Droplet Generator

A method and device for periodically perturbing the flow field within a microfluidic device to provide regular droplet formation at high speed.

Radiation Concentrator Device

A radiation concentrator device 21 for improved efficiency in solar systems by limiting reflected light, comprising a radiation concentrator element 27 comprising a radiation transmissive surface 29, a radiation receiving device and disposed on the incident radiation side of the concentrator element 27 is a recapture element 23 for recapturing at least a portion of radiation lost from the concentrator element 27, where the recapturing element allows transmission of incident light into the concentrator element 27, recaptures escaping radiation from the concentrator element and reflecting the radiation back into the concentrator element. Also disclosed are radiation concentrator device 21 where the recapture element 23 comprises ridged or grooved structures to increase the internal reflection of the radiation. The concentrator element 27 may also be provided with luminescent materials.

Patterning method to create a mask

A method of creating micro patterned devices by patterning thin films which are deposited on a substrate. A channel or channels is created on the substrate, the width being of fine enough resolution such that a flowable mask material can be drawn along the channel by capillary forces

Method of etching

A method of creating micro patterned devices by patterning thin films which are deposited on a substrate. A channel or channels is created on the substrate, the width being of fine enough resolution such that a flowable mask material can be drawn along the channel by capillary forces.

Patterning method

A method of patterning a flowable material on a surface, the method comprising providing the surface with at least one channel and at least one through- hole with at least two openings, wherein at least one of the openings is located in the surface adjacent to the at least one channel, such that when flowable material is deposited adjacent to another of the at least two openings, the material is directed into the at least one through-hole by the action of capillary forces and emerges at the opening adjacent to the at least one channel whereupon it is further directed along said channel.

Electronic device with self-aligned electrodes fabricated using additive liquid deposition

The invention provides a multilayer electronic device having electrodes, formed on a laterally extending first layer, the lateral position of each of at least two adjacent electrodes being defined by a channel in the first layer. Each channel is adjacent a deposition region, the material which forms each electrode substantially covering the deposition region to form a continuous conductive structure.

七株眼虫基于微卫星DNA指纹图谱的区分和关系分析

尽管以前对眼虫进行过大量的形态发育研究和基于核糖体RNA基因的系统发育分析,但对于株系之间的关系仍然知之甚少．因其形态特征有限并且易变,很难鉴定眼虫的相似种和同种内不同的株．作者利用微卫星DNA指纹图谱,在七株眼虫中扩增了七个微卫星DNA位点,成功扩增的六个微卫星引物都得到了四到八个条带．从微卫星DNA指纹图谱计算得到的相似性系数范围从0．000到0．957．根据相似性系数得到的树状结构,七株眼虫在距离为0．9346处分为三支:E．mutabilis,E．intermedia和E．gracilis．其中,

A Hierarchical Model for Ordinal Matrix Factorization

This paper proposes a hierarchical probabilistic model for ordinal matrix factorization. Unlike previous approaches, we model the ordinal nature of the data and take a principled approach to incorporating priors for the hidden variables. Two algorithms are presented for inference, one based on Gibbs sampling and one based on variational Bayes. Importantly, these algorithms may be implemented in the factorization of very large matrices with missing entries. The model is evaluated on a collaborative filtering task, where users have rated a collection of movies and the system is asked to predict their ratings for other movies. The Netflix data set is used for evaluation, which consists of around 100 million ratings. Using root mean-squared error (RMSE) as an evaluation metric, results show that the suggested model outperforms alternative factorization techniques. Results also show how Gibbs sampling outperforms variational Bayes on this task, despite the large number of ratings and model parameters. Matlab implementations of the proposed algorithms are available from cogsys.imm.dtu.dk/ordinalmatrixfactorization.

