Different Early Post-Settlement Strategies Between American Lobsters Homarus Americanus and Rock Crabs Cancer Irroratus in the Gulf of Maine

The abundance of many invertebrates with planktonic larval stages can be determined shortly after they reach the benthos. In this study, we quantified patterns of abundance and habitat utilization of early benthic phases of the American lobster Homarus americanus and the rock crab Cancer irroratus. These 2 decapods are among the most common and abundant macroinvertebrates in coastal zones of the Gulf of Maine, with similar densities of larger individuals. Settlement and early postsettlement survival indicate that lobsters are highly substrate-specific early in life, settling predominantly in cobble beds. Crabs appear to be less selective, setting both in cobble and sand. Cumulative settlement of crabs, inferred from weekly censuses over the summer, was an order of magnitude greater than that of lobsters over the same time period. However, only crabs showed significant postsettlement losses. Although the identity of specific predators is unknown, predator exclusion experiments and placement of vacant uninhabited nursery habitat suggested that post-settlement mortality rather than emigration was responsible for these losses. The selective habitat-seeking behavior and lower post-settlement mortality of lobsters is consistent with their lower fecundity and later onset of reproductive maturity. The patterns observed for crabs, however, suggest a different strategy which is more in accordance with their higher fecundity and earlier onset of maturity. It is possible that lower fecundity but greater per-egg investment, along with strict habitat selection at settlement and lower post-settlement mortality, allows adult lobster populations to equal adult populations of crabs. This occurs despite crabs being more fecund and less habitat-selective settlers but sustaining higher postsettlement mortality.

Characterization of HFO2 Capacitors

Hafnium oxide (HfOn) is a promising dielectric for future microelectronic applications. Hf02 thin films (10-75nm) were deposited on Pt/Si02/Si substrates by pulsed DC magnetron reactive sputtering. Top electrodes of Pt were formed by e-beam evapo- ration through an aperture mask on the samples to create MIM (Metal-Insulator-Metal) capacitors. Various processing conditions (Arloz ratio, DC power and deposition rate) and post-deposition annealing conditions (time and temperature) were investigated. The structure of the Hf02 films was characterized by X-ray diffraction (XRD) and the roughness was measured by a profilometer. The electrical properties were characterized in terms of their relative permittivity (E,(T) and ~,.(f)) and leakage behavior (I-V, I-T and I- time). The electrical measurements were performed over a temperature range from -5 to 200°C. For the samples with best experimental results, the relative permittivity of HfOa was found to be -- 27 after anneal and increased by 0.027%/"C with increasing temperature over the measured temperature range. At 25"C, leakage current density was below lop8 ~ l c m ' at 1 volt. The leakage current increased with temperature above a specific threshold temperature below which the leakage current didn't change much. The leakage current increased with voltage. At voltages below lvolt, it's ohmic; at higher voltages, it follows Schottky model. The breakdown field is - 1 . 8 2 ~ lo6 Vlcm. The optical bandgap was measured with samples deposited on quartz substrates to be 5.4eV after anneal.