Rheological studies on the phase dissolution in a block copolymer

The microphase transition in a styrene-butadiene-styrene triblock copolymer was studied by rheometric mechanical spectroscopy. A high-temperature-melt rheological transition from the highly elastic, nonlinear viscous behavior typical of a multiphase structure to linear viscous behavior with insignificant elasticity typical of a single-phase structure was observed. The transition temperature is determined according to the discontinuity of the rheological properties across the transition region, which agrees well with the results obtained from the small angle X-ray scattering data and the expectation of the random phase approximation theory. Maybe for the first time, microphase dissolution was investigated theologically. The storage modulus (G') and the loss modulus (G '') increase with time during the process. An entanglement fluctuation model based on the segmental density fluctuations is presented to explain the rheological behavior in this dissolution process. (C) 1997 John Wiley & Sons.

Crystallization behaviour of poly(ether ether ketone)/poly(ether sulfone) block copolymer

The crystallization and melting behaviours of a multiblock copolymer comprising poly(ether ether ketone) (PEEK) and poly(ether sulfone) (PES) blocks whose number average molecular weights <((M)over bar (n)'s)> were 10 000 and 2900, respectively, were studied. The effect of thermal history on crystallization was investigated by wide-angle X-ray diffraction measurement. A differential scanning calorimeter was used to detect the thermal transitions and to monitor the energy evolved during the isothermal crystallization process from the melt. The results suggest that the crystallization of the copolymer becomes more difficult as compared with that of pure PEEK. The equilibrium melting point of the copolymer was found to be 357 degrees C, about 30 degrees C lower than that of pure PEEK. During the isothermal crystallization, relative crystallinity increased with crystallization time, following an Avrami equation with exponent n approximate to 2. The fold surface free energy for the copolymer crystallized from the melt was calculated to be 73 erg cm(-2), about 24 erg cm(-2) higher than that of pure PEEK. Copyright (C) 1996 Elsevier Science Ltd.

Phase behavior in mixtures of a homopolymer and a block copolymer .4. SALS and SAXS studies

Phase behavior of blends of poly(vinyl methyl ether) (PVME) with four styrene-butadienestyrene (SBS) triblock copolymers, being of various molecular weights, architecture, and compositions, was investigated by small-angle light scattering. Small-angle X-ray scattering investigation was accomplished for one blend. Low critical solution temperature (LCST) and a unique phase behavior, resembling upper critical solution temperature (UCST), were observed. It was found that the architecture of the copolymer greatly influenced the phase behavior of the blends. Random phase approximation theory was used to calculate the spinodal phase transition curves of the ABA/C and BAB/C systems; LCST and resembling UCST phase behavior were observed as the parameters of the system changed. Qualitatively, the experimental and the theoretical results are consistent with each other. (C) 1996 John Wiley & Sons, Inc.

PHASE-BEHAVIOR IN MIXTURES OF A HOMOPOLYMER AND A BLOCK-COPOLYMER .1. FTIR AND DSC STUDIES

Miscibility in blends of three styrene-butadiene-styrene and one styrene-isoprene-styrene triblock copolymers containing 28%, 30%, 48%, and 14% by weight of polystyrene, respectively, with poly(vinyl methyl ether) (PVME) were investigated by FTIR spectroscopy and differential scanning calorimetry (DSC). It was found from the optical clarity and the glass transition temperature behavior that the blends show miscibility for each kind of triblock copolymers below a certain concentration of PVME. The concentration range to show miscibility becomes wider as the polystyrene content and molecular weight of PS segment in the triblock copolymers increase. From the FTIR results, the relative peak intensity of the 1100 cm-1 region due to COCH3 band of PVME and peak position of 698 cm-1 region due to phenyl ring are sensitive to the miscibility of SBS(SIS)/PVME blends. The results show that the miscibility in SBS(SIS)/PVME blends is greatly affected by the composition of the copolymers and the polystyrene content in the triblock copolymers. Molecular weights of polystyrene segments have also affected the miscibility of the blends. (C) 1995 John Wiley & Sons, Inc.

