3 resultados para Impurity Concentration
em ArchiMeD - Elektronische Publikationen der Universität Mainz - Alemanha
Resumo:
In order to reduce the costs of crystalline silicon solar cells, low-cost silicon materials like upgraded metallurgical grade (UMG) silicon are investigated for the application in the photovoltaic (PV) industry. Conventional high-purity silicon is made by cost-intensive methods, based on the so-called Siemens process, which uses the reaction to form chlorosilanes and subsequent several distillation steps before the deposition of high-purity silicon on slim high-purity silicon rods. UMG silicon in contrast is gained from metallurgical silicon by a rather inexpensive physicochemical purification (e.g., acid leaching and/or segregation). However, this type of silicon usually contains much higher concentrations of impurities, especially 3d transition metals like Ti, Fe, and Cu. These metals are extremely detrimental in the electrically active part of silicon solar cells, as they form recombination centers for charge carriers in the silicon band gap. This is why simple purification techniques like gettering, which can be applied between or during solar cell process steps, will play an important role for such low-cost silicon materials. Gettering in general describes a process, whereby impurities are moved to a place or turned into a state, where they are less detrimental to the solar cell. Hydrogen chloride (HCl) gas gettering in particular is a promising simple and cheap gettering technique, which is based on the reaction of HCl gas with transition metals to form volatile metal chloride species at high temperatures.rnThe aim of this thesis was to find the optimum process parameters for HCl gas gettering of 3d transition metals in low-cost silicon to improve the cell efficiency of solar cells for two different cell concepts, the standard wafer cell concept and the epitaxial wafer equivalent (EpiWE) cell concept. Whereas the former is based on a wafer which is the electrically active part of the solar cell, the latter uses an electrically inactive low-cost silicon substrate with an active layer of epitaxially grown silicon on top. Low-cost silicon materials with different impurity grades were used for HCl gas gettering experiments with the variation of process parameters like the temperature, the gettering time, and the HCl gas concentration. Subsequently, the multicrystalline silicon neighboring wafers with and without gettering were compared by element analysis techniques like neutron activation analysis (NAA). It was demonstrated that HCl gas gettering is an effective purification technique for silicon wafers, which is able to reduce some 3d transition metal concentrations by over 90%. Solar cells were processed for both concepts which could demonstrate a significant increase of the solar cell efficiency by HCl gas gettering. The efficiency of EpiWE cells could be increased by HCl gas gettering by approximately 25% relative to cells without gettering. First process simulations were performed based on a simple model for HCl gas gettering processes, which could be used to make qualitative predictions.
Resumo:
The world's rising demand of energy turns the development of sustainable and more efficient technologies for energy production and storage into an inevitable task. Thermoelectric generators, composed of pairs of n-type and p-type semiconducting materials, di¬rectly transform waste heat into useful electricity. The efficiency of a thermoelectric mate¬rial depends on its electronic and lattice properties, summarized in its figure of merit ZT. Desirable are high electrical conductivity and Seebeck coefficients, and low thermal con¬ductivity. Half-Heusler materials are very promising candidates for thermoelectric applications in the medium¬ temperature range such as in industrial and automotive waste heat recovery. The advantage of Heusler compounds are excellent electronic properties and high thermal and mechanical stability, as well as their low toxicity and elemental abundance. Thus, the main obstacle to further enhance their thermoelectric performance is their relatively high thermal conductivity.rn rnIn this work, the thermoelectric properties of the p-type material (Ti/Zr/Hf)CoSb1-xSnx were optimized in a multistep process. The concept of an intrinsic phase separation has recently become a focus of research in the compatible n-type (Ti/Zr/Hf)NiSn system to achieve low thermal conductivities and boost the TE performance. This concept is successfully transferred to the TiCoSb system. The phase separation approach can form a significant alternative to the previous nanostructuring approach via ball milling and hot pressing, saving pro¬cessing time, energy consumption and increasing the thermoelectric efficiency. A fundamental concept to tune the performance of thermoelectric materials is charge carrier concentration optimization. The optimum carrier concentration is reached with a substitution level for Sn of x = 0.15, enhancing the ZT about 40% compared to previous state-of-the-art samples with x = 0.2. The TE performance can be enhanced further by a fine-tuning of the Ti-to-Hf ratio. A correlation of the microstructure and the thermoelectric properties is observed and a record figure of merit ZT = 1.2 at 710°C was reached with the composition Ti0.25Hf0.75CoSb0.85Sn0.15.rnTowards application, the long term stability of the material under actual conditions of operation are an important issue. The impact of such a heat treatment on the structural and thermoelectric properties is investigated. Particularly, the best and most reliable performance is achieved in Ti0.5Hf0.5CoSb0.85Sn0.15, which reached a maximum ZT of 1.1 at 700°C. The intrinsic phase separation and resulting microstructure is stable even after 500 heating and cooling cycles.
