UV femtosecond laser inscribes a 300 nm period nanostructure in a pure fused silica

We report on the first recording of a periodic structure of ∼150 nm pitch in a permanently moving sample of a pure fused silica using the tightly focused, 82 nJ, 267 nm, 300 fs, 1 kHz laser pulses. © 2007 IOP Publishing Ltd.

Inscription of a 300-nm-period nanostructure in a pure fused silica

Very recently, using tightly-focused femtosecond near-IR pulses, periodical sub-micron structures have been recorded [1,2]. Such microfabrication utilizes the multi-photon approach, which allows the inscription inside various non-photosensitive optical materials. The combination of multi-photon excitation with the point-by-point technique offers the great potential of creating non-uniform chirped gratings by controlling the rate of femtosecond pulses or the sample translation speed.

UV femtosecond laser inscribes a 300 nm period nanostructure in a pure fused silica

We report on the first recording of a periodic structure of ~150 nm pitch in a permanently moving sample of a pure fused silica using the tightly focused, 82 nJ, 267 nm, 300 fs, 1 kHz laser pulses.

Inscription of a 300-nm-period nanostructure in a pure fused silica

Very recently, using tightly-focused femtosecond near-IR pulses, periodical sub-micron structures have been recorded [1,2]. Such microfabrication utilizes the multi-photon approach, which allows the inscription inside various non-photosensitive optical materials. The combination of multi-photon excitation with the point-by-point technique offers the great potential of creating non-uniform chirped gratings by controlling the rate of femtosecond pulses or the sample translation speed.

Fabrication of 300-nm-period nanostructure in a bulk fused silica

We report on the first recording of a 300-nm-period structure in a permanently moving sample of a pure fused silica using the tightly-focused, 82 nJ, 267 nm, 300 fs, 1 kHz laser pulses.

Influence of processing and clay type on nanostructure and stability of polypropylene-clay nanocomposites

Melt processing is a critical step in the manufacture of polymer articles and is even more critical when dealing with inhomogeneous polymer-clay nanocomposites systems. The chemical composition, and in particular the clay type and its organic modification, also plays a major contribution in determining the final properties and in particular the thermal and long-term oxidative stability of the resulting polymer nanocomposites. Proper selection and tuning of the process variable should, in principle, lead to improved characteristics of the fabricated product. With multiphase systems containing inorganic nanoclays, however, this is not straightforward and it is often the case that the process conditions are chosen initially to improve one or more desired properties at the expense of others. This study assesses the influence of organo-modified clays and the processing parameters (extrusion temperature and screw speed) on the rheological and morphological characteristics of polymer nanocomposites as well as on their melt and thermo-oxidative stability. Nanocomposites (PPNCs) based on PP, maleated PP and organically modified clays were prepared in different co-rotating twin-screw extruders ranging from laboratory scale to semi-industrial scale. Results show that the amount of surfactant present in similar organo-modified clays affects differently the thermo-oxidative stability of the extruded PPNCs and that changes in processing conditions affect the clay morphology too. By choosing an appropriate set of tuned process variables for the extrusion process it would be feasible to selectively fabricate polymer-clay nanocomposites, with the desired mechanical and thermo-oxidative characteristics. © 2013 Elsevier Ltd. All rights reserved.

Point-by-point inscription of 250 nm period structure in bulk fused silica by tightly focused femtosecond UV pulses

By conducting point-by-point inscription in a continuously moving slab of pure fused silica at the optimal depth (170νm depth below the surface), we have fabricated a 250nm period nanostructure with 30nJ, 300fs, 1kHz pulses from a frequency-tripled Ti:sapphire laser. This is the smallest value for the inscribed period yet reported, and has been achieved with radical improvement in the quality of the inscribed nanostructures in comparison with previous reports.

Point-by-point inscription of 250-nm-period structure in bulk fused silica by tightly-focused femtosecond UV pulses: experiment and numerical modeling

By conducting point-by-point inscription in a continuously moving slab of a pure fused silica at the optimal depth (170 μm depth below the surface), we have fabricated a 250-nm-period nanostructure with 30 nJ, 300 fs, 1 kHz pulses from frequency-tripled Ti:sapphire laser. This is the smallest value for the inscribed period yet reported, and has been achieved with radical improvement in the quality of the inscribed nanostructures in comparison with previous reports. The performed numerical modeling confirms the obtained experimental results.

Electrocatalytic regeneration of atmospherically aged MoS2 nanostructures via solution-phase sulfidation

The performance of MoS2 as a hydrogen evolution catalyst is diminished by exposure to air. We demonstrate a solution phase technique to resulfidate MoSxO2-x using Na2S2O3. The success of the method was judged by performance as a H+ reduction catalyst. Following sulfidation samples displayed a favourable decrease in both onset potential and Tafel slope, with the best decreasing from -0.23 V to -0.18 V (vs. SHE), and 282 mV dec-1 to 87 mV dec-1 respectively. Ageing studies indicate that this method may be used to recycle the MoS2 repeatedly without losing catalytic performance, although repeated sulfidation did result in homogenisation of the nanostructure.