MISCIBILITY, MICROSTRUCTURE, AND DYNAMICS OF BLENDS CONTAINING BLOCK-COPOLYMER .1. MISCIBILITY OF BLENDS OF HOMOPOLYSTYRENE WITH STYRENE-BUTADIENE BLOCK-COPOLYMERS

The miscibilities of blends of homopolystyrene/styrene-butadiene/styrene (PS/SBS) and PS/SB-4A (4-arm star block copolymer) have been studied by dynamic mechanical analysis (DMA) and C-13 CPMAS NMR techniques. The results indicate that the miscibilities o

MISCIBILITY, MICROSTRUCTURE, AND DYNAMICS OF BLENDS CONTAINING BLOCK-COPOLYMER .2. MICROSTRUCTURE OF BLENDS OF HOMOPOLYSTYRENE WITH STYRENE-BUTADIENE BLOCK-COPOLYMERS

The microstructures of styrene-butadiene triblock (SBS) and styrene-butadiene four-arm star block (SB-4A) copolymers and their blends with homopolystyrene (PS) of different molecular weights, MPS, have been investigated by means of small-angle X-ray scatt

MISCIBILITY, MICROSTRUCTURE, AND DYNAMICS OF BLENDS CONTAINING BLOCK-COPOLYMER .3. MOLECULAR-MOTION IN HOMOPOLYSTYRENE AND POLYSTYRENE 4-ARM STYRENE-BUTADIENE STAR BLOCK-COPOLYMER BLENDS

The proton spin-spin relaxation times (T-2(H)) at different temperatures (from 160 to 390 K) have been determined for polystyrene (PS) and four-arm star styrene-butadiene block copolymer (SB-4A) and its blends with PS of different molecular weights (M(PS)

THE VISCOSITY BEHAVIOUR OF SEP BLOCK COPOLYMER SOLUTION DURING ITS MICELLIZATION

The viscosities of polystyrene-b-poly (ethylene/propylene) diblock copolymer in mixed solvent of n-octane and benzene were measured. The influences of the constitution of the mixed solvent, temperature and concentration were on the viscosity investigated. During the micellization the solution viscosity increases rapidly. The results are consistent with the study on the micellization by light scattering. The average mass of micelleswas measured and the hydrodynamic radius of gyrations were calculated.

THE CRYSTALLIZATION BEHAVIOUR OF BLOCK COPOLYMER/HOMOPOLYMER BLENDS I. INFLUENCE OF NONSPHERICAL MICELLE ON CRYSTALLIZATION BEHAVIOUR IN DILUTE SOLID SOLUTIONS

The effect of micelle on crystallization behaviour of dilute poly(methyl methacrylate-b-tetrahydrofuran) diblock copolymer/tetrahydrofuran homopolymer, dilute poly (ethylene-b-styrene-b-ethylene) triblock copolymer/ethylene homopolymer solutions has been studied. The results show that with the structural teansitions from spherical to nonspherical micelle in the blends, great changes in the nucleation and spherulite morphologies take place.

THE THERMODYNAMICS OF MICELLIZATION BY BLOCK COPOLYMER SEP IN ORGANIC SOLVENTS

The thermodynamics of micellization for polystyrene-b-poly(ethylene/propylene) two-Mock copolymer(SEP) in the mixtures of n-octane and benzene with different proportions have been studied in this paper, The critical micelle concentrations(GMC) of micelle solutions at various temperatures were measured by lost angle laser light scattering photometer(LALLS), The results shove that the micellization process of nonpolar copolymer SEP in hydrocarbon solvents ire exothermal, and the entropy change is negative, In contrast, far ordinary surfactants in water, it is the enthalpy contribution to the energy change which is responsible for micellization.

