Magneto-transport study of Nb-doped Bi/Pb2223 superconductor

The magneto-transport properties of Bi1.5Pb0.4Nb0.1Sr2Ca2Cu 3O10-x polycrystalline, superconducting ceramic are reported. The material was found to be chemically homogeneous and partially textured. The mixed state properties were investigated by measuring the electrical resistivity, longitudinal and transverse (Nernst effect) thermoelectric power, and thermal conductivity. The magnetization and AC susceptibility measurements were also performed. The variation of these characteristics for magnetic fields up to 5 T are discussed and compared to those of the zero field case. The transport entropy and thermal Hall angle are extracted and quantitatively compared to previously reported data of closely related systems. © 2003 Elsevier Science B.V. All rights reserved.

Fabrication and transport properties of ZnO/Nb-1 wt %-doped SrTiO3 epitaxial heterojunctions

(110) ZnO/(001) Nb-1 wt %-doped SrTiO3 n-n type heteroepitaxial junctions were fabricated using the pulse laser deposition method. A diodelike current behavior was observed. Different from conventional p-n junctions or Schottky diodes, the diffusion voltage was found to increase with temperature. At all temperatures, the forward current was perfectly fitted on the thermionic emission model. The band bending at the interface can qualitatively explain our results, and the extracted high ideality factor at low temperatures, as well as large saturation currents, is ascribed to the deep-level-assisted tunneling current through the junction. (C) 2008 American Institute of Physics.

Dielectric relaxation and giant dielectric constant of Nb-doped CaCu3Ti4O12 ceramics under dc bias voltage

CaCu3Ti(4-x)Nb(x)O(12) (x = 0, 0.01, 0.08, 0.2) ceramics were fabricated by a conventional solid-state reaction method. The ceramics showed the body-centered cubic structure without any foreign phases and the grain size decreases with Nb doping. Two Debye-type relaxations were observed for the Nb-doped samples at low frequency and high frequency, respectively. The complex electric modulus analysis revealed that the surface layer, grains and grain boundaries contributed to the dielectric constant. The low-frequency dielectric constant relative to the surface layer decreased to a minimum and then increased with the dc bias voltage at 100 Hz, which were well explained in terms of a model containing two metal oxide semiconductors in series, confirming the surface layer in the ceramics. The shift voltage V-B corresponding to the minimal capacitance increased with increase of the composition x. (C) 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Theoretical investigation on the phase stability of Nd2Fe14B and site preference of V, Cr, Mn, Zr and Nb

The stability of the excellent permanent magnetic compound Nd2Fe14B and substitution of Fe in the compound by V, Cr, Mn, Zr and Nb are investigated by using interatomic pair potentials which are converted from lattice-inversion method. Calculation shows that the substitution always makes the cell volume larger, and the increase of the volume is almost linear with substituent concentration. The calculated cohesive energy shows that the preferential order of substitution of Fe is Nb, V, Cr, Mn, Zr. Nevertheless, all the five substituting elements should most preferentially replace Fe in the j(2)' site, which has the greatest space among all six Fe sites. (C) 2005 Elsevier B.V. All rights reserved.

SiO2/Ta interface reaction in magnetic multilayers and its influence on Ta buffer layers

Ta is often used as a buffer layer in magnetic multilayers. In this study, Ta/Ni81Fe19/Ta multilayers were deposited by magnetron sputtering on sing-crystal Si with a 300-nm-thick SiO2 film. The composition and chemical states at the interface region of SiO2/Ta were studied using the X-ray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that there is an 'inter-mixing layer" at the SiO2/Ta interface due to a thermodynamically favorable reaction: 15 SiO2 + 37 Ta = 6 Ta2O5 + 5 Ta5Si3. Therefore, the Ta buffer layer thickness used to induce NiFe (111) texture increases.

Interlayer segregation of Cu atoms in Ta/NiFe/Cu/NiFe/FeMn/Ta spin-valve multilayers and its influence on magnetic properties

Experimental results show that the exchange coupling field (H-ex) of NiFe/FeMn for Ta/NiFe/FeMn/Ta multilayers is higher than that for spin-valve multilayers Ta/NiFe/Cu/NiFe/FeMn/Ta. In order to find out the reason, the composition and chemical states at the surface of Ta(12 nm)/NiFe(7 nm), Ta(12 nm)/NiFe(7 nm)/Cu(4 nm), and Ta(12 nm)/NiFe(7 nm)/Cu(3 nm)/NiFe(5 nm) were studied using x-ray photoelectron spectroscopy. The results show that no elements from lower layers float out or segregate to the surface in the first and second samples. However, Cu atoms segregate to the surface of Ta(12 nm)/NiFe(7 nm)/Cu(3 nm)/NiFe(5 nm) multilayers, i.e., Cu atoms segregate to the NiFe/FeMn interface for Ta/NiFe/Cu/NiFe/FeMn/Ta multilayers. We believe that the presence of Cu atoms at the interface of NiFe/FeMn is one of the important factors which causes the exchange coupling field (H-ex) of Ta/NiFe/Cu/NiFe/FeMn/Ta to be weaker than that of Ta/NiFe/FeMn/Ta. (C) 2002 American Institute of Physics.

