An In-Situ Observation On Initial Aggregation Process Of Colloidal Particles Near Three-Phase Contact Line Of Air, Water And Vertical Substrate

The self-assembling process near the three-phase contact line of air, water and vertical substrate is widely used to produce various kinds of nanostructured materials and devices. We perform an in-situ observation on the self-assembling process in the vicinity of the three phase contact line. Three kinds of aggregations, i.e. particle-particle aggregation, particle-chain aggregation and chain-chain aggregation, in the initial stage of vertical deposition process are revealed by our experiments. It is found that the particle particle aggregation and the particle-chain aggregation can be qualitatively explained by the theory of the capillary immersion force and mirror image force, while the chain-chain aggregation leaves an opening question for the further studies. The present study may provide more deep insight into the self-assembling process of colloidal particles.

Stress-distribution around a rigid line in dissimilar media

The elastic plane problem of a rigid line inclusion between two dissimilar media was considered. By solving the Riemann-Hilbert problem, the closed-form solution was obtained and the stress distribution around the rigid line was investigated. It was found that the modulus of the singular behavior of the stress remains proportional to the inverse square root of the distance from the rigid line end, but the stresses possess a pronounced oscillatory character as in the case of an interfacial crack tip.

Spectral-line profile of turbulent gas

phases should be specified when the particle Reynolds number is higher than

3D line drawing from point clouds using chromatic stereo and shading

1 PDF document (8 pp., English).-- Contributed to: VSMM'08: 14th International Conference on Virtual Systems and Multimedia (Limassol, Cyprus, Oct 20-25, 2008)

Monitoring the Tension and the Temperature in an Overhead Line

MELECON 2012 - 2012 16th IEEE Mediterranean Electrotechnical Conference, 25 Mar - 28 Mar 2012, Túnez