Study and comparison of four forest structures on Mt. Chortiatis (northern Greece)

EL proyecto estudia y analiza la estructura de cuatro bosques en el monte Chortiatis, Grecia.

基于基频分量消光的1/4波片快轴标定方法

提出了一种基于基频分量消光的波片快轴标定方法,并利用琼斯矩阵对其标定原理进行了分析。激光器、起偏器、相位调制器、待标定1/4波片、检偏器和光电探测器构成标定光路,起偏器、检偏器的透光轴与相位调制器的振动轴分别成+45°和0°夹角。准直激光束依次经过起偏器、相位调制器、待标定1/4波片和检偏器,由光电探测器接收。理论分析表明该标定方法标定精度主要取决于检偏器的定位误差。实验验证了该标定方法的有效性,1/4波片快轴标定结果的最大偏差为0.043°,标准差为0.012°,标定精度为0.05°。

基于同步移相技术的1/4波片快轴方位角的实时测量

提出了一种基于同步移相技术的1/4波片快轴方位角的实时测量方法。由正交光栅、光阑、检偏器组和四象限探测器实现同步移相功能。检偏器组由4个不同方位角的检偏器组成。通过检偏器组的四束光束的光强由四象限探测器同时测量。1/4波片的快轴方位角由这四光束的光强得到。由于该方法不需旋转偏振器件，从而实现的1/4波片的快轴方位角的实时测量。

基于同步移相技术的1/4波片相位延迟量的快速测量

提出了一种基于同步移相技术的1/4波片相位延迟量的快速测量方法。由正交光栅、光阑、检偏器组和四象限探测器实现同步移相功能。检偏器组由4个不同方位角的检偏器组成。通过检偏器组的四束光束的光强由四象限探测器同时测量。1/4波片的相位延迟量由这四光束的光强得到。该方法中波片的快轴不需被事先确定。另外光源光强的波动对测量结果没有影响。通过实验验证了该方法的有效性。

The production of freshwater fish for food

It has been estimated that in England and Wales fresh water covers some 340 square miles of which about one quarter is inhabited mainly by salmon and trout; in Scotland the lakes cover an area of 340 square miles. The principal object of this publication is to make available in handy form some of the methods, especially those involving the use of manures, by which crops of fish from water can be increased. The cultivation of water which this implies may be compared directly to the cultivation of farm land: the conditions for growth are made as favourable as possible, the seed is sown in the form of young fish, and after one or perhaps two growing seasons the crop is harvested. There are however many waters about the country where marketable fish are already available and can be removed without prejudice to, and indeed to the advantage of, sporting fisheries. In such cases it is necessary only to remove the fish and to rely on the natural processes of reproduction of those which are left to repopulate the water. Farming waters in the true sense is the concern of the greater part of this publication; the removal of crops of otherwise unwanted fish is considered in the last two sections on perch trapping and eel fisheries.

超大功率二维半导体激光列阵并路自适应稳模技术

半导体列阵量子效率高,输出波长范围涵盖570～1600nm,工作寿命可达数百万小时,叠层列阵可提供超高功率激光输出,在工业、医学等很多领域具有非常广阔的应用前景。但列阵在自由运行时,各发光单元发出的光是不相干的,输出质量差,采用1/4Talbot外腔镜耦合技术,列阵实现了空间锁相最高阶超模,然而唯有基超模远场分布是中心单瓣结构,输出接近衍射极限。为得到最小谱宽、最小发散角、最大功率密度输出,必须将外腔镜倾斜β=λ/2d(λ为工作波长,d为列阵周期),这使得仅有基超模光能成像于发光单元内而被允许振荡。应用此

偏振光斯托克斯参量的高速实时测量技术

为了满足对高速变化的偏振态的测量,提出一种能够对偏振态实现高速测量的技术。阐述了利用1/4波片与起偏器测量偏振光的斯托克斯参量常规的原理和方法,根据高速测量的要求推导出了新的斯托克斯参量计算公式,并依据此公式设计了基于多通道偏振态高速测量的方案,设计了具体的方法并编写了控制与算法程序。测试表明,该系统的测量速度达到了每秒700次偏振态测量,测量速度主要由电子线路的性能决定,测得的结果稳定可靠实现了光纤传输偏振态的高速测量。

Design and fabrication of color filters for projection display system

Color filters are key components in an optical engine projection display system. In this paper, a new admittance-matching method for designing and fabricating the high performance filters is described, in which the optimized layers are limited to the interfaces between the stack (each combination of quarter-wave-optical-thickness film layers is called a stack) and stack, or between stack and substrate, or between stack and incident medium. This method works well in designing filters containing multiple stacks such as UV-IR cut and broadband filters. The tolerance and angle sensitivity for the designed film stacks are analyzed. The thermal stability of the sample color filters was measured. A good result in optical performance and thermal stability was obtained through the new design approach. (c) 2006 Society of Photo-Optical Instrumentation Engineers.

Laser conditioning of ZrO2 : Y2O3/SiO2 mirror coatings prepared by E-beam evaporation

Laser conditioning effects of the dielectric mirror coatings with different designs were investigated. Simple quarter-wave ZrO2:Y2O3/SiO2 mirrors and half-wave SiO2 over-coated ZrO2:Y2O3/SiO2 mirror coatings were fabricated by E-beam evaporation (EBE). The absorbance of the samples before and after laser conditioning was measured by surface thermal lensing (STL) technology and the defects density was detected under Nomarski microscope. The enhancement of the laser damage resistance was found after laser conditioning. The dependence of the laser conditioning on the coating design was also observed and the over-coated sample obtained greatest enhancement, whereas the absorbance of the samples did not change obviously. During the sub-threshold fluence raster scanning, the minor damage about defects size was found and the assumption of pre-damage mechanism, based on the functional damage concept, was put forward. The improvement of the laser induced damage threshold (LIDT) was attributed to the benign damage of the defects and the dependence on the coating design owed to the damage growth behavior of different coating designs. (C) 2004 Elsevier B.V. All rights reserved.

