A new phosphate, KMgY(PO4)(2), isostructural with xenotime

A new phosphate, KMgY(PO4)(2), isostructural with xenotime, was firstly reported in detail. It crystallizes in tetragonal system with space group I4(1)/amd (No. 141). The cell parameters were obtained from X-ray powder diffraction data with a=0.6886, c=0.6025 nm, 2=2. The proposed structure of KMgY(PO4)(2) was further confirmed by its vibrational spectra, IR and Raman spectra, which were also compared with those of iso-structural YPO4.

Effect of structures of modifiers on electrochemistry of di-mu-oxo dimanganese 2,2'-bipyridine complex

The gold electrodes modified with 2-picolinic acid , nicotinic acid, iso-nicotinic or thiophene were prepared using membrane transfer method, The electrochemistry of di-mu-oxodimanganese 2,2'-bipyridine complex was studied in the acetic acid buffer solution at different modified gold electrodes, It was found that the modifiers which can promote the electrochemical reaction of the complex should be of at least two functional groups, One group can be bound to the electrode surface and the other can form electron transfer pathway between the modifier and the complex through sal; bridge or hydrogen bond, In addition, the mechanism of the electrochemical reaction was discussed.

ELECTROCHEMICAL AND IN-SITU SPECTROELECTROCHEMICAL STUDY OF (TETRAPHENYLPORPHINATO)MANGANESE(III) PERCHLORATE IN THE PRESENCE OF CHLORIDE ANIONS .2. OXIDATION PROCESSES

An investigation of electrode oxidation processes of (tetra-phenylporphinato) manganese (III) Perchlorate, (TPS)Mn(III)ClO4, was carried out during the titration of chloride anions by conventional cyclic voltammetry, thin-layer cyclic voltammetry and spectroelectrochemistry. It was demonstrated that in the presence of one equivalent amount of Cl-, the first one electron oxidation reaction corresponds to the Mn(III)I cation radical oxidation, and the second one electron oxidation corresponds to the cation radical/dication generation followed by an iso-porphyrin formation reaction, however in the presence of two equivalent amount of Cl-, the first one electron oxidation of Mn(III) gives Mn(IV) porphyrin and the second one electron oxidation generates cation radicals of Mn(IV) followed by an iso-porphyrin formation reactions. Mechanisms of these redox processes are postulated.

IONIC-CONDUCTIVITY AND DYNAMIC MECHANICAL RELAXATION OF A 2-COMPONENT EPOXY NETWORK-LICLO4 ELECTROLYTE SYSTEM

The correlation between mechanical relaxation and ionic conductivity was investigated in a two-component epoxy network-LiClO4 electrolyte system. The network was composed of diglycidyl ether of polyethylene glycol (DGEPEG) and triglycidyl ether of glycerol (TGEG). The effects of salt concentration, molecular weight of PEG in DGEPEG and the proportion of DGEPEG (1000) in DGEPEG/TGEG ratio on the ionic conductivity and the mechanical relaxation of the system were studied. It was found that, among the three influential factors, the former reinforces the network chains, reduces the free volume fraction and thus increases the relaxation time of the segmental motion, which in turn lowers the ionic conductivity of the specimen. Conversely, the latter two increase the free volume and thus the chain flexibility, showing an opposite effect. From the iso-free-volume plot of the shift factor log at and reduced ionic conductivity, it is noted that the plot can be used to examine the temperature dependence of segmental mobility and seems to be useful to judge whether the incorporated salt has been dissociated completely. Besides, the ionic conductivity and relaxation time at constant reference temperature are linearly correlated with each other in all the three cases. This result gives an additional experimental confirmation of the coordinated motion model of the ionic hopping with the moving polymer chain segment, which is generally used to explain the ionic conduction in non-glassy amorphous polymer electrolytes.

ISO-SWS observations of CO2 and H2O in R cassiopeiae

We present ISO-SWS spectra of the O-rich Mira variable R Gas, showing CO2 in absorption and emission, and H2O in absorption. The CO2 absorption feature is the 01(1)0 - 00(0)0 ro-vibrationaI band at 14.97 mu m. The emission features are the 10(0)0-01(1)0 and 11(1)0 - 02(2)0 re-vibrational transitions at 13.87 and 13.48 mu m respectively. The water absorption spectrum shows the nu(1) and nu(3) re-vibrational bands in the 2.75 - 3 mu m region. Using LTE models, we derive physical parameters for the features. We find the CO2 emission temperature to be similar to 1100 K. We discuss the nature of the CO2 feature at 15 mu m and show that it can be modeled as an emission/absorption band by deviating front thermal equilibrium for the population of the 01(1)0 vibrational level. The H2O absorption spectrum is shown to arise from gas at different temperatures, but can be fit reasonably well with two components at T = 950 K and T = 250 K. The CO2 emission and hut H2O absorption temperatures an similar, suggesting chat these features probe the same region of the inner envelope. We discuss the inner envelope chemistry using molecular equilibrium calculations and recent modeling work by Duari et al. (1999), and find our observations consistent with the results.

