强流高电荷态全永磁ECR离子源LAPECR2的初步调试

研制成功了一台强流高电荷态全永磁ECR(Electron Cyclotron Resonance)离子源LAPECR2(Lanzhou All Permanent Magnet ECR Ion Source No.2)。该离子源在完成磁体装配后已成功在近代物理研究所320 kV高压平台上安装就位,与后束运线完成对接组装。离子源于2005年7月在14.5 GHz实现了第一次成功起弧,并引出较强的混合束流。目前离子源已与后束线以及部分实验终端完成了联调,在实验终端能够获得强流较高电荷态的离子束流。本文将着重论述该全永磁源的结构技术特点和主要参数指标。本文还着重论述了LAPECR2离子源在14.5 GHz微波功率馈入条件下的初步调试结果,在此基础上对束流向实验终端联调的实验结果进行了讨论,着重分析了影响束流引出与传输效率的主要因素。

超导ECR源SECRAL轫致辐射谱的测量

热电子在ECR(Electron Cyclotron Resonance)源中有着非常重要的作用,为了研究ECR源的工作参数(微波功率、磁场等)对热电子的影响,我们对SECRAL(Superconducting ECR ion source with Advanced design in Lanzhou)等离子体在轴向发出的轫致辐射谱进行了系统的测量。从测得的轫致辐射谱中我们得到用来衡量热电子能量的参考量——光谱温度Tspe,并且对ECR源的几个工作参数与Tspe的关系进行了讨论。

高性能全永磁ECR离子源LAPECR2的研制

研制了一台体积和重量都较大、设计性能较高的全永磁电子回旋共振(Electron cyclotron resonance, ECR)离子源LAPECR2(Lanzhou all permanent magnetic ECR ion source No．2)。该离子源将用于中国科学院近代物理研究所320 kV高压平台,为其提供强流高电荷态离子束流。LAPECR2的研制采用全新的全永磁磁体结构设计,通过采用高性能的NdFeB永磁材料、优化的磁结构设计以及精确的计算,实测源体的磁场参数能达到高性能ECR离子源的设计要求。离子源采用较高频率的14．5 GHz微波馈入加热等离子体,波导直接馈入离子源以增强馈入微波的稳定性与效率。此外,还大量采用了一些有利于提高离子源高电荷态离子产额的关键技术,如铝内衬等离子体弧腔、负偏压盘、铝制等离子体电极、三电极引出系统、辅助掺气等。

Experiments and modification on electron cyclotron resonance ion sources at the Institute of Modern Physics

Uranium ion beams were produced from electron cyclotron resonance (ECR) ion sources by sputtering method this year at the Institute of Modern Physics. At first, we chose the Lanzhou ECR No. 3 ion source to implement the production experiment of U ion beams. Finally, 11 e mu A of U28+, 5 e mu A of U32+, and 1.5 e mu A of U35+ were obtained. A U26+ ion beam produced by the LECR2 ion source was accelerated successfully by the cyclotron. This means that the Heavy Ion Research Facility in Lanzhou (HIRFL) has accomplished the acceleration of the ion beam of the heaviest element according to the designed parameters. The Lanzhou ECR ion source No. 2 (LECR2), which was built in 1997, has served the HIRFL for eight years and needed to be upgraded to provide more intense high charge state ion beams for HIRFL cooling storage ring. We started the upgrading project of LECR2 last year, and the modified design just has been finished. (c) 2006 American Institute of Physics.

Development of external electron-beam enhancement of the Penning ionization gauge ion source

To study the injection of additional electrons from an external electron gun into the plasma of a Penning ionization gauge (PIG) ion source, a test bench for the external electron-beam enhancement of the PIG (E-PIG) ion source was set up. A source magnet assembly was built to satisfy the request for magnetic field configuration of the E-PIG ion source. Numerical calculations have been done to optimize the magnetic field configuration so as to fit the primary electrons to be fed into the PIG discharge chamber along the spreading magnetic field lines. Many possible methods for improving the performance and stability of the PIG ion source have been used in the E-PIG ion source, including the use of multicrystal LaB6 cathode and optimized axial magnetic field. This article presents a detailed design of the E-PIG ion source. Substantial enhancement of ion charge state is expected to be observed which demonstrates that the E-PIG is a viable alternative to other much more costly and difficult to operate devices for the production of intense ion beams of higher charge state.

