MISCIBILITY, MICROSTRUCTURE, AND DYNAMICS OF BLENDS CONTAINING BLOCK-COPOLYMER .1. MISCIBILITY OF BLENDS OF HOMOPOLYSTYRENE WITH STYRENE-BUTADIENE BLOCK-COPOLYMERS

The miscibilities of blends of homopolystyrene/styrene-butadiene/styrene (PS/SBS) and PS/SB-4A (4-arm star block copolymer) have been studied by dynamic mechanical analysis (DMA) and C-13 CPMAS NMR techniques. The results indicate that the miscibilities o

MISCIBILITY, MICROSTRUCTURE, AND DYNAMICS OF BLENDS CONTAINING BLOCK-COPOLYMER .2. MICROSTRUCTURE OF BLENDS OF HOMOPOLYSTYRENE WITH STYRENE-BUTADIENE BLOCK-COPOLYMERS

The microstructures of styrene-butadiene triblock (SBS) and styrene-butadiene four-arm star block (SB-4A) copolymers and their blends with homopolystyrene (PS) of different molecular weights, MPS, have been investigated by means of small-angle X-ray scatt

MISCIBILITY, MICROSTRUCTURE, AND DYNAMICS OF BLENDS CONTAINING BLOCK-COPOLYMER .3. MOLECULAR-MOTION IN HOMOPOLYSTYRENE AND POLYSTYRENE 4-ARM STYRENE-BUTADIENE STAR BLOCK-COPOLYMER BLENDS

The proton spin-spin relaxation times (T-2(H)) at different temperatures (from 160 to 390 K) have been determined for polystyrene (PS) and four-arm star styrene-butadiene block copolymer (SB-4A) and its blends with PS of different molecular weights (M(PS)

XPS STUDY ON TERNARY CROSSLINKED BLOCK-COPOLYMER FROM CONDENSATION OF OLIGODIMETHYLSILOXANE WITH POLY-PARA-HYDROXYSTYRENE AND POLYARYLSULFONE OLIGOMERS

XPS has extensively been applied to the study of polymers, in which a considerably important topic is the surface phase separations in block copolymers and blends. Copolymers (or blends) will produce a phase separation if their components are in-

Block copolymer self-assembly based device structures

This thesis investigated the block copolymer (BCP) thin film characteristics and pattern formation using a set of predetermined molecular weights of PS-b-PMMA and PS-b-PDMS. Post BCP pattern fabrication on the required base substrate a dry plasma etch process was utilised for successful pattern transfer of the BCP resist onto underlying substrate. The resultant sub-10 nm device features were used in front end of line (FEoL) fabrication of active device components in integrated circuits (IC). The potential use of BCP templates were further extended to metal and metal-oxide nanowire fabrication. These nanowires were further investigated in real-time applications as novel sensors and supercapacitors.

Development of block copolymer lithography for device structure fabrication

This thesis investigated well-ordered block copolymer (BCP) thin film characteristics and their use for nanoscale pattern formation using a series of polystyrene-block-polymethylmethacrylate (PS-b-PMMA), polystyrene-blockpolydimethylsiloxane (PS-b-PDMS) and polystyrene-block-poly(ethylene oxide) (PS-b-PEO) systems of various molecular weights. BCP thin films, which act as an ‘on-chip’ etch mask and material templates, are highly promising self-assembling process for future scalable nanolithography. Unlike conventional BCP processing methods, the work in this thesis demonstrates that well-ordered patterns can be achieved in a few seconds compared to several hours by use of a non-conventional microwave assisted technique. As a result, well-ordered BCP nanoscale structures can be developed in industry appropriate periods facilitating their incorporation into current technologies. An optimised and controlled plasma dry etch process was used for successful pattern transfer to the underlying silicon substrate. Long range ordered BCP templates were further modified by selective metal inclusion technique to form a hard mask template towards fabrication of high aspect ratio nanopillars and nanowires. The work described here is centred on how these templates might be used to generate function at substrate surfaces. Herein we describe a number of innovations which might allow their successful uptake in a number of applications.

Insertion of metal oxides into block copolymer nanopatterns as robust etch masks for nanolithography

Directed self-assembly (DSA) of block copolymers (BCPs) is a prime candidate to further extend dimensional scaling of silicon integrated circuit features for the nanoelectronic industry. Top-down optical techniques employed for photoresist patterning are predicted to reach an endpoint due to diffraction limits. Additionally, the prohibitive costs for “fabs” and high volume manufacturing tools are issues that have led the search for alternative complementary patterning processes. This thesis reports the fabrication of semiconductor features from nanoscale on-chip etch masks using “high χ” BCP materials. Fabrication of silicon and germanium nanofins via metal-oxide enhanced BCP on-chip etch masks that might be of importance for future Fin-field effect transistor (FinFETs) application are detailed.

