Analysis of switched capacitor DC-DC step down converter

A 5V/1 V Switched Capacitor (SC) dc-dc converter designed for a 0.18μm CMOS process is analysed in detail, in this paper. Analytical equations are derived for the voltages and currents through the main components of the SC converter. The model includes switches, capacitors, equivalent series resistances and the load. The switches in the converter are represented by MOSFETs in the UMC 0.18μm CMOS process. The impact of system parameters on output voltage ripple are studied using the analytical expressions.

Risk analysis in aquaculture: A step-by-step introduction with worked examples

This publication is based on materials covered and outputs generated during the Workshop on Risk Assessment Methodologies and Tools for Aquaculture in Sub-Saharan Africa, which was jointly held by WorldFish and FAO in Siavonga, Zambia on 28 June - 2 July 2010. The workshop was delivered as a training exercise to 17 participants from seven sub-Saharan countries and was designed to highlight current methodologies and tools available for environmental risk analysis in aquaculture development. A key focus of the workshop was to encourage participants to consider hypothetical but realistic scenarios and to discuss issues relevant to evaluating the environmental risks of a given activity or scenario. This publication presents selected scenarios from the workshop and the outcomes of the deliberative process as developed by the participants. This publication is factual but not comprehensive, therefore any statements or estimations of risk do not represent the actual risks arising from the described scenario. It is intended to serve as an easily readable introduction to risk analysis, highlighting worked examples that will provide guidance on how a risk analysis may be approached in a similar situation.

Mode control in vertical-cavity surface-emitting lasers by post-processing using focused ion-beaih etching

Single-mode emission is achieved in previously multimode gain-guided vertical-cavity surface-emitting lasers (VCSEL's) by localized modification of the mirror reflectivity using focused ion-beam etching. Reflectivity engineering is also demonstrated to suppress transverse mode emission in an oxide-confined device, reducing the spectral width from 1.2 nm to less than 0.5 nm.

Mechanism of polarization pinning in vertical cavity surface emitting lasers using focused ion beam etching

Photoluminescence experiments have identified strain as the origin for polarization pinning in vertical cavity surface emitting lasers post-processed by focused ion beam etching. Theoretical models were applied to deduce the strain in devices. Post-annealing was used to optimize polarization pinning.

High power laser with integrated lens using focused ion beam etching

In this study, a collimating lens is introduced at the output facet of a tapered waveguide laser to compensate for the divergence of the optical mode. The collimating lens is shown to enhance the laser efficiency while simultaneously reducing the far field divergence.

Focused ion beam etching of GaN

We have investigated the use of focused ion beam (FIB) etching for the fabrication of GaN-based devices. Although work has shown that conventional reactive ion etching (RIE) is in most cases appropriate for the GaN device fabrication, the direct write facility of FIB etching - a well-established technique for optical mask repair and for IC failure analysis and repair - without the requirement for depositing an etch mask is invaluable. A gallium ion beam of about 20nm diameter was used to sputter GaN material. The etching rate depends linearly on the ion dose per area with a slope of 3.5×10 -4μm3/pC. At a current of 3nA, for example, this corresponds to an etch rate of 1.05μm3/s. Good etching qualities have been achieved with a side wall roughness significantly below 0.1μm. Changes in the roughness of the etched surface plane stay below 8nm.

Step synchronization and third person speed perception in virtual environment locomotion simulators

Human locomotion is known to be influenced by observation of another person's gait. For example, athletes often synchronize their step in long distance races. However, how interaction with a virtual runner affects the gait of a real runner has not been studied. We investigated this by creating an illusion of running behind a virtual model (VM) using a treadmill and large screen virtual environment showing a video of a VM. We looked at step synchronization between the real and virtual runner and at the role of the step frequency (SF) in the real runner's perception of VM speed. We found that subjects match VM SF when asked to match VM speed with their own (Figure 1). This indicates step synchronization may be a strategy of speed matching or speed perception. Subjects chose higher speeds when VMSF was higher (though VM was 12km/h in all videos). This effect was more pronounced when the speed estimate was rated verbally while standing still. (Figure 2). This may due to correlated physical activity affecting the perception of VM speed [Jacobs et al. 2005]; or step synchronization altering the subjects' perception of self speed [Durgin et al. 2007]. Our findings indicate that third person activity in a collaborative virtual locomotive environment can have a pronounced effect on an observer's gait activity and their perceptual judgments of the activity of others: the SF of others (virtual or real) can potentially influence one's perception of self speed and lead to changes in speed and SF. A better understanding of the underlying mechanisms would support the design of more compelling virtual trainers and may be instructive for competitive athletics in the real world. © 2009 ACM.