the plasma to the inhomogeneous plasma density.

Examples show that the method produces uniquely the electron density on or behind maxima of the plasma frequency.

It is shown that the δ-function incident field used in the inverse scattering algorithm can be replaced by a thin square pulse.

A metal-mirror-based reflecting polarizing beam splitter

We theoretically investigated the design of a metal-mirror-based reflecting polarizing beam splitter (RPBS). The metal mirror is a silver slab, which is embedded in the substrate of a rectangular silica transmission grating. By using a modal analysis and rigorous coupled-wave analysis, an RPBS grating is designed for operation at 1550 nm. When it is illuminated in Littrow mounting, the transverse electric (TE) and transverse magnetic (TM) waves will be mainly reflected in the minus-first and zeroth orders, respectively. Moreover, a wideband RPBS grating is obtained by adopting the simulated annealing algorithm. The RPBS gratings exhibit high diffraction efficiencies (similar to 95%) and high extinction ratios over a certain angle and wavelength range, especially for the minus-first-order reflection. This kind of RPBS should be useful in practical optical applications.

Deep silicon grating as high-extinction-ratio polarizing beam splitter

A deep binary silicon grating as high-extinction-ratio reflective polarizing beam splitter (PBS) at the wavelength of 1550 nm is presented. The design is based on the phenomenon of total internal reflection (TIR) by using the rigorous coupled wave analysis (RCWA). The extinction ratio of the rectangular PBS grating can reach 2.5×105 with the optimum grating period of 397 nm and groove depth of 1.092 μm. The effciencies of TM-polarized wave in the 0th order and TE-polarized wave in the −1st order can both reach unity at the Littrow angle. Holographic recording technology and inductively coupled plasma (ICP) etching could be used to fabricate the silicon PBS grating.

Geometrical-transformation approach to optical two-dimensional beam shaping: comment

I show that the research reported by Arieli et al. [Appl. Opt. 86, 9129 (1997)] has two serious mistakes: One is that an important factor is lost in the formula used in that study to determine the x-direction coordinate transformation; the other is the conclusion that the geometrical-transformation approach given by Arieli et al. can provide a smooth phase distribution. A potential research direction for obtaining a smooth phase distribution for a generic two-dimensional beam-shaping problem is stated. (C) 1998 Optical Society of America.