Commissioning test of LAPECR2 source on the 320kV HV platform

The high charge state all permanent Electron Cyclotron Resonance Ion Source (ECRIS) LAPECR2 (Lanzhou All Permanent magnet ECR ion source No.2) has been successfully put on the 320kV HV platform at IMP and also has been connected with the successive LEBT system. This source is the largest and heaviest all permanent magnet ECRIS in the world. The maximum mirror field is 1.28T (without iron plug) and the effective plasma chamber volume is as large as circle divide 67mm x 255mm. It was designed to be operated at 14.5GHz and aimed to produce medium charge state and high charge state gaseous and also metallic ion beams. The source has already successfully delivered some intense gaseous ion beams to successive experimental terminals. This paper will give a brief overview of the basic features of this permanent magnet ECRIS. Then commissioning results of this source on the platform, the design of the extraction system together with the successive LEBT system will be presented.

Research on metallic ion beam production at IMP

Since 1998, many experiments for metallic ion production have been done on LECR2 (Lanzhou ECR ion source NO.2), LECR3 (Lanzhou ECR ion source NO.3) and SECRAL (Superconductiong ECR ion source Advanced design in Lanzhou) at Institute of Modern Physics. The very heavy metallic ion beams such as those of uranium were also produced by the plasma sputtering method, and supplied for HIRFL (Heavy Ion Research Facility in Lanzhou) accelerators successfully. During the test, 11.5e mu AU(28+), 9e mu AU(24+) were obtained. Some ion beams of the metal having lower melting temperature such as Ni and Mg ion beams were produced by oven method on LECR3 too. The consumption rate was controlled to be lower for Mg-26 ion beams production, and the minimum consumption was about 0.3mg per hour. In this paper, the main experimental results are given. Some discussions are made for some experimental phenomena and results, and some conclusions are drawn.

关于强流ECR质子源氢等离子体发射光谱的诊断研究；OES diagnostics of H_2 plasma in an intense ECR proton source

本文通过发射光谱诊断方法,用H_2等离子体的辐射碰撞模型对连续溃入的微波功率和全永磁磁场约束下产生高密度的H_2等离子体进行光谱诊断,计算出一定放电条件下(微波功率200-700 W,压强0-2 Pa)H~+的密度为1010-1011 cm~(-3),另外讨论了实验中观察到的Balmer系氢原子发射光谱强度随放电条件的变化规律。

2.45GHzECR离子源及ECR离子源的磁场设计和计算

本文第一章介绍了高电荷态电子加旋共振（ECR）离子源发展情况，对其发展的几个方向作了一定的讨论，着重介绍了IMP高电荷态ECR离子源。第二章讨论了ECR离子源的加热原理，并讨论了低电荷态ECR离子源的加热情况。在ECR离子源中，磁场有着重要的作用，磁场场面设计和计算也ECR离子源物理设计中关键的一环。第三章讨论了ECR离子源的磁场设计和计算。在设计、加工几例磁场系统的基础上，利用计算与实测结果对离子源的磁场设计和计算作了一定程度的讨论。并使用二维POSSION、三维TOSCA程序对超导离子源进行了初步设计和计算。第四章着重讨论了两个2.45GHzECR离子源实验台。描述了一台2.45GHz单电荷态ECR离子源的结构与应用。介绍了其微波系统与磁场结构，并对该离子源的一些问题进行了讨论。在微波输入功率约600瓦，引出高压22KV，引出孔径为φ6mm，引出间隙6mm时，该离子源的总束流I(H_1~+ + H_2~+ + H_3~+)为 90mA。同时，介绍了一台2.45GHz多电荷态ECR实验台的设计。

ECR离子源高真空微调针阀控制系统

本论文首先介绍ECR（电子回旋共振）离子源的基本原理及其发展，在此基础上讲述了近物所的14.5GHzECR离子源的结构和特点。本论文主要内容是介绍所研制的适用于30KV高压端的ECR离子源高真空微调针阀控制系统。此系统被控对象是位于ECR源上的高真空微调针阀，它与地面之间有20～30KV的电位差。论文中首先阐述此控制系统研究的背景，并对ECR离子源电气参数控制的特点进行了说明。根据被控对象的情况以及对系统提出的指标，详细讲述了此控制系统的软、硬件实现。硬件包括步进电机、步进电机驱动器、轴编码器等。软件包括译码编程。然后从总体介绍此控制系统的功能结构，再分步讲述发射器、接受器、译码等各功能模块的实现过程。此控制系统的最大特点是使用光路实现高压绝缘，这为解决位于ECR离子源高压端器件的控制问题提出新思路。本系统的光路采用红外线发射接收系统，以空气为传输介质，依据光信号的有无接收控制信息，此方式效果好、易于实现。在系统中，使用光路传输装置定位，聚集透镜聚集，增加信号强度，提高抗干拢能力。而且此光路传输系统价格便宜，易于实现，可靠性好。在整个控制系统方案调研期间，对各种控制方式进行了比较和实验，在此基础上，确定了一个比较经济实用和具有高可靠性的方案。经过设计电路原理图、绘制印制线路板、加工印制线路板、购买元器件、组装电路后，首先成功地进行了离线调试，最后，将整个系统模拟实际环境进行调试实验。整个系统实现了稳定可靠的工作，达到了预期的设计指标，精度好于要求的千分之一。由于时间紧张和条件的限制，该系统还未在现场设备上进行实验。因此，在今后的工作中，此控制系统还需要在条件具备时，在现场设备上进行实验和考验。此外，为满足国家大科学工程兰洲重离子冷却储存环的要求，我参与了在14.5GHz ECR离子源上进行afterglow工作模式的实验，首次产生了高电荷态脉冲束流Ar~(11+)和Ar~(12+)。论文最后一部分给出了初步实验结果，并对结果进行了分析和解释。

