Relief grating induced by photo-expansion in Ga-Ge-S and Ga-Ge-As-S glasses

We report the fabrication of relief diffraction gratings recorded on a surface of photosensitive Ga10Ge25S65 and Ga5Ge25As5S65 glasses by means of interference of two UV laser beams at 351 nm. The diffraction efficiency (eta) of first diffraction order was measured. Atomic-force-microscope (AFM) was used to perform a 3D imaging analysis of the sample surface topography that shows the superposition of an imprinted grating over the topography of the glass. The change in the absorption edge and the refractive index has been evaluated and a structural approach of the relief grating on the glass surface has been discussed.

Analysis of the topography of a Bragg grating in chalcogenide glass

Relief Bragg gratings were recorded on the surface of Ga-Ge-S glass samples by interference of two UV laser beams at 351 nm, Scanning force microscopy was used to perform a 3D image analysis of the resulting surface topography, which shows the superposition of an imprinted grating over the base topography of the glass. An important question regarding the efficiency of the grating is to determine to what extent the base topography reduces the intended coherent scattering of the grating because of its stochastic character. To answer this question we separated both base and grating structures by Fourier filtering, examined both spatial frequency and roughness, and determined the correlation. (C) 2001 Elsevier B.V. B.V. All rights reserved.