A manual of lithography; or, Memoir on the lithographical experiments made in Paris, at the Royal school of the roads and bridges ...

Publisher's advertisement: 2 p. (at end)

Sifte yeshanim : nilṿah ʻal sefer Torat lashon ʻIvrit le-vaʾer milot setumot ha-nimtsaʾot be-sifre Rashi, Radaḳ, ṿe-Rabaʻ.

Mode of access: Internet.

Handbook of lithography; a practical treatise for all who are interested in the process,

Mode of access: Internet.

Le Caire, le Nil et Memphis,

Series title also at head of t.-p.

Von Wüste, Nil und Sonne.

Mode of access: Internet.

Le Nil : Égypte et Nubie /

Mode of access: Internet.

Kto izmi︠e︡nil sot︠s︡ializmu? : bolʹshevizm i sot︠s︡īalʹnai︠a︡ demokartīi︠a︡ v Rossīi /

Mode of access: Internet.

Le nil argentin : étude économique et agricole sur les régions du sud Argentin ; Rio Negro, Neuquen, Confluencia.

Mode of access: Internet.

The art of lithography, a complete practical manual of planographic printing

Advertising matter: p. 328-348.

Der Nil : eine nach neueren Quellen bearbeitete Darstellung seiner Hydrographie und seiner wirtschaftlicher Bedeutung.

Thesis (doctoral)--Universitat Jena.

Vom Kap zum Nil : Reiseerinnerungen aus Süd-, Ost- und Nordafrika

von Dr. Karl Dove, Lehrer der kolonialen Landeskunde am Seminar für orientalische Sprachen, Privatdozent der Geographie an der Universität zu Berlin

Mask-less lithography for fabrication of optical waveguides

A flexible method for fabricating shallow optical waveguides by using femtosecond laser writing of patterns on a metal coated glass substrate followed by ion-exchange is described. This overcomes the drawbacks of low index contrast and high induced stress in waveguides directly written using low-repetition rate ultrafast laser systems. When compared to conventional lithography, the technique is simpler and has advantages in terms of flexibility in the types of structures which can be fabricated.

Mask-less lithography for fabrication of optical waveguides

A flexible method for fabricating shallow optical waveguides by using femtosecond laser writing of patterns on a metal coated glass substrate followed by ion-exchange is described. This overcomes the drawbacks of low index contrast and high induced stress in waveguides directly written using low-repetition rate ultrafast laser systems. When compared to conventional lithography, the technique is simpler and has advantages in terms of flexibility in the types of structures which can be fabricated.

Electrolytic processes on surfaces:contributions to eletrolytic polishing, anodising, adhesion, colour, lithography and electronic applications

DUE TO COPYRIGHT RESTRICTIONS ONLY AVAILABLE FOR CONSULTATION AT ASTON UNIVERSITY LIBRARY AND INFORMATION SERVICES WITH PRIOR ARRANGEMENT

Resist-substrate interface tailoring for generating high density arrays of Ge and Bi2Se3 nanowires by electron beam lithography

The authors report a chemical process to remove the native oxide on Ge and Bi2Se3 crystals, thus facilitating high-resolution electron beam lithography (EBL) on their surfaces using a hydrogen silsesquioxane (HSQ) resist. HSQ offers the highest resolution of all the commercially available EBL resists. However, aqueous HSQ developers such as NaOH and tetramethylammonium hydroxide have thus far prevented the fabrication of high-resolution structures via the direct application of HSQ to Ge and Bi2Se3, due to the solubility of components of their respective native oxides in these strong aqueous bases. Here we provide a route to the generation of ordered, high-resolution, high-density Ge and Bi2Se3 nanostructures with potential applications in microelectronics, thermoelectric, and photonics devices.