Design of anisotropic reflector with birefringent thin films

A novel design for dielectric anisotropic mirrors with birefringent thin films for normal incidence is presented. This mirror consists of a stack of quarter-wave biaxial layers. The biaxial anisotropic layers can be fabricated by oblique deposition. The reflectance is different for two linear polarizations of light incidence on the mirrors. As a numerical example, the design is carried out on glass with TiO2 and ZrO2. These thin films could be applied to anisotropic reflective devices for lasers.

Negative dispersion mirrors in Ta2O5/: SiO2 for femtosecond Ti : Sapphire lasers by using gires-tournois interferometers

We design and experimentally demonstrate some negative dispersion mirrors with optimized Gires-Tournois interferometers. The mirror structure is composed of 38 alternating Ta2O5 and SiO2 layers and could be regarded as two sections: high-reflectivity section consisting of a series of quarter-wavelength optical thickness stacks and negative-dispersion section consisting of only 13 layers. The designed mirrors exhibit the expected performance. These mirrors were fabricated by using ion beam sputtering. By adopting such mirrors, dispersion of a mode-locked femtosecond Ti:sapphire laser has been compensated for mostly. With two series of the mirrors, 32 fs and 15 fs pulses have been obtained respectively.

Design and fabrication of color filters for projection display system

Color filters are key components in an optical engine projection display system. In this paper, a new admittance-matching method for designing and fabricating the high performance filters is described, in which the optimized layers are limited to the interfaces between the stack (each combination of quarter-wave-optical-thickness film layers is called a stack) and stack, or between stack and substrate, or between stack and incident medium. This method works well in designing filters containing multiple stacks such as UV-IR cut and broadband filters. The tolerance and angle sensitivity for the designed film stacks are analyzed. The thermal stability of the sample color filters was measured. A good result in optical performance and thermal stability was obtained through the new design approach. (c) 2006 Society of Photo-Optical Instrumentation Engineers.

Characteristics of high reflection mirror with an SiO2 top layer for multilayer dielectric grating

The high reflection (HR) mirror composed of dielectric stacks with excellent spectrum characteristics and high damage resistant ability is critical for fabricating multilayer dielectric (MLD) grating for pulse compressor. The selection of the SiO2 material as the top layer of the HR mirror for grating fabrication is beneficial for improving the laser-induced damage threshold of MLD grating as well as minimizing the standing-wave effect in the photoresist during the exposure process. Based on an (HLL) H-9 design comprising quarter-waves of HfO2 ( H) and half-waves of SiO2 ( L), we obtain an optimal design of the HR mirror for MLD grating, the SiO2 top layer of which is optimized with a merit function including both the diffraction efficiency of the MLD grating and the electric field enhancement in the grating. Dependence of the performance of the MLD grating on the fabrication error of the dielectric mirror is analysed in detail. The HR mirror is also fabricated by E-beam evaporation, which shows good spectral characteristics at the exposure wavelength of 413 nm and at the operation wavelength of 1053 nm and an average damage threshold of 10 J cm(-2) for a 12 ns pulse.

Optimization of thin-film design for multi-layer dielectric grating

Thin-film design used to fabricate multi-layer dielectric (MLD) gratings should provide high transmittance during holography exposure, high reflectance at use wavelength and sufficient manufacturing latitude of the grating design making the MLD grating achieve both high diffraction efficiency and low electric field enhancement. Based on a (HLL)H-9 design comprising of quarter-waves of high-index material and half-waves of low-index material, we obtain an optimum MLD coating meeting these requirements by inserting a matching layer being half a quarter-wave of Al2O3 between the initial design and an optimized HfO2 top layer. The optimized MLD coatings exhibits a low reflectance of 0.017% under photoresist at the exposure angle of 17.8 degrees for 413 nm light and a high reflectance of 99.61% under air at the use angle of 51.2 degrees for 1053 nm light. Numerical calculation of intensity distribution in the photoresist coated on the MLD film during exposure shows that standing-wave patterns are greatly minimized and thus simulation profile of photoresist gratings after development demonstrates smoother shapes with lower roughness. Furthermore, a MLD gratings with grooves etched into the top layer of this MLD coating provides a high diffraction efficiency of 99.5% and a low electric field enhancement ratio of 1.53. This thin-film design shows perfect performances and can be easily fabricated by e-beam evaporation. (c) 2006 Elsevier B.V. All rights reserved.

光学薄膜膜厚自动控制系统的研究

介绍了一种利用光电极值法同时控制规整膜系和非规整膜系的方法,利用VC＋＋编写程序实现对光学监控信号的采集、处理及停镀点的自动判断,实现了规整膜系和非规整膜系膜层厚度的自动控制.并利用该膜厚自动控制系统实验制备了规整膜系和非规整膜系多层膜,实验结果表明：利用该系统镀制的薄膜重复性良好,且光谱曲线和理论光谱曲线吻合较好.该系统解决了非规整膜系的监控问题,由计算机控制膜层的停镀点,排除了人的主观因素对薄膜的性能及其制备的重复性产生的影响,提高了薄膜镀制的重复性和成品率.