Direct femtosecond laser inscription in transparent dielectrics

Since 1996 direct femtosecond inscription in transparent dielectrics has become the subject of intensive research. This enabling technology significantly expands the technological boundaries for direct fabrication of 3D structures in a wide variety of materials. It allows modification of non-photosensitive materials, which opens the door to numerous practical applications. In this work we explored the direct femtosecond inscription of waveguides and demonstrated at least one order of magnitude enhancement in the most critical parameter - the induced contrast of the refractive index in a standard borosilicate optical glass. A record high induced refractive contrast of 2.5×10-2 is demonstrated. The waveguides fabricated possess one of the lowest losses, approaching level of Fresnel reflection losses at the glassair interface. High refractive index contrast allows the fabrication of curvilinear waveguides with low bend losses. We also demonstrated the optimisation of the inscription regimes in BK7 glass over a broad range of experimental parameters and observed a counter-intuitive increase of the induced refractive index contrast with increasing translation speed of a sample. Examples of inscription in a number of transparent dielectrics hosts using high repetition rate fs laser system (both glasses and crystals) are also presented. Sub-wavelength scale periodic inscription inside any material often demands supercritical propagation regimes, when pulse peak power is more than the critical power for selffocusing, sometimes several times higher than the critical power. For a sub-critical regime, when the pulse peak power is less than the critical power for self-focusing, we derive analytic expressions for Gaussian beam focusing in the presence of Kerr non-linearity as well as for a number of other beam shapes commonly used in experiments, including astigmatic and ring-shaped ones. In the part devoted to the fabrication of periodic structures, we report on recent development of our point-by-point method, demonstrating the shortest periodic perturbation created in the bulk of a pure fused silica sample, by using third harmonics (? =267 nm) of fundamental laser frequency (? =800 nm) and 1 kHz femtosecond laser system. To overcome the fundamental limitations of the point-by-point method we suggested and experimentally demonstrated the micro-holographic inscription method, which is based on using the combination of a diffractive optical element and standard micro-objectives. Sub-500 nm periodic structures with a much higher aspect ratio were demonstrated. From the applications point of view, we demonstrate examples of photonics devices by direct femtosecond fabrication method, including various vectorial bend-sensors fabricated in standard optical fibres, as well as a highly birefringent long-period gratings by direct modulation method. To address the intrinsic limitations of femtosecond inscription at very shallow depths we suggested the hybrid mask-less lithography method. The method is based on precision ablation of a thin metal layer deposited on the surface of the sample to create a mask. After that an ion-exchange process in the melt of Ag-containing salts allows quick and low-cost fabrication of shallow waveguides and other components of integrated optics. This approach covers the gap in direct fs inscription of shallow waveguide. Perspectives and future developments of direct femtosecond micro-fabrication are also discussed.

Advances in femtosecond micromachining and inscription of micro and nano photonic devices

This thesis has focused on three key areas of interest for femtosecond micromachining and inscription. The first area is micromachining where the work has focused on the ability to process highly repeatable, high precision machining with often extremely complex geometrical structures with little or no damage. High aspect ratio features have been demonstrated in transparent materials, metals and ceramics. Etch depth control was demonstrated especially in the work on phase mask fabrication. Practical chemical sensing and microfluidic devices were also fabricated to demonstrate the capability of the techniques developed during this work. The second area is femtosecond inscription. Here, the work has utilised the non-linear absorption mechanisms associated with femtosecond pulse-material interactions to create highly localised refractive index changes in transparent materials to create complex 3D structures. The techniques employed were then utilised in the fabrication of Phase masks and Optical Coherence Tomography (OCT) phantom calibration artefacts both of which show the potential to fill voids in the development of the fields. This especially the case for the OCT phantoms where there exists no previous artefacts of known shape, allowing for the initial specification of parameters associated with the quality of OCT machines that are being taken up across the world in industry and research. Finally the third area of focus was the combination of all of the techniques developed through work in planar samples to create a range of artefacts in optical fibres. The development of techniques and methods for compensating for the geometrical complexities associated with working with the cylindrical samples with varying refractive indices allowed for fundamental inscription parameters to be examined, structures for use as power monitors and polarisers with the optical fibres and finally the combination of femtosecond inscription and ablation techniques to create a magnetic field sensor with an optical fibre coated in Terfenol-D with directional capability. Through the development of understanding, practical techniques and equipment the work presented here demonstrates several novel pieces of research in the field of femtosecond micromachining and inscription that has provided a broad range of related fields with practical devices that were previously unavailable or that would take great cost and time to facilitate.

Point-by-point inscription of first-order fiber Bragg grating for C-band applications

The influence of the fiber geometry on the point-by-point inscription of fiber Bragg gratings using a femtosecond laser is highlighted. Fiber Bragg gratings with high spectral quality and strong first-order Bragg resonances within the C-band are achieved by optimizing the inscription process. Large birefringence (1.2×10-4) and high degree of polarizationdependent index modulation are observed in these gratings. Potential applications of these gratings in resonators are further illustrated.

