Hybrid photonic crystal lasers

Energy efficient Wavelength Division Multiplexing (WDM) is the key to satisfying the future bandwidth requirements of datacentres. As the silicon photonics platform is regarded the only technology able to meet the required power and cost efficiency levels, the development of silicon photonics compatible narrow linewidth lasers is now crucial. We discuss the requirements for such laser systems and report the experimental demonstration of a compact uncooled external-cavity mW-class laser architecture with a tunable Si Photonic Crystal resonant reflector, suitable for direct Frequency Modulation.

Modulateurs intégrés sur silicium pour la transmission de signaux à modulation d'amplitude multi-niveau

Au cours des dernières années, la photonique intégrée sur silicium a progressé rapidement. Les modulateurs issus de cette technologie présentent des caractéristiques potentiellement intéressantes pour les systèmes de communication à courte portée. En effet, il est prévu que ces modulateurs pourront être opérés à des vitesses de transmission élevées, tout en limitant le coût de fabrication et la consommation de puissance. Parallèlement, la modulation d’amplitude multi-niveau (PAM) est prometteuse pour ce type de systèmes. Ainsi, ce travail porte sur le développement de modulateurs de silicium pour la transmission de signaux PAM. Dans le premier chapitre, les concepts théoriques nécessaires à la conception de modulateurs de silicium sont présentés. Les modulateurs Mach-Zehnder et les modulateurs à base de réseau de Bragg sont principalement abordés. De plus, les effets électro-optiques dans le silicium, la modulation PAM, les différents types d’électrodes intégrées et la compensation des distorsions par traitement du signal sont détaillés.Dans le deuxième chapitre, un modulateur Mach-Zehnder aux électrodes segmentées est présenté. La segmentation des électrodes permet la génération de signaux optiques PAM à partir de séquences binaires. Cette approche permet d’éliminer l’utilisation de convertisseur numérique-analogique en intégrant cette fonction dans le domaine optique, ce qui vise à réduire le coût du système de communication. Ce chapitre contient la description détaillée du modulateur, les résultats de caractérisation optique et de la caractérisation électrique, ainsi que les tests systèmes. De plus, les tests systèmes incluent l’utilisation de pré-compensation ou de post-compensation du signal sous la forme d’égalisation de la réponse en fréquence pour les formats de modulation PAM-4 et PAM-8 à différents taux binaires. Une vitesse de transmission de 30 Gb/s est démontrée dans les deux cas et ce malgré une limitation importante de la réponse en fréquence suite à l’ajout d’un assemblage des circuits radiofréquences (largeur de bande 3 dB de 8 GHz). Il s’agit de la première démonstration de modulation PAM-8 à l’aide d’un modulateur Mach-Zehnder aux électrodes segmentées. Finalement, les conclusions tirées de ce travail ont mené à la conception d’un deuxième modulateur Mach-Zehnder aux électrodes segmentées présentement en phase de test, dont les performances montrent un très grand potentiel. Dans le troisième chapitre, un modulateur à réseau de Bragg à deux sauts de phase est présenté. L’utilisation de réseaux de Bragg est une approche encore peu développée pour la modulation. En effet, la réponse spectrale de ces structures peut être contrôlée précisément, une caractéristique intéressante pour la conception de modulateurs. Dans ces travaux, nous proposons l’ajout de deux sauts de phase à un réseau de Bragg uniforme pour obtenir un pic de transmission dans la bande de réflexion de celui-ci. Ainsi, il est possible d’altérer l’amplitude du pic de transmission à l’aide d’une jonction pn. Comme pour le deuxième chapitre, ce chapitre inclut la description détaillée du modulateur, les résultats des caractérisations optique et électrique, ainsi que les tests systèmes. De plus, la caractérisation de jonctions pn à l’aide du modulateur à réseau de Bragg est expliquée. Des vitesses de transmission PAM-4 de 60 Gb/s et OOK de 55 Gb/s sont démontrées après la compensation des distorsions des signaux. À notre connaissance, il s’agit du modulateur à réseau de Bragg le plus rapide à ce jour. De plus, pour la première fois, les performances d’un tel modulateur s’approchent de celles des modulateurs de silicium les plus rapides utilisant des microrésonateurs en anneau ou des interféromètres Mach-Zehnder.

Estructuras sub-longutud de onda para el diseño de dispositivos en guía dieléctrica

Sub-wavelength structures are enabling the design of devices based in dielectric waveguides with unprecedented performance in both the near-infrared and mid-infrared wavelength regions. These devices include fiber-to-chip grating couplers with sub-decibel efficiency, waveguide couplers with bandwidths of several hundred nanometers, and low loss suspended waveguides. Here we will report our progress in the electromagnetic modelling and simulation of sub-wavelength structures, providing at the same time an intuitive vision of their fundamental optical properties. Furthermore, we will address design strategies for several integrated optical devices based on these structures, and present the latest experimental results for structures operating both at near and mid-infrared wavelengths.

Studies on the deposition and characterization of silicon oxide films for optical coating applications

Silicon oxide films were deposited by reactive evaporation of SiO. Parameters such as oxygen partial pressure and substrate temperature were varied to get variable and graded index films. Films with a refractive index in the range 1.718 to 1.465 at 550 nm have been successfully deposited. Films deposited using ionized oxygen has the refractive index 1.465 at 550 nm and good UV transmittance like bulk fused quartz. Preparation of graded index films was also investigated by changing the oxygen partial pressure during deposition. A two layer antireflection coating at 1064nm has been designed using both homogeneous and inhomogeneous films and studied their characteristics.

