Driving forces shaping phytoplankton assemblages in two subtropical plateau lakes with contrasting trophic status

1. We studied driving forces shaping phytoplankton assemblages in two subtropical plateau lakes with contrasting trophic status, the oligotrophic deep Lake Fuxian and the eutrophic shallow Lake Xingyun. 2. Phytoplankton samples were taken monthly for a year and phytoplankton species were sorted into the main taxonomic groups and associations proposed by Reynolds. A canonical correspondence analysis (CCA) was used to test the occurrence of these classification schemes and to determine their discriminatory power. 3. The results suggest that the major driving forces in Lake Fuxian were physical variables, and particularly the underwater light climate, whereas, nutrients were the important driving force in Lake Xingyun. 4. Top-down control through zooplankton grazing in Lake Fuxian was hardly ever a significant determinant itself, because of the scarcity of zooplankton and their low grazing efficiency of predation while a dominance of inedible cyanobacteria throughout the year rendered top-down controls ineffective failing in Lake Xingyun. Hence phytoplankton communities in both lakes appear to be regulated primarily by bottom-up controls.

Growth promotion of vegetative gametophytes of Undaria pinnatifida by blue light

Through an acclimation period of 10 days, compared to white light, the maximal net photosynthetic rates were significantly higher for gametophytes of Undaria pinnatifida cultivated under blue light (400-500 nm), and were lower under red light (600-700 nm). Chlorophyll c and the carotenoid content of gametophytes were similar under blue light and red light but were much lower under white light. The growth rate of female gametophytes under blue light was higher than that under other lights, and the growth rate of male gametophytes showed little variation with respect to blue and white light. Male and female gametophytes were mixed together to form sporophytes under white, blue and red light. After approximately 5 days, 50% gametophytes became fertile under blue and white light, but remained vegetative under red light after 10 days.

From nanoscience to nanotechnology: What can and what cannot be manufactured

Only a small fraction of contemporary nanoscience will ever emerge as a functioning and commercial nanotechnology. Far too little attention is paid to the hoops and hurdles presented by the transition from science to technology by those who assert that their work will find applications. A systematic protocol is developed for appropriate investigations. Copyright © 2014 Inderscience Enterprises Ltd.

Effect of rapid thermal annealing and hydrogen plasma treatment on the microstructure and light-emission of silicon-rich oxide film

Silicon-rich silicon oxide (SRSO) films are prepared by plasma-enhanced chemical vapor deposition method at the substrate temperature of 200degreesC. The effect of rapid thermal annealing and hydrogen plasma treatment on tire microstructure and light-emission of SRSO films are investigated in detail using micro-Raman spectroscopy, Fourier transform infrared (FTIR) spectroscopy and photoluminescence (PL) spectra. It is found that the phase-separation degree of the films decreases with increasing annealing temperature from 300 to 600degreesC, while it increases with increasing annealing temperature from 600 to 900degreesC. The light-emission of the films are enhanced with increasing annealing temperature up to 500degreesC, while it is rapidly reduced when the annealing temperature exceeds 600degreesC. The peak position of the PL spectrum blueshifts by annealing at the temperature of 300degreesC, then it red-shifts with further raising annealing temperature. The following hydrogen plasma treatment results in a disproportionate increase of the PL intensity and a blueshift or redshift of the peak positions, depending on the pristine annealing temperature. It is thought that the size of amorphous silicon clusters, surface structure of the clusters and the distribution of hydrogen in the films can be changed during the annealing procedure. The results indicate that not only cluster size but also surface state of the clusters plays an important role in the determination of electronic structure of the amorphous silicon cluster and recombination process of light-generated carriers.

快速热退火和氢等离子体处理对富硅氧化硅薄膜微结构与发光的影响

采用micro-Raman散射、傅里叶变换红外吸收谱和光致发光谱研究了快速热退火及氢等离子体处理对等离子体增强化学气相沉积法200 ℃衬底温度下生长的富硅氧化硅（SRSO）薄膜微结构和发光的影响。研究发现在300-600 ℃范围内退火，SRSO薄膜中非晶硅和SiO_x:H两相之间的相分离程度随退火温度升高趋于减小；而在600-900 ℃范围内退火，其相分离程度退火温度升高又趋于增大；同时发现SRSO薄膜发光先是随退火温度的升高显著加强，然后在退火温度达到和超过600 ℃后迅速减弱；发光峰位在300 ℃退火后蓝移，此后随退火温度升高逐渐红移。对不同温度退火后的薄膜进行氢等离子体处理，发光强度不同程度有所增强，发光峰位有所移动，但不同温度退火样品发光增强的幅度和峰位移动的趋势不同。分析认为退火能够引起薄膜中非晶硅颗粒尺度、颗粒表面结构状态以及氢的存在和分布等方面的变化。结果表明不仅颗粒的尺度大小，而且颗粒表面的结构状态都对非晶硅颗粒能带结构和光生载流子复合机理发挥重要影响。

Extracting nanobelt mechanical properties from nanoindentation

A three-spring-in-series model is proposed for the nanobelt (NB) indentation test. Compared with the previous two-spring-in-series model, which considers the bending stiffness of atomic force microscope cantilever and the indenter/NB contact stiffness, this model adds a third spring of the NB/substrate contact stiffness. NB is highly flexural due to its large aspect ratio of length to thickness. The bending and lift-off of NB form a localized contact with substrate, which makes the Oliver-Pharr method [W. C. Oliver and G. M. Pharr, J. Mater. Res. 7, 1564 (1992)] and Sneddon method [I. N. Sneddon, Int. J. Eng. Sci. 3, 47 (1965)] inappropriate for NB indentation test. Because the NB/substrate deformation may have significant impact on the force-indentation depth data obtained in experiment, the two-spring-in-series model can lead to erroneous predictions on the NB mechanical properties. NB in indentation test can be susceptible to the adhesion influence because of its large surface area to volume ratio. NB/substrate contact and adhesion can have direct and significant impact on the interpretation of experimental data. Through the three-spring-in-series model, the influence of NB/substrate contact and adhesion is analyzed and methods of reducing such influence are also suggested. (C) 2010 American Institute of Physics. [doi:10.1063/1.3432748]