985 resultados para Plasma (Gases ionizados)


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Thin polymeric films deposited by plasma are very atractive for many industrial and scientific applications, in areas such as electronics, mechanics, coatings, biomaterials, among others, due to its favorable properties such as good adhesion to the substrate, high crosslinking, nanomectric thickness, homogeneity, etc. In this work, thin films were deposited by plasma immersion ion implantation and deposition technique from a hexamethyldisilazane/argon mixture at different proportions. These films were subjected to several characterizations, such as, contact angle, which presented values near to 100 degrees, surface energy, with values near to 31 mJ/m2, hardness with values between 0.7 and 2.6 GPa, thickness from 100 to 200 nm, refractive index from 1.56 to 1.64, molecular structure presenting the following functional groups in the infrared spectra region: CHx from 2960 to 2900 cm-1; Si-H around 2130 cm-1; CH3 in Si-(CH3)x around 1410 cm-1; CH3 in Si-(CH3)x in 1260 cm-1; N-H around 1180 cm-1; CH2 in Si-CH2-Si bonds around 1025 cm-1; Si-O in Si-O-Si from 1020 to 1100 cm-1; Si-N in Si-H-Si bonds around 940 cm-1; CH3 in Si-(CH3)3 in 850 cm-1; Si-C bonds in Si-(CH3)2 around 800 cm-1; and Si-H in 680 cm-1 . From these characterizations, it was possible to conclude that the concentration of argon or hexamethyldisilazane in the mixture changed the resulting polymer

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This paper presents the study on the application of the electrolytic plasma for surface treatment of aluminum. A bibliographical study on the material of interest was preliminarily performed and later designed and built an electrolytic cell, including the excitation source. Unlike conventional electrolysis process, the plasma assisted carry on in the non-linear region of characteristic current/voltage curve. Therefore it requires for the on set of the process that the power supply operates on harder conditions than those on high current process. The plasma produced during the present investigation has temperatures in the range o 6,0.10 3 -7,0 .10 3 K, well above those found in conventional chemical process. It also shows a particular dynamic to promote changes on surface and to produce new materials. The plasma is generated by microdischarge in vapor or gas bubbles involved in physic-chemical processes in electrode regions of the electrolytic cell. The electrode material was the aluminum (7075). The Process Electrolytic Plasma Processing (EPP) is sensitive to various parameters such as operating voltage, current density, electrolyte, concentration of electrolyte, geometry of reactor, temperature of electrolytic solution and dynamic of the fluid in the cell. The experiments were carried on in order to find parameters for a stable abd steady operation. The choice for the electrolytic was silicate/alkali solution in various concentrations to operate in various voltage as well. Plasma was produced on negative (cathode) and positive (anode) electrode, in specific conditions. A stable operation on the cathode process was obtained with low concentration of the electrolytic in aqueous solution, current density around 250V effective voltage. For the evolution of plasma in anodic process it was required higher concentrations and higher... (Complete abstract click electronic access below)

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Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

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Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)

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In this work, air dielectric barrier discharge (DBD) operating at two different frequencies (60 Hz and 17 kHz) was used to improve surface properties of polypropylene (PP). The changes in surface hydrophilicity were investigated by contact angle measurements. The modifications in chemical composition of PP surface were studied by X-ray photoelectron spectroscopy (XPS) and Fourier-transformed infrared spectroscopy (FTIR). The PP roughness were analyzed before and after the DBD treatment using atomic force microscopy (AFM). In order to compare the results obtained at different frequencies, the analyses are presented as a function of the deposited energy density. The results show that both DBD treatments led to formation of low-molecular weight oxidized material (LMWOM). It tends to agglomerate into small mounts on the surface, as shown by AFM analyses. These structures are weakly bounded to the surface and can be easily removed by rinsing in polar solvents. After washing the DBD-treated samples, the PP partially recovers its original wetting characteristics. This suggests that oxidation also occurred at deeper and more permanent levels on the PP samples. Comparing both DBD treatments, the 17 kHz process was found to be more efficient in introducing oxygen groups to the PP surface

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Pós-graduação em Engenharia Mecânica - FEG

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Pós-graduação em Ciência e Tecnologia de Materiais - FC

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Ti-6Al-4V alloy is one of the most frequently used Ti alloys with diverse applications in aerospace and biomedical areas due to its favorable mechanical properties, corrosion resistance and biocompatibility. Meanwhile, its surface can stiffer intense corrosion caused by wear processes due to its poor tribological properties. Thus in the present study, PIII processing of Ti-6Al-4V alloy was carried out to evaluate its corrosion resistance in 3.5% NaCl solution. Two different sets of Ti-6Al-4V samples were PIII treated, varying the plasma gases and the treatment time. The corrosion behavior is correlated with the surface morphology, and the nitrogen content. SEM micrographs of the untreated sample reveal a typical two-phase structure. PIII processing promotes surface sputtering and the surface morphology is completely different for samples treated with N-2/H-2 mixture and N-2 only. The highest penetration of nitrogen (similar to 88 nm), corresponding to 33% of N-2 was obtained for the sample treated with N-2/H-2 mixture for 1:30 h. The corrosion behavior of the samples was investigated by a potentiodynamic polarization method. A large passive region of the polarization curves (similar to 1.5 V), associated with the formation of a protective film, was observed for all samples. The passive current density (similar to 3 x 10(-6) A cm(-2)) of the PIII-treated Ti-6Al-4V samples is about 10 times higher than for the untreated sample. This current value is still rather low and maintains good corrosion resistance. The anodic branches of the polarization curves for all treated Ti-6Al-4V samples demonstrate also that the oxide films break down at approximately 1.6 V, forming an active region. Although the sample treated by N-2/H-2 mixture for 1.30 It has thicker nitrogen enriched layer, better corrosion resistance is obtained for the PIII process performed with N, gas only. (c) 2007 Elsevier B.V. All rights reserved.