Polystyrene and asphaltene micelles within blends with a bitumen of an SBS block copolymer and styrene and butadiene homopolymers

Using fluorescence microscopy, DSC and DMTA we have explored blends of a bitumen with a styrene-butadiene-styrene (SBS) block copolymer, and with blends of the bitumen with SBS and one or two homopolymers - a polystyrene and a poly(cis-butadiene). The SBS polymer was progressively replaced with quantities of the homopolymers both together in the proportions found in the block copolymer and then by each homopolymer separately. At low temperatures the blends are all softer than the bitumen itself, so the polymers plasticise the bitumen-rich phase, and above 50°C the blends' stiffness (E') falls below a plateau only when a critical proportion of the block copolymer has been replaced with the two homopolymers: this supports the idea of an extensive network created by the polystyrene-rich spherical microphases that is effective even when the polystyrene microphases have melted. In one polymer blend the stiffness rose as the temperature was raised above 100°C, suggesting the development of a mesophase based upon polybutadiene plus asphaltenes, in another E' was enhanced and E" remained constant as the temperature rose above 70°C, perhaps for a similar reason; in some loss process appeared and the stiffness fell as temperature rose; but in others a good part of the SBS was replaced by either polystyrene or polybutadiene without changing the appearance of a rubbery plateau, that is, without a diminution of the mechanical properties of the soft matter.

Supramolecular polymers azo-containing : photo-responsive block copolymer elastomers and homopolymers

Beaucoup d'efforts dans le domaine des matériaux polymères sont déployés pour développer de nouveaux matériaux fonctionnels pour des applications spécifiques, souvent très sophistiquées, en employant des méthodes simplifiées de synthèse et de préparation. Cette thèse porte sur les polymères photosensibles – i.e. des matériaux fonctionnels qui répondent de diverses manières à la lumière – qui sont préparés à l'aide de la chimie supramoléculaire – i.e. une méthode de préparation qui repose sur l'auto-assemblage spontané de motifs moléculaires plus simples via des interactions non covalentes pour former le matériau final désiré. Deux types de matériaux photosensibles ont été ciblés, à savoir les élastomères thermoplastiques à base de copolymères à blocs (TPE) et les complexes d'homopolymères photosensibles. Les TPEs sont des matériaux bien connus, et même commercialisés, qui sont généralement composés d’un copolymère tribloc, avec un bloc central très flexible et des blocs terminaux rigides qui présentent une séparation de phase menant à des domaines durs isolés, composés des blocs terminaux rigides, dans une matrice molle formée du bloc central flexible, et ils ont l'avantage d'être recyclable. Pour la première fois, au meilleur de notre connaissance, nous avons préparé ces matériaux avec des propriétés photosensibles, basé sur la complexation supramoléculaire entre un copolymère tribloc simple parent et une petite molécule possédant une fonctionnalité photosensible via un groupe azobenzène. Plus précisément, il s’agit de la complexation ionique entre la forme quaternisée d'un copolymère à blocs, le poly(méthacrylate de diméthylaminoéthyle)-poly(acrylate de n-butyle)-poly(méthacrylate de diméthylaminoéthyle) (PDM-PnBA-PDM), synthétisé par polymérisation radicalaire par transfert d’atomes (ATRP), et l'orange de méthyle (MO), un composé azo disponible commercialement comportant un groupement SO3 -. Le PnBA possède une température de transition vitreuse en dessous de la température ambiante (-46 °C) et les blocs terminaux de PDM complexés avec le MO ont une température de transition vitreuse élevée (140-180 °C, en fonction de la masse molaire). Des tests simples d'élasticité montrent que les copolymères à blocs complexés avec des fractions massiques allant de 20 à 30% présentent un caractère élastomère. Des mesures d’AFM et de TEM (microscopie à force atomique et électronique à ii transmission) de films préparés à l’aide de la méthode de la tournette, montrent une corrélation entre le caractère élastomère et les morphologies où les blocs rigides forment une phase minoritaire dispersée (domaines sphériques ou cylindriques courts). Une phase dure continue (morphologie inversée) est observée pour une fraction massique en blocs rigides d'environ 37%, ce qui est beaucoup plus faible que celle observée pour les copolymères à blocs neutres, dû aux interactions ioniques. La réversibilité de la photoisomérisation a été démontrée pour ces matériaux, à la fois en solution et sous forme de film. La synthèse du copolymère à blocs PDM-PnBA-PDM a ensuite été optimisée en utilisant la technique d'échange d'halogène en ATRP, ainsi qu’en apportant d'autres modifications à la recette de polymérisation. Des produits monodisperses ont été obtenus à la fois pour la macroamorceur et le copolymère à blocs. À partir d'un seul copolymère à blocs parent, une série de copolymères à blocs partiellement/complètement quaternisés et complexés ont été préparés. Des tests préliminaires de traction sur les copolymères à blocs complexés avec le MO ont montré que leur élasticité est corrélée avec la fraction massique du bloc dur, qui peut être ajustée par le degré de quaternisation et de complexation. Finalement, une série de complexes d'homopolymères auto-assemblés à partir du PDM et de trois dérivés azobenzènes portant des groupes (OH, COOH et SO3) capables d'interactions directionnelles avec le groupement amino du PDM ont été préparés, où les dérivés azo sont associés avec le PDM, respectivement, via des interactions hydrogène, des liaisons ioniques combinées à une liaison hydrogène à travers un transfert de proton (acidebase), et des interactions purement ioniques. L'influence de la teneur en azo et du type de liaison sur la facilité d’inscription des réseaux de diffraction (SRG) a été étudiée. L’efficacité de diffraction des SRGs et la profondeur des réseaux inscrits à partir de films préparés à la méthode de la tournette montrent que la liaison ionique et une teneur élevée en azo conduit à une formation plus efficace des SRGs.