XPS STUDY ON TERNARY CROSSLINKED BLOCK-COPOLYMER FROM CONDENSATION OF OLIGODIMETHYLSILOXANE WITH POLY-PARA-HYDROXYSTYRENE AND POLYARYLSULFONE OLIGOMERS

XPS has extensively been applied to the study of polymers, in which a considerably important topic is the surface phase separations in block copolymers and blends. Copolymers (or blends) will produce a phase separation if their components are in-

Block copolymer self-assembly based device structures

This thesis investigated the block copolymer (BCP) thin film characteristics and pattern formation using a set of predetermined molecular weights of PS-b-PMMA and PS-b-PDMS. Post BCP pattern fabrication on the required base substrate a dry plasma etch process was utilised for successful pattern transfer of the BCP resist onto underlying substrate. The resultant sub-10 nm device features were used in front end of line (FEoL) fabrication of active device components in integrated circuits (IC). The potential use of BCP templates were further extended to metal and metal-oxide nanowire fabrication. These nanowires were further investigated in real-time applications as novel sensors and supercapacitors.

Development of block copolymer lithography for device structure fabrication

This thesis investigated well-ordered block copolymer (BCP) thin film characteristics and their use for nanoscale pattern formation using a series of polystyrene-block-polymethylmethacrylate (PS-b-PMMA), polystyrene-blockpolydimethylsiloxane (PS-b-PDMS) and polystyrene-block-poly(ethylene oxide) (PS-b-PEO) systems of various molecular weights. BCP thin films, which act as an ‘on-chip’ etch mask and material templates, are highly promising self-assembling process for future scalable nanolithography. Unlike conventional BCP processing methods, the work in this thesis demonstrates that well-ordered patterns can be achieved in a few seconds compared to several hours by use of a non-conventional microwave assisted technique. As a result, well-ordered BCP nanoscale structures can be developed in industry appropriate periods facilitating their incorporation into current technologies. An optimised and controlled plasma dry etch process was used for successful pattern transfer to the underlying silicon substrate. Long range ordered BCP templates were further modified by selective metal inclusion technique to form a hard mask template towards fabrication of high aspect ratio nanopillars and nanowires. The work described here is centred on how these templates might be used to generate function at substrate surfaces. Herein we describe a number of innovations which might allow their successful uptake in a number of applications.

Insertion of metal oxides into block copolymer nanopatterns as robust etch masks for nanolithography

Directed self-assembly (DSA) of block copolymers (BCPs) is a prime candidate to further extend dimensional scaling of silicon integrated circuit features for the nanoelectronic industry. Top-down optical techniques employed for photoresist patterning are predicted to reach an endpoint due to diffraction limits. Additionally, the prohibitive costs for “fabs” and high volume manufacturing tools are issues that have led the search for alternative complementary patterning processes. This thesis reports the fabrication of semiconductor features from nanoscale on-chip etch masks using “high χ” BCP materials. Fabrication of silicon and germanium nanofins via metal-oxide enhanced BCP on-chip etch masks that might be of importance for future Fin-field effect transistor (FinFETs) application are detailed.

Polystyrene and asphaltene micelles within blends with a bitumen of an SBS block copolymer and styrene and butadiene homopolymers

Using fluorescence microscopy, DSC and DMTA we have explored blends of a bitumen with a styrene-butadiene-styrene (SBS) block copolymer, and with blends of the bitumen with SBS and one or two homopolymers - a polystyrene and a poly(cis-butadiene). The SBS polymer was progressively replaced with quantities of the homopolymers both together in the proportions found in the block copolymer and then by each homopolymer separately. At low temperatures the blends are all softer than the bitumen itself, so the polymers plasticise the bitumen-rich phase, and above 50°C the blends' stiffness (E') falls below a plateau only when a critical proportion of the block copolymer has been replaced with the two homopolymers: this supports the idea of an extensive network created by the polystyrene-rich spherical microphases that is effective even when the polystyrene microphases have melted. In one polymer blend the stiffness rose as the temperature was raised above 100°C, suggesting the development of a mesophase based upon polybutadiene plus asphaltenes, in another E' was enhanced and E" remained constant as the temperature rose above 70°C, perhaps for a similar reason; in some loss process appeared and the stiffness fell as temperature rose; but in others a good part of the SBS was replaced by either polystyrene or polybutadiene without changing the appearance of a rubbery plateau, that is, without a diminution of the mechanical properties of the soft matter.