Applications of SCET to the pair production of supersymmetric particles at hadron colliders

In this thesis we investigate the phenomenology of supersymmetric particles at hadron colliders beyond next-to-leading order (NLO) in perturbation theory. We discuss the foundations of Soft-Collinear Effective Theory (SCET) and, in particular, we explicitly construct the SCET Lagrangian for QCD. As an example, we discuss factorization and resummation for the Drell-Yan process in SCET. We use techniques from SCET to improve existing calculations of the production cross sections for slepton-pair production and top-squark-pair production at hadron colliders. As a first application, we implement soft-gluon resummation at next-to-next-to-next-to-leading logarithmic order (NNNLL) for slepton-pair production in the minimal supersymmetric extension of the Standard Model (MSSM). This approach resums large logarithmic corrections arising from the dynamical enhancement of the partonic threshold region caused by steeply falling parton luminosities. We evaluate the resummed invariant-mass distribution and total cross section for slepton-pair production at the Tevatron and LHC and we match these results, in the threshold region, onto NLO fixed-order calculations. As a second application we present the most precise predictions available for top-squark-pair production total cross sections at the LHC. These results are based on approximate NNLO formulas in fixed-order perturbation theory, which completely determine the coefficients multiplying the singular plus distributions. The analysis of the threshold region is carried out in pair invariant mass (PIM) kinematics and in single-particle inclusive (1PI) kinematics. We then match our results in the threshold region onto the exact fixed-order NLO results and perform a detailed numerical analysis of the total cross section.

Non-aqueous dispersions of particles and their applications

In the current work, three studies about non-aqueous dispersions of particles were carried out by using an amphiphilic block copolymer poly(isoprene)-block-poly(methyl methacrylate) (PI-b-PMMA) as stabilizer:rn1. Dispersions of polyurethane and polyurea porous particles for polymer compositesrn2. Dispersions of PMMA and PU particles with PDI dye for study of Single Molecule Spectroscopy Detectionrn3. Dispersions of graphene nanosheets for polymer compositesrnrnIn the first study, highly porous polyurethane and polyurea particles were prepared in a non-aqueous emulsion. The preparation of porous particles consisted of two parts: At first, a system was developed where the emulsion had high stability for the polymerization among diisocyanate, diol and water. In the second part, porous particles were prepared by using two methods fission/fusion and combination by which highly porous particles were obtained. In this study, the applications of porous particles were also investigated where polyurethane particles were tested as filling material for polymer composites and as catalyst carrier for polyethylene polymerization. rnrnIn the second study, PMMA and PU particles from one non-aqueous emulsion were investigated via single molecule fluorescence detection. At first the particles were loaded with PDI dye, which were detected by fluorescence microscopy. The distribution and orientation of the PDI molecules in the particles were successfully observed by Single Molecule Fluorescence Detection. The molecules were homogenously distributed inside of the particles. In addition they had random orientation, meaning that no aggregations of dye molecules were formed. With the results, it could be supposed that the polymer chains were also homogenously distributed in the particles, and that the conformation was relatively flexible. rnrnIn the third part of the study, graphene nanosheets with high surface area were dispersed in an organic solvent with low boiling point and low toxicity, THF, stabilized with a block copolymer PI-b-PMMA. The dispersion was used to prepare polymer composites. It was shown that the modified graphene nanosheets had good compatibility with the PS and PMMA matrices. rn