Self-Assembly of Stimuli-Responsive Water-Soluble [60]Fullerene End-Capped Ampholytic Block Copolymer

Well-defined, water-soluble, pH and temperature stimuli-responsive [60]fullerene (C₆₀) containing ampholytic block copolymer of poly((methacrylic acid)-block-(2-(dimethylamino)ethyl methacrylate))-block–C₆₀ (P(MAA-b-DMAEMA)-b-C₆₀) was synthesized by the atom transfer radical polymerization (ATRP) technique. The self-assembly behaviour of the C₆₀ containing polyampholyte in aqueous solution was characterized by dynamic light scattering (DLS), and transmission electron microscopy. This amphiphilic mono-C₆₀ end-capped block copolymer shows enhanced solubility in aqueous medium at room and elevated temperatures and at low and high pH but phase-separates at intermediate pH of between 5.4 and 8.8. The self assembly of the copolymer is different from that of P(MAA-b-DMAEMA). Examination of the association behavior using DLS revealed the co-existence of unimers and aggregates at low pH at all temperatures studied, with the association being driven by the balance of hydrophobic and electrostatic interactions. Unimers and aggregates of different microstructures are also observed at high pH and at temperatures below the lower critical solution temperature (LCST) of PDMAEMA. At high pH and at temperatures above the LCST of PDMAEMA, the formation of micelles and aggregates co-existing in solution is driven by the combination of hydrophobic, electrostatic, and charge-transfer interactions.

Synthesis and Aggregation Behavior of Pluronic F87/Poly(acrylic acid) Block Copolymer with Doxorubicin

Poly(acrylic acid) (PAA) was grafted onto both termini of Pluronic F87 (PEO₆₇-PPO₃₉-PEO₆₇) via atom transfer radical polymerization to produce a novel muco-adhesive block copolymer PAA₈₀-b-F₈₇-b-PAA₈₀. It was observed that PAA₈₀-F₈₇-PAA₈₀ forms stable complexes with weakly basic anti-cancer drug, Doxorubicin. Thermodynamic changes due to the drug binding to the copolymer were assessed at different pH by isothermal titration calorimetry (ITC). The formation of the polymer/drug complexes was studied by turbidimetric titration and dynamic light scattering. Doxorubicin and PAA-b-F87-b-PAA block copolymer are found to interact strongly in aqueous solution via non-covalent interactions over a wide pH range. At pH>4.35, drug binding is due to electrostatic interactions. Hydrogen-bond also plays a role in the stabilization of the PAA₈₀-F₈₇-PAA₈₀/DOX complex. At pH 7.4 (α=0.8), the size and stability of polymer/drug complex depend strongly on the doxorubicin concentration. When CDOX <0.13mM, the PAA₈₀-F₈₇-PAA₈₀ copolymer forms stable inter-chain complexes with DOX (110 ~ 150 nm). When CDOX >0.13mM, as suggested by the light scattering result, the reorganization of the polymer/drug complex is believed to occur. With further addition of DOX (CDOX >0.34mM), sharp increase in the turbidity indicates the formation of large aggregates, followed by phase separation. The onset of a sharp enthalpy increase corresponds to the formation of a stoichiometric complex.

Undulation instability in block-copolymer lamellae subjected to a perpendicular electric field

We examine the stability of lamellar stacks in the presence of an electric field, E-0, applied normal to the lamellae. Calculations are performed with self-consistent field theory (SCFT) supplemented by an exact treatment of the electrostatic energy for linear dielectric materials. The calculations identify a critical electric field, E-0*, beyond which the lamellar stack becomes unstable with respect to undulations. This E-0* rapidly decreases towards zero as the number of lamellae in the stack diverges. Our quantitative predictions for E-0* are consistent with previous experimental measurements by Xu and co-workers.