Vom Nil zum Jordan : Erinnerungen aus dem Weltkriege

Wladimir Jabotinsky

Vom Nil zum Jordan : Erinnerungen aus dem Weltkriege

Wladimir Jabotinsky

Vom Nil zum Jordan : Erinnerungen aus dem Weltkriege

Wladimir Jabotinsky

Vom Nil zum Jordan : Erinnerungen aus dem Weltkriege

Wladimir Jabotinsky

Vom Nil zum Jordan : Erinnerungen aus dem Weltkriege

Wladimir Jabotinsky

Vom Nil zum Jordan : Erinnerungen aus dem Weltkriege

Wladimir Jabotinsky

Vom Nil zum Jordan : Erinnerungen aus dem Weltkriege

Wladimir Jabotinsky

Vom Nil zum Jordan : Erinnerungen aus dem Weltkriege

Wladimir Jabotinsky

Tana - Baringo - Nil : mit Karl Peters zu Emin Pascha

von Adolf von Tiedemann

Henry M. Stanleys Forschungen am Kongo und Nil

von C. Falkenhorst

Substrate nanopatterning by e-beam lithography to growth ordered arrays of III-nitride nanodetectors, white light emitters, and solar cells

III-nitride nanorods have attracted much scientific interest during the last decade because of their unique optical and electrical properties [1,2]. The high crystal quality and the absence of extended defects make them ideal candidates for the fabrication of high efficiency opto-electronic devices such as nano-photodetectors, light-emitting diodes, and solar cells [1-3]. Nitride nanorods are commonly grown in the self-assembled mode by plasma-assisted molecular beam epitaxy (MBE) [4]. However, self-assembled nanorods are characterized by inhomogeneous heights and diameters, which render the device processing very difficult and negatively affect the electronic transport properties of the final device. For this reason, the selective area growth (SAG) mode has been proposed, where the nanorods preferentially grow with high order on pre-defined sites on a pre-patterned substrate

Microfabrication processes for microfluidic devices on a single laser Workstation: direct writing lithography on SU-8, laser ablation on polymers and mask manufacturing

We demonstrate the capability of a laser micromachining workstation for cost-effective manufacturing of a variety of microfluidic devices, including SU-8 microchannels on silicon wafers and 3D complex structures made on polyimide Kapton® or poly carbonate (PC). The workstation combines a KrF excimer laser at 248 nm and a Nd3+:YVO4 DPSS with a frequency tripled at 355 nm with a lens magnification 10X, both lasers working at a pulsed regime with nanoseconds (ns) pulse duration. Workstation also includes a high-resolution motorized XYZ-tilt axis (~ 1 um / axis) and a Through The Lens (TTL) imaging system for a high accurate positioning over a 120 x 120 mm working area. We have surveyed different fabrication techniques: direct writing lithography,mask manufacturing for contact lithography and polymer laser ablation for complex 3D devices, achieving width channels down to 13μ m on 50μ m SU-8 thickness using direct writing lithography, and width channels of 40 μm for polyimide on SiO2 plate. Finally, we have tested the use of some devices for capillary chips measuring the flow speed for liquids with different viscosities. As a result, we have characterized the presence of liquid in the channel by interferometric microscopy.