Fabrication and characterization of sub 100 nm period polymer gratings for photonics applications

We report on the fabrication of polymethylmethacrylate (PMMA) nanogratings on silicon (Si) and glass substrates using electron beam lithography technique. Various aspects of proximity corrections using Monte Carlo simulation have been discussed. The fabrication process parameters such as proximity gap of exposure, exposure dosage and developing conditions have been optimized for high-density PMMA nanogratings structure on Si and glass substrates. Electron beam exposure is adjusted in such a way that PMMA acts as a negative tone resist and at the same time resolution loss due to proximity effect is minimum. Both reflection and transmission-type, nanometre period gratings have been fabricated and their diffraction characteristics are evaluated.

Optoelectronic Properties of Graphene on Silicon Substrate: Effect of Defects in Graphene

Engineering of electronic energy band structure in graphene based nanostructures has several potential applications. Substrate induced bandgap opening in graphene results several optoelectronic properties due to the inter-band transitions. Various defects like structures, including Stone-Walls and higher-order defects are observed when a graphene sheet is exfoliated from graphite and in many other growth conditions. Existence of defect in graphene based nanostructures may cause changes in optoelectronic properties. Defect engineered graphene on silicon system are considered in this paper to study the tunability of optoelectronic properties. Graphene on silicon atomic system is equilibrated using molecular dynamics simulation scheme. Based on this study, we confirm the existence of a stable super-lattice. Density functional calculations are employed to determine the energy band structure for the super-lattice. Increase in the optical energy bandgap is observed with increasing of order of the complexity in the defect structure. Optical conductivity is computed as a function of incident electromagnetic energy which is also increasing with increase in the defect order. Tunability in optoelectronic properties will be useful in understanding graphene based design of photodetectors, photodiodes and tunnelling transistors.

Assembly and inspection of liquid crystal on silicon devices

Liquid crystal on silicon (LCOS) is one of the most exciting technologies, combining the optical modulation characteristics of liquid crystals with the power and compactness of a silicon backplane. The objective of our work is to improve cell assembly and inspection methods by introducing new equipment for automated assembly and by using an optical inspection microscope. A Suss-Micro'Tec Universal device bonder is used for precision assembly and device packaging and an Olympus BX51 high resolution microscope is employed for device inspection. ©2009 Optical Society of America.

Millisecond processing beyond chip technology: From electronics to photonics

There is a clear and increasing interest in short time annealing processing far below one second, i.e. the lower limit of Rapid Thermal Processing (RTP) called spike annealing. This was driven by the need of suppressing the so-called Transient Enhanced Diffusion in advanced boronimplanted shallow pn-junctions in silicon technology. Meanwhile the interest in flash lamp annealing (FLA) in the millisecond range spread out into other fields related to silicon technology and beyond. This paper reports on recent experiments regarding shallow junction engineering in germanium, annealing of ITO layers on glass and plastic foil to form an conductive layer as well as investigations which we did during the last years in the field of wide band gap semiconductor materials (SiC, ZnO). A more common feature evolving from our work was related to the modeling of wafer stress during millisecond thermal processing with flash lamps. Finally recent achievements in the field of silicon-based light emission basing on Metal-Oxide-Semiconductor Light Emitting Devices will be reported. © 2007 IEEE.

The silicon backplane design for an LCOS polarization-insensitive phase hologram SLM

Polarization-insensitivity is achieved in a reflective spatial light modulator by laying a quarter-wave plate (QWP) at the incident wavelength directly over the mirror pixels of a silicon backplane, and forming a nematle Fréedrickcz cell over the QWP to modulate the reflected phase. To achieve the highest drive voltage from the available silicon process, a switched voltage common front electrode design is described, with variable amplitude square wave drive to the pixels to maintain constant root-mean-square drive and minimize phase fluctuations during the dc balance refresh cycle. The silicon has been fabricated and liquid-crystal-on-silicon cells both with and without the QWP assembled; applications include optically transparent switches for optical networks, beam steering for add-drop multiplexers for wavelength-division- multiplexing telecommunications, television multicast, and holographic projection.

Light generation in silicon photonic crystal cavities

Far-field optimized photonic crystal nanocavities are used to strongly increase light generation from crystalline silicon. Low-power continuous-wave harmonic generation as well as efficient room temperature light-emission from optically-active defects are demonstrated in these devices. © 2011 IEEE.

Locally-oxidized silicon surface-plasmon Schottky detector for telecom wavelengths

We demonstrate an integrated on-chip locally-oxidized silicon surface-plasmon Schottky detector for telecom wavelengths based on the internal photoemission process. Theoretical model and experimental results will be presented and discussed. © 2011 IEEE.

Wafer-Level Testable High-Speed Silicon Microring Modulator Integrated with Grating Couplers

A wafer-level testable silicon-on-insulator-based microring modulator is demonstrated with high modulation speed, to which the grating couplers are integrated as the fiber-to-chip interfaces. Cost-efficient fabrications are realized with the help of optical structure and etching depth designs. Grating couplers and waveguides are patterned and etched together with the same slab thickness. Finally we obtain a 3-dB coupling bandwidth of about 60nm and 10 Gb/s nonreturn-to-zero modulation by wafer-level optical and electrical measurements.

Design, fabrication and characterization of a high-performance microring resonator in silicon-on-insulator

A high-performance microring resonator in a silicon-on-insulator rib waveguide is realized by using the electron beam lithography followed by inductively coupled plasma etching. The design and the experimental realization of this device are presented in detail. In addition to improving relevant processes to minimize propagation loss, the coupling efficiency between the ring and the bus is carefully chosen to approach a critical coupling for high performance operating. We have measured a quality factor of 21,200 and an extinction ratio of 12.5dB at a resonant wavelength of 1549.32nm. Meanwhile, a low propagation loss of 0.89dB/mm in a curved waveguide with a bending radius of 40 mu m is demonstrated as well.