ECR离子源发射度探测器的研制

成功研制一套适合于ECR离子源引出束流发射度测量的探测器ESS（Electric-SweeP Scanner）。该探测器主要由测量探头、机械驱动装置、计算机控制及数据获取系统组成。ESS探测器所采用的测量方法是双狭缝加电扫描法，具有速度快、精度高，能够比较直观的反映束流的发射度相图、相空间密度分布等特点，是目前ECR离子源引出束流发射度测量的有效手段。本论文对发射度探测器ESS的原理、结构及物理和技术设计作了较详细的描述，并给出了相应的设计图纸及数值模拟结果。最后，利用Ess探测器对LECR3（Lanzhou No.3）离子源引出的04＋离子束的发射度作了初步测量。当04＋引出束流为343μA日寸，初步测量所得水平方向的发射度为227mm·mrad（约90％束流），并给出了相应的束流发射度相图和束流相空间密度分布。

高电荷态ECR离子源游离机制及激光应用研究

本文论述了高电荷态ECR离子源的最新进展和原理；介绍了10GHz ECR2高电荷态离子源的设计特点和调试结果。在此离子源上发现了ECR离子源的新工作模式和新约束场形，新工作模式不同于传统工作模式的地方是在ECR离子源引出端注入低能电子；推动等离子体电极到更靠近高电荷态离子的约束区域；移动等磁压面使ECR等离子体向引出区域移动。新工作模式使ECR离子束流强度大为提高，得到Ar8+离子430μA、Ar9+离子320μA、O6+离子450μA；微波利用系数增加；工作气体气耗量减少。本文对新工作模式原理进行了详细的分析和讨论，得出高电荷态ECR离子源的一个重要结论，即引出端低能电子的注入比在注入端注入更有效。 本文还进行了将连续激光蒸发技术应用到ECR离子源中的研究。在10GHz ECR2离子源中使用50W连续CO2激光蒸发金属铝，得到Al6+离子约50μA。在此基础上根据ECR离子源新工作模式原理，提出了在ECR离子源引出端使用热阴极电子枪的设想，并阐述了其工作原理和设计。在激光离子源实验中发现强激光产生的等离子体具有独特的性质，如方向性、脉冲性和漂移性。在实验中使用磁场约束激光等离子体而使离子总束流提高了5倍，并首次使用了高频再游离措施，发现效果很明显，使得离子总束流提高了3倍。由此可见，可以利用脉冲激光产生等离子体的一些特殊性质来研究和改善ECR离子源的一些基本性质。 此外，在本论文中还介绍了2.45GHz ECR离子源实验台的设计和初步调试。

On-chip electron-impact ion source using carbon nanotube field emitters

A lateral on-chip electron-impact ion source utilizing a carbon nanotube field emission electron source was fabricated and characterized. The device consists of a cathode with aligned carbon nanotubes, a control grid, and an ion collector electrode. The electron-impact ionization of He, Ar, and Xe was studied as a function of field emission current and pressure. The ion current was linear with respect to gas pressure from 10-4 to 10-1 Torr. The device can operate as a vacuum ion gauge with a sensitivity of approximately 1 Torr-1. Ion currents in excess of 1 μA were generated. © 2007 American Institute of Physics.

Investigation of an electron string ion source with field emission cathode

The string mode of operation for an electron beam ion source uses axially oscillating electrons in order to reduce power consumption, also simplifying the construction by omitting the collector with cooling requirements and has been called electron string ion source (ESIS). We have started a project (supported by INTAS and GSI) to use Schottky field emitting cathode tips for generating the electron string. The emission from these specially conditioned tips is higher by orders of magnitude than the focused Brillouin current density at magnetic fields of some Tesla and electron energies of some keV. This may avoid the observed instabilities in the transition from axially oscillating electrons to the string state of the electron plasma, opening a much wider field of possible operating parameters for an ESIS. Besides the presentation of the basic features, we emphasize in this paper a method to avoid damaging of the field, emission tip by backstreaming ions. (C) 2008 American Institute of Physics.