Overview of the current ISO tests for photocatalytic materials

The current eight published ISO standards associated with semiconductor photocatalysis are considered. These standards cover: (1) air purification (specifically, the removal of NO, acetaldehyde and toluene), (2) water purification (the photobleaching of methylene blue and oxidation of DMSO) (3) self-cleaning surfaces (the removal of oleic acid and subsequent change in water droplet contact angle), (4) photosterilisation (specifically probing the antibacterial action of semiconductor photocatalyst films) and (5) UV light sources for semiconductor photocatalytic ISO work. For each standard, the background is first considered, followed by a brief discussion of the standard particulars and concluding in a discussion of the pros and cons of the standard, with often recommendations for their improvement. Other possible standards for the future which would either compliment or enhance the current ones are discussed briefly. 

The nitric oxide ISO photocatalytic reactor system: Measurement of NOx removal activity and capacity

Although the NO removal-based air-purification ISO method ISO 22197-1:2007 is well established, its preconditioning requirements mean that only the initial activity of the photocatalyst under test is measured owing to the often-reported, gradual alteration of the surface kinetics for NO oxidation by air through the accumulation of surface HNO3. Herein, we compare the photocatalytic NO removal abilities of a number of different, common TiO2 materials, surface-saturated with photogenerated HNO3, with their behaviours observed during the typical 5 h-long ISO standard test. It is found that all the TiO2 materials studied eventually become largely NO to NO2 converters after sufficient exposure to NO under irradiation (>5 h) due to the accumulation of surface HNO3. The UV exposure time, t*, necessary to reach this HNO3 saturated condition is different for each different catalyst. As a consequence, an alternative preconditioning process for the ISO method is proposed which can be used to provide a more realistic measure of the photocatalytic activity of the underlying material and provide a measure of the NOx removing capacity of the photocatalytic material under test.

Evaluating fault tolerance on asymmetric multicore systems-on-chip using iso-metrics

The end of Dennard scaling has promoted low power consumption into a firstorder concern for computing systems. However, conventional power conservation schemes such as voltage and frequency scaling are reaching their limits when used in performance-constrained environments. New technologies are required to break the power wall while sustaining performance on future processors. Low-power embedded processors and near-threshold voltage computing (NTVC) have been proposed as viable solutions to tackle the power wall in future computing systems. Unfortunately, these technologies may also compromise per-core performance and, in the case of NTVC, xreliability. These limitations would make them unsuitable for HPC systems and datacenters. In order to demonstrate that emerging low-power processing technologies can effectively replace conventional technologies, this study relies on ARM’s big.LITTLE processors as both an actual and emulation platform, and state-of-the-art implementations of the CG solver. For NTVC in particular, the paper describes how efficient algorithm-based fault tolerance schemes preserve the power and energy benefits of very low voltage operation.

Implementación del sistema de aseguramiento de calidad ISO 9002.

Tesis (Maestría en Ciencias de la Administración con Especialidad en Producción y Calidad) UANL

Certificación de las normas ISO-9000 aplicado a la industria manufacturera del ramo de la electrónica

Tesis (Maestría en Ciencias de la Administración con Especialidad en Producción y Calidad) UANL

Implementación de la norma ISO 9002 en el departamento de compras de una industria siderúrgica

Tesis (Maestría en Ciencias de la Administración con Especialidaden Producción y Calidad) UANL

Implantación de un sistema de aseguramiento de calidad ISO 9001en la industria cartonera

Tesis (Maestría en Ciencias de la Administración con Especialidad en Producción y Calidad) UANL

Implementación del sistema de aseguramiento de calidad ISO 9002 por Jesús González Olivo

Tesis (Maestría en Ciencias de la Administración con Especialidad en Producción y Calidad) - U.A.N.L, 1997

Sistema de implementación ISO 9000

Tesis (Maestría en Ciencias de la Administración con Especialidad en Relaciones Industriales)- UANL, 1998

Implementación de un sistema de aseguramiento de calidad para la empresa DYMO Plásticos, S.A. con el fin de obtener la certificación a la norma ISO-9002 por Felipe de Jesús Díaz Morales

Tesis (Maestría en Ciencias de la Administración con Especialidad en Producción y Calidad) - U.A.N.L, 1998