Synchrotron X-ray photoabsorption spectroscopy of plasmas

Theoretical X-ray opacities are used in numerous radiative transfer simulations of plasmas at different temperatures and densities, for example astrophysics, fusion, metrology and EUV and X-rays radiation sources. However, there are only a reduced number of laboratories working on the validation of those theoretical results empirically, in particular for high temperature plasmas (mayor que 1eV). One of those limitations comes from the use of broad band EUV- X ray sources to illuminate the plasma which, among other issues, present low reproducibility and repetition rate [1]. Synchrotron radiation facilities are a more appropriate radiation source in that sense, since they provide tunable, reproducible and high resolution photons. Only their ?low? photon intensity for these experiments has prevented researchers to use it for this purpose. However, as new synchrotron facilities improve their photon fluxes, this limitation not longer holds [2]. This work evaluates the experimental requirements to use third generation synchrotron radiation sources for the empirical measurement of opacities of plasmas, proposing a pausible experimental set-up to carry them out. Properties of the laser or discharge generated plasmas to be studied with synchrotron radiation will be discussed in terms of their maximum temperatures, densities and temporal evolution. It will be concluded that there are encouraging reasons to pursue these kind of experiments which will provide with an appropriate benchmark for theoretical opacities

No anticorrelation between cyclotron line energy and X-ray flux in 4U 0115+634

We report on an outburst of the high mass X-ray binary 4U 0115+634 with a pulse period of 3.6 s in 2008 March/April as observed with RXTE and INTEGRAL. During the outburst the neutron star’s luminosity varied by a factor of 10 in the 3–50 keV band. In agreement with earlier work we find evidence of five cyclotron resonance scattering features at ~10.7, 21.8, 35.5, 46.7, and 59.7 keV. Previous work had found an anticorrelation between the fundamental cyclotron line energy and the X-ray flux. We show that this apparent anticorrelation is probably due to the unphysical interplay of parameters of the cyclotron line with the continuum models used previously, e.g., the negative and positive exponent power law (NPEX). For this model, we show that cyclotron line modeling erroneously leads to describing part of the exponential cutoff and the continuum variability, and not the cyclotron lines. When the X-ray continuum is modeled with a simple exponentially cutoff power law modified by a Gaussian emission feature around 10 keV, the correlation between the line energy and the flux vanishes, and the line parameters remain virtually constant over the outburst. We therefore conclude that the previously reported anticorrelation is an artifact of the assumptions adopted in the modeling of the continuum.

Analysis of functional materials by X-ray photoelectron spectroscopy

X-ray photoelectron spectroscopy (XPS) can play an important role in guiding the design of new materials, tailored to meet increasingly stringent constraints on performance devices, by providing insight into their surface compositions and the fundamental interactions between the surfaces and the environment. This chapter outlines the principles and application of XPS as a versatile, chemically specific analytical tool in determining the electronic structures and (usually surface) compositions of constituent elements within diverse functional materials. Advances in detector electronics have opened the way for development of photoelectron microscopes and instruments with XPS imaging capabilities. Advances in surface science instrumentation to enable time-resolved spectroscopic measurements offer exciting opportunities to quantitatively investigate the composition, structure and dynamics of working catalyst surfaces. Attempts to study the effects of material processing in realistic environments currently involves the use of high- or ambient-pressure XPS in which samples can be exposed to reactive environments.