保安湖沉水植物分布的GIS模拟

以 GPS为辅助 ,在保安湖主体湖和桥墩湖进行沉水植物调查。将野外调查数据构建 GIS数据库 ,基于 GIS软件平台 ,运用 Kringing插值法对保安湖沉水植物分布进行模拟。模拟结果清楚地显示出调查时保安湖沉水植物及 4优势种 (金鱼藻 Ceratophyllum demersum L.、穗状狐尾藻 Myriophyllum spicatum L .、微齿眼子菜 Potamogeton maackianus A.Benn.及苦草 Vallisneria spiralis L.)分别在湖中的分布情况。统

扁担塘底栖动物群落的能量流动

1996年 4月至 1 997年 3月对典型草型湖泊——扁担塘大型底栖动物群落的能量流动及特性进行了研究。结果表明 ,扁担塘大型底栖动物群落的总摄食能为 2 1 1 9.5 k J· m-2· a-1 ,代谢能为 389.7k J· m-2· a-1 ,排粪能为 1 642 .1 k J·m-2·a-2 ,排泄能为 34.6k J·m-2·a-1 ,生长能 (生产量 )为 53.1 k J· m-2·a-1 ;群落的平均同化效率为 2 2 .5% ,表明 77.5%的摄食能被排泄掉 ;净生长效率为 1 1

High-density remote plasma sputtering of high-dielectric-constant amorphous hafnium oxide films

Hafnium oxide (HfOx) is a high dielectric constant (k) oxide which has been identified as being suitable for use as the gate dielectric in thin film transistors (TFTs). Amorphous materials are preferred for a gate dielectric, but it has been an ongoing challenge to produce amorphous HfOx while maintaining a high dielectric constant. A technique called high target utilization sputtering (HiTUS) is demonstrated to be capable of depositing high-k amorphous HfOx thin films at room temperature. The plasma is generated in a remote chamber, allowing higher rate deposition of films with minimal ion damage. Compared to a conventional sputtering system, the HiTUS technique allows finer control of the thin film microstructure. Using a conventional reactive rf magnetron sputtering technique, monoclinic nanocrystalline HfOx thin films have been deposited at a rate of ∼1.6nmmin-1 at room temperature, with a resistivity of 1013Ωcm, a breakdown strength of 3.5MVcm-1 and a dielectric constant of ∼18.2. By comparison, using the HiTUS process, amorphous HfOx (x=2.1) thin films which appear to have a cubic-like short-range order have been deposited at a high deposition rate of ∼25nmmin-1 with a high resistivity of 1014Ωcm, a breakdown strength of 3MVcm-1 and a high dielectric constant of ∼30. Two key conditions must be satisfied in the HiTUS system for high-k HfOx to be produced. Firstly, the correct oxygen flow rate is required for a given sputtering rate from the metallic target. Secondly, there must be an absence of energetic oxygen ion bombardment to maintain an amorphous microstructure and a high flux of medium energy species emitted from the metallic sputtering target to induce a cubic-like short range order. This HfOx is very attractive as a dielectric material for large-area electronic applications on flexible substrates. A remote plasma sputtering process (high target utilization sputtering, HiTUS) has been used to deposit amorphous hafnium oxide with a very high dielectric constant (∼30). X-ray diffraction shows that this material has a microstructure in which the atoms have a cubic-like short-range order, whereas radio frequency (rf) magnetron sputtering produced a monoclinic polycrystalline microstructure. This is correlated to the difference in the energetics of remote plasma and rf magnetron sputtering processes. © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Cement bentonite cutoff walls for polluted sites

Cement-bentonite (CB) cutoff walls have long been used to control ground water flow and contaminant migration at polluted sites. Hydraulic conductivity and unconfined compressive strength are two short-term properties often used by industry and owners in CB specification and are important parameters discussed in this paper. For polluted sites, long-term compatibility is also an important issue. These properties are coupled to a number of external factors including the mix design, construction sequence, presence/absence of contaminants at the site. Additional short-term properties for engineering assessment include the stressstrain characteristics in both drained and undrained shear in both with and without confinement as well as one-dimensional consolidation properties. Long term CB properties are affected by aging, reaction chemistry, drying, in situ stress state, and interaction with the polluted environment. © 2013 Taylor & Francis Group.

Growth and antioxidant system of Escherichia coli in response to microcystin-RR

Microcystins are a kind of cyclic hepatoxins produced by many species of cyanobacteria. The toxic effects of microcystins on animals and plants have been well studied. However, the reports about the effects of microcystins on microbial cells are very limited. In present paper, Escherichia coli was undertaken to determine the effect of microcystin-RR. These results suggested that microcystin-RR could prolong the growth of E. coli when exposed to high concentrations of microcystin-RR and cause the accumulation of ROS and induce the oxidant stress for a short time. The antioxidant system protects E. coli from oxidative damage.