Size-dependent radiation tolerance in ion irradiated TiN/AlN nanolayer films

Interface effects on ion-irradiation tolerance properties are investigated in nanolayered TiN/AlN films with individual layer thickness varied from 5 nm to 50 nm, prepared by pulsed laser deposition. Evolution of the microstructure and hardness of the multilayer films are examined on the specimens before and after He ion-implantation to a fluence of 4 × 10 m at 50 keV. The suppression of amorphization in AlN layers and the reduction of radiation-induced softening are observed in all nanolayer films. A clear size-dependent radiation tolerance characteristic is observed in the nanolayer films, i.e., the samples with the optimum layer thickness from 10 nm to 20 nm show the best ion irradiation tolerance properties, and a critical layer thickness of more than 5 nm is necessary to prevent severe intermixing. This study suggests that both the interface characteristics and the critical length scale (layer thickness) contribute to the reduction of the radiation-induced damages in nitride-based ceramic materials. © 2013 Elsevier B.V. All rights reserved.

Ion irradiation effects in nanocrystalline TiN coatings

Nitride materials and coatings have attracted extensive research interests for various applications in advanced nuclear reactors due to their unique combination of physical properties, including high temperature stability, excellent corrosion resistance, superior mechanical property and good thermal conductivity. In this paper, the ion irradiation effects in nanocrystalline TiN coatings as a function of grain size are reported. TiN thin films (thickness of 100 nm) with various grain sizes (8-100 nm) were prepared on Si substrates by a pulsed laser deposition technique. All the samples were irradiated with He ions to high fluences at room temperature. Transmission electron microscopy (TEM) and high resolution TEM on the ion-irradiated samples show that damage accumulation in the TiN films reduces as the grain size reduces. Electrical resistivity of the ion-irradiated films increases slightly compared with the as-deposited ones. These observations demonstrate a good radiation-tolerance property of nanocrystalline TiN films. © 2007 Elsevier B.V. All rights reserved.

Comparative numerical study of energy deposition in femtosecond laser microfabrication with fundamental and second harmonics of Yb-doped laser

We present the results of comparative numerical study of femtosecond laser inscription for fundamental and second harmonic of Yb-doped laser. We have found that second harmonic is more efficient in terms of amount of absorbed energy which leads to lower inscription threshold. Hence this regime is more attractive for applications in femtosecond laser microfabrication. We observed the different size of modified domain on initial pulse energy and different spectrum dynamics during the pulse propagation for fundamental and second harmonics.

Efficiency of energy deposition by fundamental and second harmonics in femtosecond laser inscription

We present the results of numerical modelling of energy deposition in single-shot femtosecond laser inscription for fundamental and second harmonics, which shows that second harmonic is more efficient considering the amount of absorbed energy

Comparative numerical study of efficiency of energy deposition in femtosecond microfabrication with fundamental and second harmonics of Yb-doped fiber laser

We present the results of comparative numerical study of energy deposition in single shot femtosecond laser inscription for fundamental and second harmonic of Yb-doped fiber laser. We have found that second harmonic is more efficient in absorbing energy which leads to lower inscription threshold. Hence this regime is more attractive for applications in femtosecond laser microfabrication.

Comparative numerical study of efficiency of energy deposition in femtosecond microfabrication with fundamental and second harmonics of Yb-doped fiber laser

We present the results of comparative numerical study of energy deposition in single shot femtosecond laser inscription for fundamental and second harmonic of Yb-doped fiber laser. We have found that second harmonic is more efficient in absorbing energy which leads to lower inscription threshold. Hence this regime is more attractive for applications in femtosecond laser microfabrication.

Efficiency of energy deposition by fundamental and second harmonics in femtosecond laser inscription

We present the results of numerical modelling of energy deposition in single-shot femtosecond laser inscription for fundamental and second harmonics, which shows that second harmonic is more efficient considering the amount of absorbed energy

Cascaded nonlinear absorption of femtosecond laser pulses in dielectrics

We investigated the energy deposition process leading to the waveguide inscription in transparent dielectrics both experimentally and theoretically. Parameters of multiphoton absorption process and inscription thresholds were measured in a range of materials including YAG, ZnSe, RbPb2Cl5 crystals, and in fused silica and BK7 glasses.

Analysis of femtosecond laser surface patterning on bulk single-crystalline diamond

Preliminary work is reported on 2-D and 3-D microstructures written directly with a Yb:YAG 1026 nm femtosecond (fs) laser on bulk chemical vapour deposition (CVD) single-crystalline diamond. Smooth graphitic lines and other structures were written on the surface of a CVD diamond sample with a thickness of 0.7mm under low laser fluences. This capability opens up the opportunity for making electronic devices and micro-electromechanical structures on diamond substrates. The fabrication process was optimised through testing a range of laser energies at a 100 kHz repetition rate with sub-500fs pulses. These graphitic lines and structures have been characterised using optical microscopy, Raman spectroscopy, X-ray photoelectron spectroscopy and atomic force microscopy. Using these analysis techniques, the formation of sp2 and sp3 bonds is explored and the ratio between sp2 and sp3 bonds after fs laser patterning is quantified. We present the early findings from this study and characterise the relationship between the graphitic line formation and the different fs laser exposure conditions. © 2012 Taylor & Francis.