Determination of the interdiffusion coefficients of liquid Zn and Sn using Ta/Zn-Sn/Si trilayers

In this paper we present a new method for measuring diffusion coefficients in liquid metals under convection-less conditions with solid/liquid-liquid/solid trilayer. The advantage of this kind of trilayer is that effects from gravity-induced convection and Marangoni-convection can be omitted, so that the diffusion coefficient is determined more accurately. The Ta/Zn-Sn/Si trilayer were prepared with a multi-target ion-beam sputtering deposition technique and annealed in an electric furnace under an argon atmosphere. The interdiffusion of liquid zinc and tin at 500 degrees degree C was investigated. The diffusion concentration profiles were determined by energy dispersive spectroscopy. The interdiffusion coefficients range from 1.0x10(-6)cm(2)/s to 2.8x10(-6)cm(2)/s, which is less than previous values measured by capillary reservoir technique under 1g-environment where various convection exist. The precise interdiffusion coefficients of liquid zinc and tin result from the removing of disturbances of various kinds of convection.

Magnetic property and interface structure of Ta/NiO/NiFe/Ta

Ta/NiO/NiFe/Ta multilayers, utilizing Ta as buffer layer, were prepared by rf reactive and de magnetron sputtering. The exchange coupling field between NiO and NiFe reached a maximum value of 9.6x10(3) A/m at a NiO film thickness of 50 nm. The composition and chemical states at interface region of Ta/NiO/Ta were studied by using the X-ray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that there is an "intermixing layer" at the Ta/NiO land NiO/Ta) interface due to a thermodynamically favorable reaction 2Ta + 5NiO = 5Ni + Ta2O5. This interface reaction has a great effect on exchange coupling. The thickness of Ni+NiO estimated by XPS depth. profiles is about 8-10 nm.

大鼠海马CA1区侧枝/联合纤维通路和TA通路兴奋性突触后电位（EPSP）空间整合的在体研究

本研究论文包含两部分内容。第一部分实验采用行为绝望抑郁模型（强迫游泳，Forcedswimmingtest，FsT），检测了吗啡单次注射、足部电击、以及吗啡／足部电击三种不同处理对大鼠在FST中总的不动时间（totaldurationofimobility）的影响。结果显示，在单一吗啡或足部电击或生理盐水处理48小时后，大鼠在强迫游泳中总的不动时间（durationofimobility）未受影响；相反，吗啡／足部电击共处理48小时后，大鼠在强迫游泳中总的不动时间被明显延长。该延长的总的不动时间可被鸦片受体的拮抗剂纳洛酮（naloxone）阻断。实验表明，吗啡和足部电击的协同效应增强了内源性鸦片系统所介导的致抑郁样作用。第二部分试验在麻醉Wistar大鼠上，应用双电极刺激的试验方法，对海马以1区锥体细胞近、远端树突兴奋性突触后电位（EPSP）的空间整合进行了初步探讨。结果表明，海马以1区锥体细胞近、远端树突的空间整合都是亚线性的；近端树突的空间整合不受期望值大小的影响，但远端树突的空间整合随期望值增加而减小（更趋于亚线性）。本研究表明，海马以1锥体细胞近、远端树突具有不同的空间整合特性。由于近端树突接受海马内部侧支／联合纤维投射的信息，远端树突通过TA通路接受内嗅皮层投射的信息，由此提示，CA1区锥体细胞对来自海马内部和直接来自皮层的信息输入采用了不同的整合方式。

Ta/NiFe/Cu/NiFe/FeMn/Ta自旋阀多层膜中Cu的层间偏聚及其对磁性的影响

实验结果表明Ta/NiFe/FeMn/Ta多层膜的交换耦合场Hex要大于Ta/NiFe/Cu /NiFe/FeMn/Ta自旋阀多层膜中的Hex. 为了寻找其原因, 用X射线光电子能谱(XPS)研究了Ta(12 nm)/NiFe(7 nm), Ta(12 nm)/NiFe(7 nm)/Cu(4 nm)和Ta(12 nm)/NiFe(7 nm)/ Cu(3 nm)/NiFe(5 nm) 3种样品, 研究结果表明前两种样品表面无任何来自下层的元素偏聚, 但在第3种样品最上层的NiFe表面上, 探测到从下层偏聚上来的Cu原子. 认为: Cu在NiFe/FeMn层间的存在是Ta/NiFe/Cu/NiFe/FeMn/Ta自旋阀多层膜的Hex低于Ta/NiFe/FeMn/Ta多层膜Hex的一个重要原因.

磁性多层膜中SiO_2/Ta界面反应及其对缓冲层的影响

磁性多层膜常以金属Ta作为缓冲层。利用磁控溅射方法在表面有300nm厚SiO_2氧化膜的单晶硅(100)基片上沉积了Ta/NiFe/Ta薄膜。采用X射线光电子能谱（XPS）对该薄膜进行了深度剖析，并且对获得的Ta 4f和Si 2p的高分辨XPS谱进行计算机谱图拟合分析。结果表明在SiO_2/Ta界面处发生了化学反应

Ta/NiO/NiFe/Ta的磁性及界面的结构

利用磁控反应溅射方法以Ta作为缓冲层制备了Ta/NiO/NiFe/Ta薄膜，磁性分析表明，该结构薄膜的交换耦合场为9.6×10~3A/m，但量所需NiO的实际厚度增加了。采用X射线光电子能谱研究了Ta/NiO/Ta界面，并进行计算机谱图拟合分析。结果表明界面反应是影响层间耦合的一个重要因素。在Ta/NiO界面处发生了反应