2 resultados para Minimum presence threshold
em Aston University Research Archive
Resumo:
The growth and advances made in computer technology have led to the present interest in picture processing techniques. When considering image data compression the tendency is towards trans-form source coding of the image data. This method of source coding has reached a stage where very high reductions in the number of bits representing the data can be made while still preserving image fidelity. The point has thus been reached where channel errors need to be considered, as these will be inherent in any image comnunication system. The thesis first describes general source coding of images with the emphasis almost totally on transform coding. The transform technique adopted is the Discrete Cosine Transform (DCT) which becomes common to both transform coders. Hereafter the techniques of source coding differ substantially i.e. one technique involves zonal coding, the other involves threshold coding. Having outlined the theory and methods of implementation of the two source coders, their performances are then assessed first in the absence, and then in the presence, of channel errors. These tests provide a foundation on which to base methods of protection against channel errors. Six different protection schemes are then proposed. Results obtained, from each particular, combined, source and channel error protection scheme, which are described in full are then presented. Comparisons are made between each scheme and indicate the best one to use given a particular channel error rate.
Resumo:
Threshold stress intensity values, ranging from ∼6 to 16 MN m −3/2 can be obtained in powder-formed Nimonic AP1 by changing the microstructure. The threshold and low crack growth rate behaviour at room temperature of a number of widely differing API microstructures, with both ‘necklace’ and fully recrystallized grain structures of various sizes and uniform and bimodal γ′-distributions, have been investigated. The results indicate that grain size is an important microstructural parameter which can control threshold behaviour, with the value of threshold stress intensity increasing with increasing grain size, but that the γ′-distribution is also important. In this Ni-base alloy, as in many others, near threshold fatigue crack growth occurs in a crystallographic manner along {111} planes. This is due to the development of a dislocation structure involving persistent slip bands on {111} planes in the plastic zone, caused by the presence of ordered shearable precipitates in the microstructure. However, as the stress intensity range is increased, a striated growth mode takes over. The results presented show that this transition from faceted to striated growth is associated with a sudden increase in crack propagation rate and occurs when the size of the reverse plastic zone at the crack tip becomes equal to the grain size, independent of any other microstructural variables.