Inscription of a 300-nm-period nanostructure in a pure fused silica

Very recently, using tightly-focused femtosecond near-IR pulses, periodical sub-micron structures have been recorded [1,2]. Such microfabrication utilizes the multi-photon approach, which allows the inscription inside various non-photosensitive optical materials. The combination of multi-photon excitation with the point-by-point technique offers the great potential of creating non-uniform chirped gratings by controlling the rate of femtosecond pulses or the sample translation speed.

Inscription of a 300-nm-period nanostructure in a pure fused silica

Very recently, using tightly-focused femtosecond near-IR pulses, periodical sub-micron structures have been recorded [1,2]. Such microfabrication utilizes the multi-photon approach, which allows the inscription inside various non-photosensitive optical materials. The combination of multi-photon excitation with the point-by-point technique offers the great potential of creating non-uniform chirped gratings by controlling the rate of femtosecond pulses or the sample translation speed.