73 resultados para lithographic


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Students are from the Lithography Department of the New York Trade School are shown working in a lab. Black and white photograph that has some writing along the outer edge.

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This photo of the Lithographic Technical Forum shows the booth of the Lithographic Technical Foundation, Inc. The foundation was founded in 1924 to foster research and education in the lithography industry. The slogan "Research to improve lithography . . . Education to improve craft skill" can be seen at the very top of the booth. A group of people are depicted looking at the range of educational material about lithography on display. Black and white photograph.

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Several people are looking at sample prints in this photograph of the Lithographic Technical Forum. In the background the booth for the Lithographic Technical Foundation, Inc. can be seen. Black and white photograph.

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Three people are posed in front of the Lithographic Technical Foundation, Inc. booth at the Lithographic Technical Forum. The Lithographic Technical Foundation was founded in 1924 as an industry organization to promote research and education. In the 1960s the foundation changed its name to the Graphic Arts Technical Foundation and in the late 1990s merged with Printing Industry America. The organization ha a number of educational materials about lithography on display. Black and white photograph.

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Two men are pictured on either side of an LTF Sensitivity Guide at a booth at the Lithographic Technical Forum. Black and white photograph.

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A presentation at the Lithographic Technical Forum is being filmed. Notice the RCA Victor Television camera being used. Black and white photograph.

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Two men are pictured standing outside the entrance to the Lithographic Technical Forum. It is unclear whether or not the forum was held at the New York Trade School. Black and white photograph.

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In this photo two men are shown giving a presentation at the Lithographic Technical Forum. Black and white photograph.

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Mode of access: Internet.

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A phase shift proximity printing lithographic mask is designed, manufactured and tested. Its design is based on a Fresnel computer-generated hologram, employing the scalar diffraction theory. The obtained amplitude and phase distributions were mapped into discrete levels. In addition, a coding scheme using sub-cells structure was employed in order to increase the number of discrete levels, thus increasing the degree of freedom in the resulting mask. The mask is fabricated on a fused silica substrate and an amorphous hydrogenated carbon (a:C-H) thin film which act as amplitude modulation agent. The lithographic image is projected onto a resist coated silicon wafer, placed at a distance of 50 mu m behind the mask. The results show a improvement of the achieved resolution - linewidth as good as 1.5 mu m - what is impossible to obtain with traditional binary masks in proximity printing mode. Such achieved dimensions can be used in the fabrication of MEMS and MOEMS devices. These results are obtained with a UV laser but also with a small arc lamp light source exploring the partial coherence of this source. (C) 2010 Optical Society of America