3 resultados para deep processing

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A semi solid thin strip continuous casting process was used to obtain 50%wt Pb/50%wtSn strip by single and twin roll processing at speed of 15 m/min. A 50%wt Pb/50%wtSn plate ingot was also cast for rolling conventionally into strips of 1.4 mm thickness and 45 mm width for comparison with those achieved non-conventionally. This hypoeutectic alloy has a solidification interval and fusion temperature of approximately 31 degrees C and 215 degrees C respectively. The casting alloy temperature was around 280 degrees C as measured by a type K immersion thermocouple prior to pouring into a tundish designed to maintain a constant melt flow on the cooling slope during semi solid material production. A nozzle with a weir ensures that the semi solid material is dragged smoothly by the lower roll, producing strip with minimum contamination of slag/oxide. The temperatures of the cooling slope and the lower roll were also monitored using K type thermocouples. The coiled semi solid strip, which has a thickness of 1.5 mm and 45 mm width, was rolled conventionally in order to obtain 1.2 mm thick strip. The coiled thixorolled strip had a thickness of 1.2 mm and achieved practically the same width as the conventional strips. Blanks of 40 mm diameter were cut from the strips in a mechanical press, ready for deep drawing and ironing for mechanical characterization. All the strips achieved from non-conventional processing had the same mechanical performance as those achieved conventionally. The limiting drawing ratio (LDR) achieved was approximately 2.0 for all strips. Microscopy examination was made in order to observe phase segregation during processing.

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Plasma immersion ion implantation (PIII) process is a three dimensional surface modification method that is quite mature and well known to the surface engineering community nowadays, especially to those working in the field of plasma-materials interaction, aiming at both industrial and academic applications. More recently, deposition methods have been added to PIII, the PIII&D, opening possibilities of broader range of applications of these techniques. So, PIII&D is becoming a routine method of surface modification, with the advantage of pushing up the retained dose levels limited by the sputtering due to ion implantation. Therefore, well adherent, thick, three-dimensional films without stress are possible to be achieved, at relatively low cost, using PIII&D. In this paper, we will discuss about a few PIII and PIII&D experiments that have been performed recently to achieve surface improvements in different materials: 1 - high temperature nitrogen PIII in Ti6Al4V alloy in which a deep nitrogen rich treated layer resulted in surface improvements as increase of hardness, corrosion resistance and resistance to wear of the Ti alloy; 2 - nanostructures in ZnO films, obtained by PIII&D of vaporized & ionized Zn source; 3 - combined implantation and deposition of calcium for biomaterial activity of Ti alloy (PIII&D), allowing the growth of hydroxyapatite in a body solution; 4 - magnetron sputtering deposition of Cr that was enhanced by the glow discharge Ar plasma to allow implantation and deposition of Cr on SAE 1070 steel (PIII&D) resulting in surfaces with high resistance to corrosion; and 5 - implantation of nitrogen by ordinary PIII into this Cr film, which improved resistance to corrosion, while keeping the tribological properties as good as for the SAE 1070 steel surface. © 2012 Elsevier B.V.

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Pós-graduação em Engenharia Mecânica - FEG