Resumo:
Gefüllte Skutterudite mit der Summenformel MxCo4Sb12 sind vielversprechende thermoelektrische Materialien. Die Standardsynthese führt jedoch oft zur Bildung von MSbx, Sb, CoSb oder CoSb2 als Nebenphasen. In dieser Arbeit wird eine neue zweistufige Synthese vorgestellt, bei der die Bildung des Kieftits (CoSb3) getrennt von dem topotaktischen Füllen mit dem Metallatom M erfolgt. Dieser Ansatz erlaubt eine Durchführung der Reaktion bei niedrigeren Temperaturen mit kürzeren Reaktionszeiten. Ein geringer Antimon-Unterschuss im so erhaltenen Kieftit erhöht die Anzahl der Ladungsträger und unterdrückt die Bildung von Verunreinigungsphasen. Zunächst wurden Skutteruditproben mit der nominellen Zusammensetzung InxCo4Sb12 mit x = 0,12; 0,15; 0,18 und 0,20 in hoher Reinheit hergestellt und mit Spark Plasma Sintering (SPS) kompaktiert. Messaufnahmen mit Potential- und Seebeck-Mikrosonde und Rasterelektronenmikroskop zeigten eine hohe Probenhomogenität. Produkte waren nahezu phasenrein, was eine Untersuchung der Transporteigenschaften ohne Verfälschung durch Nebenphasen ermöglichte. Die quantitative Phasenanalyse mittels Synchrotron-Beugungsdaten zeigte < 0,1 % InSb bei In0,18Co4Sb12 und In0,20Co4Sb12, sowie eine lineare Korrelation zwischen dem wahren Füllgrad und der Gitterkonstante. Die Bindung von < 0,1 % InSb verringerte den Füllgrad der nominellen In0,20Co4Sb12-Probe auf x = 0,144. Die nominelle In0,18Co4Sb12-Probe mit dem wahren Gehalt x = 0,160 hatte den höchsten zT-Wert nahe eins bei 420 °C. Es konnte anschließend die Anwendbarkeit der Synthesemethode für Barium- und mehrfach gefüllte (Na+In) Skutterudite gezeigt werden. Die Na-gefüllte Probe war gegenüber der thermischen Behandlung in der SPS oder der Charakterisierung instabil. Alle Verbindungen wurden gesintert und ihre Transporteigenschaften wurden charakterisiert. Des weiterem wurde der Einfluss der Konzentration der Korngrenzen bei den Mischungen von zu Nanomaßstab vermahlenem In0,18Co4Sb12 (Partikelgrößen zwischen 20 und 100 nm) mit dem ursprünglichen Bulk untersucht. Proben mit verschiedenen Anteilen von Nanopulver wurden gesintert, ihre thermoelektrischen und strukturellen Eigenschaften wurden untersucht. Die Gütezahl zT von 1,39 bei 375 °C wurde bei der Probe mit gleichen Anteilen des Nano- und des unbehandelten Pulvers erreicht. Die Komposite mit Anteilen <10 % oder >75 % des Nanopulvers zeigten keine Verbesserung gegenüber der unbehandelten Verbindung.rn