Femtosecond inscription of the first order Bragg gratings in pure fused silica

The fabrication of sub-micron periodic structures beyond diffraction limit is a major motivation for the present paper. We describe the fabrication of the periodic structure of 25 mm long with a pitch size of 260 nm which is less than a third of the wavelength used. This is the smallest reported period of the periodic structure inscribed by direct point-by-point method. A prototype of the add-drop filter, which utilizes such gratings, was demonstrated in one stage fabrication process of femtosecond inscription, in the bulk fused silica.

Inscription of in-fibre photonic devices by an infrared femtosecond laser

In this work, a point by point method for the inscription of fibre Bragg gratings using a tightly focused infrared femtosecond laser is implemented for the first time. Fibre Bragg gratings are wavelength-selective, retro-reflectors which have become a key component in optical communications as well as offering great potential as a sensing tool. Standard methods of fabrication are based on UV inscription in fibre with a photosensitive core. Despite the high quality of the gratings, a number of disadvantages are associated with UV inscription, in particular, the requirements of a photosensitive fibre, the low thermal stability and the need to remove the protective coating prior to inscription. By combining the great flexibility offered by the point by point method with the advantages inherent to inscription by an infrared femtosecond laser, the previous disadvantages are overcome. The method here introduced, allows a fast inscription process at a rate of ~1mm/s, gratings of lengths between 1cm and 2cm exhibiting reflections in excess of 99%. Physical dimensions of these gratings differ significantly from those inscribed by other methods, in this case the grating is confined to a fraction of the cross section of the core, leading to strong and controllable birefringence and polarisation dependent loss. Finally, an investigation of the potential for their exploitation towards novel applications is carried out, devices such as directional bend sensors inscribed in single-mode fibre, superimposed but non-overlapping gratings, and single-mode, single-polarisation fibre lasers, were designed, fabricated and characterised based on point by point femtosecond inscription.

Point by point FBG inscription by a focused NIR femtosecond laser

Direct, point-by-point writing of fibre Bragg gratings in standard telecommunication fibre by femtosecond laser irradiation is demonstrated for the first time.

Modelling of femtosecond inscription in fused silica

We present theoretical and numerical analysis of the femtosecond processing of silica by laser beam with power below self-focusing threshold.

Femtosecond inscription of the first order Bragg gratings in pure fused silica

The fabrication of sub-micron periodic structures beyond diffraction limit is a major motivation for the present paper. We describe the fabrication of the periodic structure of 25 mm long with a pitch size of 260 nm which is less than a third of the wavelength used. This is the smallest reported period of the periodic structure inscribed by direct point-by-point method. A prototype of the add-drop filter, which utilizes such gratings, was demonstrated in one stage fabrication process of femtosecond inscription, in the bulk fused silica.

Waveguide inscription in YAG:Cr4+ crystals by femtosecond laser irradiation

We have observed a positive change or refractive index and formation of waveguides in YAG:Cr4+ crystals, exposed to a high-intensity femtosecond laser beam. The technique is potentially suitable for fabrication of waveguide lasers in crystal materials.

Direct femtosecond inscription of fiber Bragg gratings

Direct, point-by-point inscription of fiber Bragg gratings by infrared femtosecond laser is reported. Using this technique, highly reflective gratings can be rapidly inscribed in standard, untreated fiber. Thermal studies demonstrate increased thermal stability compared to the UV-inscribed gratings. © 2005 Materials Research Society.

Sub-critical regime of femtosecond inscription

We apply well known nonlinear diffraction theory governing focusing of a powerful light beam of arbitrary shape in medium with Kerr nonlinearity to the analysis of femtosecond (fs) laser processing of dielectric in sub-critical (input power less than the critical power of selffocusing) regime. Simple analytical expressions are derived for the input beam power and spatial focusing parameter (numerical aperture) that are required for achieving an inscription threshold. Application of non-Gaussian laser beams for better controlled fs inscription at higher powers is also discussed. © 2007 Optical Society of America.

Inscription of a 300-nm-period nanostructure in a pure fused silica

Very recently, using tightly-focused femtosecond near-IR pulses, periodical sub-micron structures have been recorded [1,2]. Such microfabrication utilizes the multi-photon approach, which allows the inscription inside various non-photosensitive optical materials. The combination of multi-photon excitation with the point-by-point technique offers the great potential of creating non-uniform chirped gratings by controlling the rate of femtosecond pulses or the sample translation speed.

Point-by-point inscription of 250 nm period structure in bulk fused silica by tightly focused femtosecond UV pulses

By conducting point-by-point inscription in a continuously moving slab of pure fused silica at the optimal depth (170νm depth below the surface), we have fabricated a 250nm period nanostructure with 30nJ, 300fs, 1kHz pulses from a frequency-tripled Ti:sapphire laser. This is the smallest value for the inscribed period yet reported, and has been achieved with radical improvement in the quality of the inscribed nanostructures in comparison with previous reports.

Nonlinear diffraction in sub-critical femtosecond inscription

Material processing using high-intensity femtosecond (fs) laser pulses is a fast developing technology holding potential for direct writing of multi-dimensional optical structures in transparent media. In this work we re-examine nonlinear diffraction theory in context of fs laser processing of silica in sub-critical (input power less than the critical power of self-focusing) regime. We have applied well known theory, developed by Vlasov, Petrishev and Talanov, that gives analytical description of the evolution of a root-mean-square beam (not necessarily Gaussian) width RRMS(z) in medium with the Kerr nonlinearity.