Propriedades químicas e ópticas de filmes de carbono amorfo halogenados produzidos por deposição a vapor químico assistido por plasma (PECVD) e deposição e implantação iônica por imersão em plasma (DIIIP)

Pós-graduação em Ciência e Tecnologia de Materiais - FC

Estudo de implantes de Ticp com superfícies modificadas por feixe de laser com e sem deposição química de apatitas: análises topográfica, biomecânica e histométrica em coelhos

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)

Influência da deposição de filmes de carbono tipo diamante na infiltração bacteriana pela interface entre implantes e pilares protéticos

Pós-graduação em Odontologia Restauradora - ICT

Análise da deposição de filmes finos semicondutores de GaN e GaN e Ga1-xMnxN preparados por sputtering reativo

Thin films of Ga1-xMnxN have great interest in its potential for control of electron spin (spintronics), in most cases this material is synthesized by techniques that have a high degree of control the deposition parameters, such as molecular beam epitaxy (MBE) and deposition of metalorganic chemical vapor deposition (MOCVD). The sputtering technique is an alternative route to produce such materials. Here we study the film deposition Ga1-xMnxN by reactive sputtering technique and apply enhancements such as a glove box, a residual gas analyzer and temperature control system, in order to growth films epitaxially using an analysis of the preconditions of films analyzed by spectroscopic techniques and microscopic. These procedures helped to improve the technique of deposition by cleaning substrates in an inert environment, and by the analysis of trace gases and heating the substrate holder as explained in the literature. Through the applications and comparisons it can be pointed out that the technique has the advantage of its simplicity and relatively low cost compared to MBE and MOCVD, but produces polycrystalline material

Efetividade de corte das pontas do sistema CVDentUS: estudo in vitro

Pós-graduação em Odontologia - FOAR

Efeito da implantação iônica por imersão em plasmas sobre a bioatividade de titânio

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Efeito da aplicação de filmes de carbono tipo diamante por plasma no destorque de pilares de implantes com conexões cônicas internas

Pós-graduação em Odontologia Restauradora - ICT

Propriedades estruturais e ópticas de filmes finos a-C:H:CI obtidos por deposição à vapor químico assistido por plasma e deposição e implantação iônica por imersão em plasma

Pós-graduação em Ciência e Tecnologia de Materiais - FC

Adesão bacteriana em braquetes metálicos com tratamento de superfície: estudo in vitro

Pós-graduação em Engenharia Mecânica - FEG

Redução do medo durante o tratamento odontológico utilizando pontas ultrassônicas

Over the last few years, new technologies have been developed to making cavity preparations, among which the diamond burs CVDentus® (CVDentus, São José dos Campos, Brazil) are outstanding. These points are produced by chemical deposition from the vapor phase, forming a single diamond stone, with greater durability than the conventional diamond burs. Coupled to the ultrasound appliance, they have several clinical applications in Dentistry with advantages over conventional rotary instruments, such as lower pressure, noise, vibration and heat, as well as reducing the need to use local anesthesia, contributing to minimize patient’s fear and anxiety. The aim of this study was to present the complete restorative dental treatment performed with this system in a child patient with a prior history of non-cooperative behavior. The use of this new technology offered the patient greater comfort, making it possible recondition the patient’s attitude to dental treatment, in addition to favoring conservative cavity preparations to be made.

Estudo in vitro de braquetes ortodônticos: avaliação biomecânica e liberação de íons

Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)

Influência do tratamento de superfície na força friccional de fios ortodônticos de NiTi-estudo in vitro

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)

Petrologia aplicada da formação Corumbataí (região de Rio Claro - SP) e produtos cerâmicos

Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)

Deposition of bodily chemical components in the carcass of tilapia (oreochromis sp.) strains

The knowledge of how animals deposited chemical components as water, protein, fat and ash in the carcass is importance for the formulation of a balanced diet, allowing maximum performance with a low environmental impact. So, the study was carried out to evaluate the influence of different tilapia strains (Chitralada, Commercial, Red and Universidade Federal de Lavras [UFLA]) on the deposition of bodily chemical components in the carcass. The bodily components analyzed were water, protein, fat and ash. For the determination of the bodily chemical deposition curves by age, the exponential, Brody, logistic, Gompertz and von Bertalanffy models were adjusted. The Commercial and UFLA strains deposited water at a faster speed (P<0.05) compared with the remaining strains. As for protein, the Red strain had a lower estimated maturity weight (49.37 g), and was more precocious (202 days) with regard to maximum deposition in comparison to the other strains (Chitralada, UFLA and Commercial) in which there was an estimated maturity weight of 231.5 g and maximum depositionfor 337 days. There were no differences (P>0.05) for the logistic model parameter between Red, UFLA and Commercial strains for fat, which presented a maximum fat deposition (0.23 g) at 310 days of age. Regarding ash deposition, the Commercial strain presented a higher maximum deposition (0.10 g) at 337 days, occurring later than the other strains that presented maximum deposition (0.033g) at 254 days of age. Thus, it was concluded that the genetic strains evaluated differ in chemical deposition curves of water, protein, fat and ash.

Caracterização de Filmes a-C:H:Cl e a-C:H:Si:Cl produzidos por deposição à vapor químico assistido por plasma (PECVD) e deposição e implantação iônica por imersão em plasma (PIIID)

Pós-graduação em Ciência e Tecnologia de Materiais - FC