Fabrication of Dense Non-Circular Nanomagnetic Device Arrays Using Self-Limiting Low-Energy Glow-Discharge Processing

We describe a low-energy glow-discharge process using reactive ion etching system that enables non-circular device patterns, such as squares or hexagons, to be formed from a precursor array of uniform circular openings in polymethyl methacrylate, PMMA, defined by electron beam lithography. This technique is of a particular interest for bit-patterned magnetic recording medium fabrication, where close packed square magnetic bits may improve its recording performance. The process and results of generating close packed square patterns by self-limiting low-energy glow-discharge are investigated. Dense magnetic arrays formed by electrochemical deposition of nickel over self-limiting formed molds are demonstrated.

Yield of metastable atoms from a rare gas discharge in a longitudinal magnetic field

Atomic beam experiments are limited by intensity. Intensity limitations are specially critical in the measurements of metastable atoms, since their relative population is several order of magnitude smaller than the beam population. This thesis provides a method for increasing the intensity of metastable argon and neon beams effusing from a hot cathode, glow discharge by use of a longitudinal magnetic field. The argon and neon metastable atom intensities have been measured for a range of discharge pressure, voltage, and current for a magnetic field strengths from 0 to 31 mT. For both argon and neon, the metastable atom beam intensity rises to a maximum value about one order of magnitude above the zero field case. A qualitative discussion of the theory of this phenomenon is also presented.