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This study investigated the effect of an Argon-based nonthermal plasma (NTP) surface treatment-operated chairside at atmospheric pressure conditions applied immediately prior to dental implant placement in a canine model. Surfaces investigated comprised: Calcium-Phosphate (CaP) and CaP + NTP (CaP-Plasma). Surface energy was characterized by the Owens-Wendt-Rabel-Kaelble method and chemistry by X-ray photoelectron spectroscopy (XPS). Six adult beagles dogs received 2 plateau-root form implants (n = 1 each surface) in each radii, providing implants that remained 1 and 3 weeks in vivo. Histometric parameters assessed were bone-to-implant contact (BIC) and bone area fraction occupancy (BAFO). Statistical analysis was performed by Kruskall-Wallis (95% level of significance) and Dunn's post-hoc test. The XPS analysis showed peaks of Ca, C, O, and P for the CaP and CaP-Plasma surfaces. Both surfaces presented carbon primarily as hydro-carbon (CAC, CAH) with lower levels of oxidized carbon forms. The CaP surface presented atomic percent values of 38, 42, 11, and 7 for C, O, Ca, and P, respectively, and the CaPPlasma presented increases in O, Ca, and P atomic percent levels at 53, 12, and 13, respectively, in addition to a decrease in C content at 18 atomic percent. At 1 week no difference was found in histometric parameters between groups. At 3 weeks significantly higher BIC and BAFO were observed for CaPPlasma treated surfaces. Surface elemental chemistry was modified by the Ar-based NTP. Ar-based NTP improved bone formation around plateau-root form implants at 3 weeks compared with CaP treatment alone. © 2012 Wiley Periodicals, Inc.

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Cold atmospheric pressure plasma (APP) is a recent, cutting-edge antimicrobial treatment. It has the potential to be used as an alternative to traditional treatments such as antibiotics and as a promoter of wound healing, making it a promising tool in a range of biomedical applications with particular importance for combating infections. A number of studies show very promising results for APP-mediated killing of bacteria, including removal of biofilms of pathogenic bacteria such as Pseudomonas aeruginosa. However, the mode of action of APP and the resulting bacterial response are not fully understood. Use of a variety of different plasma-generating devices, different types of plasma gases and different treatment modes makes it challenging to show reproducibility and transferability of results. This review considers some important studies in which APP was used as an antibacterial agent, and specifically those that elucidate its mode of action, with the aim of identifying common bacterial responses to APP exposure. The review has a particular emphasis on mechanisms of interactions of bacterial biofilms with APP.

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Backgroud: The influence of diamond-like-carbon (DLC) films on bacterial leakage through the interface between abutments and dental implants of external hexagon (EH) and internal hexagon (IH) was evaluated. Film deposition was performed by PECVD (Plasma Enhanced Chemical Vapor Deposition). Sets of implants and abutments (N=180, n=30) were divided according to the connection design and the treatment of the abutment base: (1) no treatment (control); (2) DLC film deposition, and (3) Ag-DLC film deposition. Under sterile conditions, 1 µL of Enterococcus faecalis was inoculated inside the implants, and abutments were tightened. The sets were tested for immediate external contamination, suspended in test tubes containing sterile culture broth, and followed-up for five days. Turbidity of the broth indicated bacterial leakage. At the end of the period, the abutments were removed and the internal content of the implants was collected with paper points and plated in Petri dishes. They were incubated for 24 h for bacterial viability assessment and colony-forming unit (CFU) counting. Bacterial leakage was analyzed by Chi-square and Fisher exact tests (α=5%). The percentage of bacterial leakage was 16.09% for EH implants and 80.71% for IH implants (P<0.0001). The bacterial load was higher inside these implants (P=0.000). The type of implant significantly influenced the results (P=0.000), whereas the films did not (P=0.487). We concluded that: (1) IH implants showed a higher frequency of bacterial leakage and (2) the DLC and Ag-DLC films did not significantly reduce the frequency of bacterial leakage and bacteria load inside the implants.

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Se presenta aquí un elemento pasivo, de reciente desarrollo, el generador Hall. Este elemento de pequeñísimo tamaño, se basa en un efecto descubierto en 1789 por Hall. En primer lugar, se estudia el efecto, que tiene lugar en los metales, en los semiconductores e incluso en los gases ionizados. El coeficiente de Hall Rh o bien la sensitividad K0 representan en cierto modo la, capacidad de funcionamiento del generador, y por esto resulta muy interesante profundizar un poco en ello y ver qué factores influyen sobre los valores de aquellos parámetros. Se citan algunas de las muchas propiedades de aplicación del elemento. Para terminar esta primera parte, dedicada al efecto en los semiconductores, presentamos un circuito equivalente, cuyo margen de validez vendrá en cada caso determinado por los valores máximos establecidos por el fabricante. Por último, se expone el principio del multiplicador, y sobre un multiplicador comercial se tratan de explicar algunos resultados del mismo que parecen pobres, dada la posibilidad teórica de la cápsula en sí. Aunque comprendemos que gran parte de los inconvenientes provienen de los mismos circuitos, como no conocemos éstos,nos ceñimos más bien a los errores que provienen de la propia cápsula. Parece más honrado y quizás añada algo de luz sobre el conocimiento del elemento considerado